{ "schema": "semiagora.clean-surface-public-manifest.v1", "version": "2026-08-30-clean-surface-packet-v1", "packetVersion": "2026-08-30-clean-surface-v1", "experimentId": "SA-PROC-CLEAN-SURFACE-027", "generatedAt": "2026-08-30T00:00:00+09:00", "status": "packet-only-not-deployed", "counts": { "rows": 6912, "physicalRows": 3456, "evidencePairs": 3456, "evidencePairComparisons": 656640, "columns": 192, "sources": 20, "claimNodes": 16, "normalizedProxyEquations": 20, "exactIntegerLedgerEquations": 16, "exactIntegerLedgers": 3, "prohibitedZeroFields": 112 }, "axes": [ { "id": "clean_family", "count": 6, "values": [ "batch-immersion-wet-bench-like", "single-wafer-spin-clean-like", "brush-scrub-clean-like", "dual-fluid-spray-clean-like", "megasonic-assist-clean-like", "collapse-controlled-dry-like" ], "meaning": "Six bounded cleaning and drying family vocabularies; not transferable chemistries, materials, concentrations, temperatures, times, powers, flows, pressures, tools, settings, or recipes." }, { "id": "clean_delivery_balance_mode", "count": 2, "values": [ "surface-condition-centered-like", "physical-removal-dry-centered-like" ], "meaning": "Two categorical emphasis modes separating surface conditioning from physical removal and drying; not scheduling, tuning, dispatch, or equipment control." }, { "id": "particle_residue_state", "count": 3, "values": [ "particle-removal-constrained-like", "residue-removal-transitional-like", "particle-residue-supported-like" ], "meaning": "Categorical particle and residue removal posture; not particle count, size distribution, composition, removal efficiency, or acceptance limit." }, { "id": "oxide_wetting_state", "count": 3, "values": [ "native-oxide-constrained-like", "wetting-state-constrained-like", "oxide-wetting-supported-like" ], "meaning": "Categorical native-oxide and wetting posture; not oxide thickness, growth rate, contact angle, surface energy, chemistry, or material state." }, { "id": "drying_watermark_state", "count": 2, "values": [ "drying-watermark-constrained-like", "drying-watermark-supported-like" ], "meaning": "Categorical drying and watermark posture; not droplet size, film thickness, humidity, vapor condition, temperature, time, or watermark density." }, { "id": "collapse_adhesion_state", "count": 2, "values": [ "collapse-adhesion-supported-like", "collapse-adhesion-constrained-like" ], "meaning": "Categorical pattern-collapse and adhesion posture; not feature geometry, capillary force, collapse probability, bond strength, measurement result, or disposition." }, { "id": "ordered_state", "count": 8, "values": [ "clean-state-a", "clean-state-b", "clean-state-c", "clean-state-d", "clean-state-e", "clean-state-f", "clean-state-g", "clean-state-h" ], "meaning": "Eight ordered non-time teaching states; not wafer route, process sequence, dispense order, rinse duration, dry duration, queue time, or recipe step." }, { "id": "evidence_posture", "count": 2, "values": [ "teaching_assumption", "replacement_slot" ], "meaning": "Paired evidence metadata only; physical values are identical across each adjacent pair." } ], "ranges": { "ordered_state_norm": { "min": 0, "max": 1 }, "clean_delivery_readiness_proxy": { "min": 0.4204, "max": 0.893714286 }, "particle_removal_readiness_proxy": { "min": 0.456488, "max": 0.871017143 }, "oxide_wetting_control_readiness_proxy": { "min": 0.4902, "max": 0.867457143 }, "surface_access_readiness_proxy": { "min": 0.45426224, "max": 0.8590296 }, "drying_control_readiness_proxy": { "min": 0.5276, "max": 0.8684 }, "adhesion_readiness_proxy": { "min": 0.4972, "max": 0.8708 }, "clean_progress_proxy": { "min": 0.495914138, "max": 0.866399104 }, "surface_state_burden_proxy": { "min": 0.212938013, "max": 0.713470736 }, "watermark_burden_proxy": { "min": 0.200530474, "max": 0.576298476 }, "residual_contamination_burden_proxy": { "min": 0.236871545, "max": 0.633788943 }, "residue_clearance_readiness_proxy": { "min": 0.545755037, "max": 0.849905733 }, "wetting_continuity_readiness_proxy": { "min": 0.611936266, "max": 0.838182914 }, "within_wafer_clean_uniformity_readiness_proxy": { "min": 0.568002044, "max": 0.839969434 }, "oxide_recontamination_burden_proxy": { "min": 0.26624991, "max": 0.700798596 }, "clean_process_drift_burden_proxy": { "min": 0.205142857, "max": 0.6724 }, "model_limit_burden_proxy": { "min": 0.2936, "max": 0.6996 }, "metrology_readiness_proxy": { "min": 0.588488915, "max": 0.823854268 }, "adhesion_handoff_readiness_proxy": { "min": 0.581369595, "max": 0.821814699 }, "clean_surface_handoff_readiness_proxy": { "min": 0.59430118, "max": 0.832411985 } }, "distributions": { "cleanSurfaceRegime": { "particle-removal-limited": 1056, "clean-delivery-limited": 696, "collapse-adhesion-limited": 138, "bounded-clean-surface-review": 4046, "metrology-handoff-readiness-limited": 492, "oxide-wetting-control-limited": 256, "surface-access-limited": 62, "drying-watermark-limited": 166 }, "labels": { "clean_operator_gate": { "review-particle-removal": 1056, "review-clean-delivery": 696, "review-collapse-adhesion": 138, "review-process-drift": 1052, "proceed-to-evidence-review": 2994, "review-metrology-handoff": 492, "review-oxide-wetting-control": 256, "review-surface-access": 62, "review-drying-watermark": 166 }, "surface_engineer_gate": { "review-particle-removal": 1056, "review-clean-delivery": 696, "review-collapse-adhesion": 138, "bounded-comparison-ready": 3818, "review-adhesion-handoff": 492, "review-oxide-wetting-control": 256, "review-surface-access": 62, "review-model-limit": 228, "review-drying-watermark": 166 }, "integration_gate": { "clean-handoff-blocked": 6912 }, "yield_gate": { "review-clean-progress": 956, "review-collapse-adhesion": 818, "bounded-teaching-review": 4612, "review-adhesion-handoff": 154, "review-metrology": 368, "review-surface-uniformity": 4 }, "measurement_traceability_gate": { "measurement-plan-required": 1412, "owned-measurement-replacement-required": 5500 }, "upstream_thermal_surface_readiness_band": { "limited-like": 282, "transitional-like": 4086, "bounded-like": 2544 }, "upstream_thermal_contamination_risk_band": { "limited-like": 792, "transitional-like": 4612, "bounded-like": 1508 }, "upstream_thermal_evidence_gate": { "replacement-evidence-required": 6912 }, "upstream_wet_etch_surface_readiness_band": { "limited-like": 2112, "transitional-like": 1464, "bounded-like": 3336 }, "upstream_wet_etch_collapse_risk_band": { "limited-like": 1928, "transitional-like": 3050, "bounded-like": 1934 }, "upstream_wet_etch_evidence_gate": { "replacement-evidence-required": 6912 }, "upstream_strip_surface_cleanliness_band": { "transitional-like": 3096, "limited-like": 288, "bounded-like": 3528 }, "upstream_strip_residue_risk_band": { "intermediate-like": 4716, "higher-like": 388, "lower-like": 1808 }, "upstream_strip_ash_evidence_gate": { "replacement-evidence-required": 6912 }, "downstream_cmp_surface_readiness_band": { "bounded-like": 4256, "transitional-like": 2350, "limited-like": 306 }, "downstream_cmp_particle_residue_risk_band": { "transitional-like": 4332, "limited-like": 390, "bounded-like": 2190 }, "downstream_cmp_evidence_gate": { "replacement-evidence-required": 6912 }, "downstream_cmp_oxide_wetting_band": { "incomplete-like": 280, "transitional-like": 3316, "bounded-like": 3316 }, "downstream_cmp_collapse_priority_band": { "review-like": 3648, "high-priority": 388, "lower-priority": 2876 }, "downstream_cmp_adhesion_readiness_band": { "bounded-like": 4550, "transitional-like": 2308, "limited-like": 54 }, "downstream_metrology_priority_band": { "particle-removal": 1092, "clean-delivery": 528, "residue-watermark": 388, "oxide-wetting": 528, "clean-progress": 102, "drift-series": 644, "surface-access": 248, "drying-watermark": 596, "completion-state": 2302, "model-limit": 200, "residue-clearance": 16, "surface-uniformity": 258, "adhesion-handoff": 10 }, "downstream_metrology_evidence_gate": { "replacement-evidence-required": 6912 }, "teaching_clean_surface_handoff_gate": { "blocked-pending-owned-evidence": 6912 } } }, "representativeStates": [ { "physical_key": "batch-immersion-wet-bench-like|surface-condition-centered-like|particle-removal-constrained-like|native-oxide-constrained-like|drying-watermark-constrained-like|collapse-adhesion-supported-like|clean-state-f", "clean_family": "batch-immersion-wet-bench-like", "clean_delivery_balance_mode": "surface-condition-centered-like", "particle_residue_state": "particle-removal-constrained-like", "oxide_wetting_state": "native-oxide-constrained-like", "drying_watermark_state": "drying-watermark-constrained-like", "collapse_adhesion_state": "collapse-adhesion-supported-like", "ordered_state": "clean-state-f", "clean_surface_regime": "clean-delivery-limited", "ordered_state_norm": 0.714285714, "clean_delivery_readiness_proxy": 0.465485714, "particle_removal_readiness_proxy": 0.473606857, "oxide_wetting_control_readiness_proxy": 0.547571429, "surface_access_readiness_proxy": 0.612245646, "drying_control_readiness_proxy": 0.703885714, "adhesion_readiness_proxy": 0.595485714, "clean_progress_proxy": 0.643636326, "surface_state_burden_proxy": 0.446929498, "watermark_burden_proxy": 0.396604336, "residual_contamination_burden_proxy": 0.568946646, "residue_clearance_readiness_proxy": 0.679121069, "wetting_continuity_readiness_proxy": 0.677170597, "within_wafer_clean_uniformity_readiness_proxy": 0.720189854, "oxide_recontamination_burden_proxy": 0.631487801, "clean_process_drift_burden_proxy": 0.514628571, "model_limit_burden_proxy": 0.579085714, "metrology_readiness_proxy": 0.688375713, "adhesion_handoff_readiness_proxy": 0.671764593, "clean_surface_handoff_readiness_proxy": 0.673595678, "clean_operator_gate": "review-clean-delivery", "surface_engineer_gate": "review-clean-delivery", "integration_gate": "clean-handoff-blocked", "yield_gate": "review-collapse-adhesion", "downstream_metrology_priority_band": "clean-delivery" }, { "physical_key": "batch-immersion-wet-bench-like|surface-condition-centered-like|particle-removal-constrained-like|native-oxide-constrained-like|drying-watermark-constrained-like|collapse-adhesion-supported-like|clean-state-a", "clean_family": "batch-immersion-wet-bench-like", "clean_delivery_balance_mode": "surface-condition-centered-like", "particle_residue_state": "particle-removal-constrained-like", "oxide_wetting_state": "native-oxide-constrained-like", "drying_watermark_state": "drying-watermark-constrained-like", "collapse_adhesion_state": "collapse-adhesion-supported-like", "ordered_state": "clean-state-a", "clean_surface_regime": "particle-removal-limited", "ordered_state_norm": 0, "clean_delivery_readiness_proxy": 0.4984, "particle_removal_readiness_proxy": 0.480848, "oxide_wetting_control_readiness_proxy": 0.529, "surface_access_readiness_proxy": 0.52418352, "drying_control_readiness_proxy": 0.7596, "adhesion_readiness_proxy": 0.6512, "clean_progress_proxy": 0.539549645, "surface_state_burden_proxy": 0.356094966, "watermark_burden_proxy": 0.343570891, "residual_contamination_burden_proxy": 0.558942099, "residue_clearance_readiness_proxy": 0.742616403, "wetting_continuity_readiness_proxy": 0.669084921, "within_wafer_clean_uniformity_readiness_proxy": 0.763555683, "oxide_recontamination_burden_proxy": 0.618688316, "clean_process_drift_burden_proxy": 0.5832, "model_limit_burden_proxy": 0.4648, "metrology_readiness_proxy": 0.653891756, "adhesion_handoff_readiness_proxy": 0.691294842, "clean_surface_handoff_readiness_proxy": 0.656048172, "clean_operator_gate": "review-particle-removal", "surface_engineer_gate": "review-particle-removal", "integration_gate": "clean-handoff-blocked", "yield_gate": "review-clean-progress", "downstream_metrology_priority_band": "particle-removal" }, { "physical_key": "batch-immersion-wet-bench-like|surface-condition-centered-like|residue-removal-transitional-like|native-oxide-constrained-like|drying-watermark-constrained-like|collapse-adhesion-supported-like|clean-state-h", "clean_family": "batch-immersion-wet-bench-like", "clean_delivery_balance_mode": "surface-condition-centered-like", "particle_residue_state": "residue-removal-transitional-like", "oxide_wetting_state": "native-oxide-constrained-like", "drying_watermark_state": "drying-watermark-constrained-like", "collapse_adhesion_state": "collapse-adhesion-supported-like", "ordered_state": "clean-state-h", "clean_surface_regime": "oxide-wetting-control-limited", "ordered_state_norm": 1, "clean_delivery_readiness_proxy": 0.606, "particle_removal_readiness_proxy": 0.61252, "oxide_wetting_control_readiness_proxy": 0.519, "surface_access_readiness_proxy": 0.6735848, "drying_control_readiness_proxy": 0.6816, "adhesion_readiness_proxy": 0.5732, "clean_progress_proxy": 0.719900352, "surface_state_burden_proxy": 0.448562736, "watermark_burden_proxy": 0.37647675, "residual_contamination_burden_proxy": 0.499208483, "residue_clearance_readiness_proxy": 0.656498981, "wetting_continuity_readiness_proxy": 0.695845755, "within_wafer_clean_uniformity_readiness_proxy": 0.706174777, "oxide_recontamination_burden_proxy": 0.556673319, "clean_process_drift_burden_proxy": 0.5592, "model_limit_burden_proxy": 0.6248, "metrology_readiness_proxy": 0.7176687, "adhesion_handoff_readiness_proxy": 0.680749572, "clean_surface_handoff_readiness_proxy": 0.700862835, "clean_operator_gate": "review-oxide-wetting-control", "surface_engineer_gate": "review-oxide-wetting-control", "integration_gate": "clean-handoff-blocked", "yield_gate": "bounded-teaching-review", "downstream_metrology_priority_band": "oxide-wetting" }, { "physical_key": "batch-immersion-wet-bench-like|surface-condition-centered-like|residue-removal-transitional-like|native-oxide-constrained-like|drying-watermark-constrained-like|collapse-adhesion-constrained-like|clean-state-a", "clean_family": "batch-immersion-wet-bench-like", "clean_delivery_balance_mode": "surface-condition-centered-like", "particle_residue_state": "residue-removal-transitional-like", "oxide_wetting_state": "native-oxide-constrained-like", "drying_watermark_state": "drying-watermark-constrained-like", "collapse_adhesion_state": "collapse-adhesion-constrained-like", "ordered_state": "clean-state-a", "clean_surface_regime": "surface-access-limited", "ordered_state_norm": 0, "clean_delivery_readiness_proxy": 0.6732, "particle_removal_readiness_proxy": 0.627304, "oxide_wetting_control_readiness_proxy": 0.529, "surface_access_readiness_proxy": 0.52573296, "drying_control_readiness_proxy": 0.6756, "adhesion_readiness_proxy": 0.5952, "clean_progress_proxy": 0.55073271, "surface_state_burden_proxy": 0.425496067, "watermark_burden_proxy": 0.396863427, "residual_contamination_burden_proxy": 0.507763157, "residue_clearance_readiness_proxy": 0.660904315, "wetting_continuity_readiness_proxy": 0.63593965, "within_wafer_clean_uniformity_readiness_proxy": 0.655421178, "oxide_recontamination_burden_proxy": 0.569307668, "clean_process_drift_burden_proxy": 0.6376, "model_limit_burden_proxy": 0.5208, "metrology_readiness_proxy": 0.617293024, "adhesion_handoff_readiness_proxy": 0.648978551, "clean_surface_handoff_readiness_proxy": 0.627317572, "clean_operator_gate": "review-surface-access", "surface_engineer_gate": "review-surface-access", "integration_gate": "clean-handoff-blocked", "yield_gate": "review-clean-progress", "downstream_metrology_priority_band": "oxide-wetting" }, { "physical_key": "batch-immersion-wet-bench-like|surface-condition-centered-like|residue-removal-transitional-like|native-oxide-constrained-like|drying-watermark-constrained-like|collapse-adhesion-constrained-like|clean-state-f", "clean_family": "batch-immersion-wet-bench-like", "clean_delivery_balance_mode": "surface-condition-centered-like", "particle_residue_state": "residue-removal-transitional-like", "oxide_wetting_state": "native-oxide-constrained-like", "drying_watermark_state": "drying-watermark-constrained-like", "collapse_adhesion_state": "collapse-adhesion-constrained-like", "ordered_state": "clean-state-f", "clean_surface_regime": "drying-watermark-limited", "ordered_state_norm": 0.714285714, "clean_delivery_readiness_proxy": 0.640285714, "particle_removal_readiness_proxy": 0.620062857, "oxide_wetting_control_readiness_proxy": 0.547571429, "surface_access_readiness_proxy": 0.613795086, "drying_control_readiness_proxy": 0.619885714, "adhesion_readiness_proxy": 0.539485714, "clean_progress_proxy": 0.654819392, "surface_state_burden_proxy": 0.516330599, "watermark_burden_proxy": 0.458076287, "residual_contamination_burden_proxy": 0.519894351, "residue_clearance_readiness_proxy": 0.597408981, "wetting_continuity_readiness_proxy": 0.643370973, "within_wafer_clean_uniformity_readiness_proxy": 0.612055348, "oxide_recontamination_burden_proxy": 0.584446465, "clean_process_drift_burden_proxy": 0.569028571, "model_limit_burden_proxy": 0.635085714, "metrology_readiness_proxy": 0.651318935, "adhesion_handoff_readiness_proxy": 0.628957209, "clean_surface_handoff_readiness_proxy": 0.644560608, "clean_operator_gate": "review-drying-watermark", "surface_engineer_gate": "review-drying-watermark", "integration_gate": "clean-handoff-blocked", "yield_gate": "review-adhesion-handoff", "downstream_metrology_priority_band": "drying-watermark" }, { "physical_key": "batch-immersion-wet-bench-like|surface-condition-centered-like|particle-removal-constrained-like|oxide-wetting-supported-like|drying-watermark-constrained-like|collapse-adhesion-supported-like|clean-state-a", "clean_family": "batch-immersion-wet-bench-like", "clean_delivery_balance_mode": "surface-condition-centered-like", "particle_residue_state": "particle-removal-constrained-like", "oxide_wetting_state": "oxide-wetting-supported-like", "drying_watermark_state": "drying-watermark-constrained-like", "collapse_adhesion_state": "collapse-adhesion-supported-like", "ordered_state": "clean-state-a", "clean_surface_regime": "collapse-adhesion-limited", "ordered_state_norm": 0, "clean_delivery_readiness_proxy": 0.4984, "particle_removal_readiness_proxy": 0.526448, "oxide_wetting_control_readiness_proxy": 0.7794, "surface_access_readiness_proxy": 0.59021552, "drying_control_readiness_proxy": 0.7596, "adhesion_readiness_proxy": 0.6512, "clean_progress_proxy": 0.564517325, "surface_state_burden_proxy": 0.305809206, "watermark_burden_proxy": 0.331788778, "residual_contamination_burden_proxy": 0.483226269, "residue_clearance_readiness_proxy": 0.746639264, "wetting_continuity_readiness_proxy": 0.685505584, "within_wafer_clean_uniformity_readiness_proxy": 0.768383116, "oxide_recontamination_burden_proxy": 0.527575078, "clean_process_drift_burden_proxy": 0.5004, "model_limit_burden_proxy": 0.4096, "metrology_readiness_proxy": 0.670297598, "adhesion_handoff_readiness_proxy": 0.710497515, "clean_surface_handoff_readiness_proxy": 0.682283853, "clean_operator_gate": "review-collapse-adhesion", "surface_engineer_gate": "review-collapse-adhesion", "integration_gate": "clean-handoff-blocked", "yield_gate": "review-clean-progress", "downstream_metrology_priority_band": "particle-removal" }, { "physical_key": "batch-immersion-wet-bench-like|surface-condition-centered-like|residue-removal-transitional-like|native-oxide-constrained-like|drying-watermark-constrained-like|collapse-adhesion-supported-like|clean-state-g", "clean_family": "batch-immersion-wet-bench-like", "clean_delivery_balance_mode": "surface-condition-centered-like", "particle_residue_state": "residue-removal-transitional-like", "oxide_wetting_state": "native-oxide-constrained-like", "drying_watermark_state": "drying-watermark-constrained-like", "collapse_adhesion_state": "collapse-adhesion-supported-like", "ordered_state": "clean-state-g", "clean_surface_regime": "metrology-handoff-readiness-limited", "ordered_state_norm": 0.857142857, "clean_delivery_readiness_proxy": 0.623142857, "particle_removal_readiness_proxy": 0.616291429, "oxide_wetting_control_readiness_proxy": 0.533285714, "surface_access_readiness_proxy": 0.660489943, "drying_control_readiness_proxy": 0.692742857, "adhesion_readiness_proxy": 0.584342857, "clean_progress_proxy": 0.700631872, "surface_state_burden_proxy": 0.429582667, "watermark_burden_proxy": 0.362727691, "residual_contamination_burden_proxy": 0.493016722, "residue_clearance_readiness_proxy": 0.669263101, "wetting_continuity_readiness_proxy": 0.695488098, "within_wafer_clean_uniformity_readiness_proxy": 0.714926007, "oxide_recontamination_burden_proxy": 0.552101745, "clean_process_drift_burden_proxy": 0.524914286, "model_limit_burden_proxy": 0.601942857, "metrology_readiness_proxy": 0.711690749, "adhesion_handoff_readiness_proxy": 0.685285772, "clean_surface_handoff_readiness_proxy": 0.698744466, "clean_operator_gate": "review-metrology-handoff", "surface_engineer_gate": "review-adhesion-handoff", "integration_gate": "clean-handoff-blocked", "yield_gate": "bounded-teaching-review", "downstream_metrology_priority_band": "oxide-wetting" }, { "physical_key": "batch-immersion-wet-bench-like|surface-condition-centered-like|particle-removal-constrained-like|oxide-wetting-supported-like|drying-watermark-constrained-like|collapse-adhesion-supported-like|clean-state-b", "clean_family": "batch-immersion-wet-bench-like", "clean_delivery_balance_mode": "surface-condition-centered-like", "particle_residue_state": "particle-removal-constrained-like", "oxide_wetting_state": "oxide-wetting-supported-like", "drying_watermark_state": "drying-watermark-constrained-like", "collapse_adhesion_state": "collapse-adhesion-supported-like", "ordered_state": "clean-state-b", "clean_surface_regime": "bounded-clean-surface-review", "ordered_state_norm": 0.142857143, "clean_delivery_readiness_proxy": 0.515542857, "particle_removal_readiness_proxy": 0.530219429, "oxide_wetting_control_readiness_proxy": 0.793685714, "surface_access_readiness_proxy": 0.611406377, "drying_control_readiness_proxy": 0.748457143, "adhesion_readiness_proxy": 0.640057143, "clean_progress_proxy": 0.587237416, "surface_state_burden_proxy": 0.323331995, "watermark_burden_proxy": 0.33901459, "residual_contamination_burden_proxy": 0.477687975, "residue_clearance_readiness_proxy": 0.733991726, "wetting_continuity_readiness_proxy": 0.688353923, "within_wafer_clean_uniformity_readiness_proxy": 0.759771786, "oxide_recontamination_burden_proxy": 0.527073918, "clean_process_drift_burden_proxy": 0.466114286, "model_limit_burden_proxy": 0.432457143, "metrology_readiness_proxy": 0.678639386, "adhesion_handoff_readiness_proxy": 0.707409833, "clean_surface_handoff_readiness_proxy": 0.687184299, "clean_operator_gate": "review-process-drift", "surface_engineer_gate": "bounded-comparison-ready", "integration_gate": "clean-handoff-blocked", "yield_gate": "review-clean-progress", "downstream_metrology_priority_band": "particle-removal" } ], "sourceSummary": { "sources": 20, "claimNodes": 16, "linkStatus": "pass", "reachable": 17, "accessGated": 3, "hardFailures": 0, "networkErrors": 0, "sourceBodiesStored": false, "sourceNumericUse": "none" }, "currentPublicBaseline": { "version": "v109", "versionId": "appgprj_6a6f4d3affc0819189d99a8f29062540~appgver_005d791cd0f881919fe28dce4fc90e8f", "deploymentId": "appgdep_6a91677cd40081919caf523a472130f6", "sourceCommit": "c3888cc26eb434d9ca88e76889f781194044db4a", "changedByThisPacket": false, "publicVersionReserved": "none", "releaseDecision": "hold" }, "publicDelivery": { "mode": "metadata-manifest-plus-csv-rows", "rowsEmbedded": false, "rowArtifact": "clean-surface-state-v1.csv", "rowArtifactSha256": "B7DD5B23EE3BB3C107EF12E71835B5EFAE8652CC61871A51B22323DC967BF6BB", "canonicalRowBearingArtifact": "clean-surface-state-web-v1.json", "canonicalRowBearingArtifactSha256": "9FC408C191F668E362F354FBC2A5CEA216EAAAC9FAF644EFBFF5606CF749DE24", "independentValidationArtifact": "validation-report-v1.json", "independentValidationArtifactSha256": "F7BF11A1973F90D1D0C6D39CA6609EDBD5F2CEBF948AE371321F631C7A6DBBE8", "sourceSpineArtifact": "clean-surface-source-spine-v1.json", "sourceSpineArtifactSha256": "7DC5CBA0226FED08559FB77E8B2B603560C73E168578FFB334C49CB9407114E3", "publicHoldArtifact": "public-hold-verification-v1.json", "publicHoldArtifactSha256": "F69D499FA1FE8CFEBC8990712BAB7D6E45C6B3ABF8E8FDAD4C1558113587E405" }, "contracts": { "state": { "file": "clean-surface-state-contract-v1.json", "sha256": "4E90337681FAB2F49749854D8E95107A4ABE96D4603BD6CB0092D789533EFE5A" }, "metrics": { "file": "clean-surface-metric-contract-v1.json", "sha256": "121D5D5C1A7B1EDA5071872A627C4F9AD34630B7970969A912CEC05457F62344" }, "verifier": { "file": "independent-verifier-contract-v1.json", "sha256": "AA50006E4452C92FCC48989BD7167769596F9964CB6F81AFF4EC94B2022269A5" }, "sourceCatalog": { "file": "source_catalog_v1.json", "sha256": "6EDDC7A66E87A4522FB04EED86C8F8B69D2A1222944447067ACB409FB533CFA8" }, "claimMap": { "file": "source_claim_map_v1.json", "sha256": "6A0A5DCBFAA22C0E299D70239901109EE56F7FF5E3EA58B04F41CD9D467E2C7F" } }, "cleanSurfaceRegimes": [ "clean-delivery-limited", "particle-removal-limited", "oxide-wetting-control-limited", "surface-access-limited", "drying-watermark-limited", "collapse-adhesion-limited", "metrology-handoff-readiness-limited", "bounded-clean-surface-review" ], "requiredPhenomena": [ "clean-family-and-delivery-separation", "particle-and-residue-removal-separation", "native-oxide-wetting-and-surface-state-transition", "physical-removal-and-surface-access", "drying-watermark-and-recontamination-response", "pattern-collapse-and-adhesion-handoff", "metrology-and-cmp-readiness-handoff", "traceability-model-limit-and-owned-evidence-boundary" ], "upstreamBridges": [ { "sourceExperimentId": "SA-PROC-THERMAL-RTP-LASER-026", "allowedFields": [ "downstream_clean_surface_readiness_band", "downstream_clean_oxide_risk_band", "teaching_thermal_anneal_handoff_gate", "downstream_surface_continuity_band", "downstream_contamination_priority_band", "downstream_thermal_uniformity_band", "downstream_metrology_priority_band", "downstream_clean_evidence_gate", "downstream_metrology_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-PROC-ETCH-WET-CHEM-019", "allowedFields": [ "downstream_surface_roughness_band", "downstream_geometry_review_band", "downstream_collapse_priority_band", "downstream_metrology_priority_band", "downstream_inspection_evidence_gate", "teaching_wet_etch_handoff_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-PROC-STRIP-ASH-018", "allowedFields": [ "downstream_surface_cleanliness_band", "downstream_damage_review_band", "downstream_residue_priority_band", "downstream_metrology_priority_band", "downstream_inspection_evidence_gate", "teaching_strip_ash_handoff_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false } ], "downstreamBridge": { "targetExperimentId": "SA-PROC-CMP-028", "allowedFields": [ "downstream_cmp_surface_readiness_band", "downstream_cmp_particle_residue_risk_band", "downstream_cmp_oxide_wetting_band", "downstream_cmp_adhesion_readiness_band", "downstream_cmp_collapse_priority_band", "downstream_metrology_priority_band", "downstream_cmp_evidence_gate", "downstream_metrology_evidence_gate", "teaching_clean_surface_handoff_gate" ], "physicalUnitsAllowed": false, "automaticRecipeHandoffAllowed": false, "automaticChemistryHandoffAllowed": false, "automaticEquipmentActionAllowed": false, "automaticDispositionAllowed": false }, "replacementEvidenceRequirements": [ "accountable run, lot, wafer, cleaning, drying, metrology, integration, yield, CMP, and disposition ownership", "revisioned wet bench, single-wafer chamber, brush, spray, acoustic, drying, wafer handling, environmental, and measurement configuration", "owned incoming thermal, wet-etch, strip-ash, surface, layer-stack, topography, contamination, substrate, and queue histories", "owned chemical identity, purity, composition, concentration, pH, redox, conductivity, dissolved-gas, and contamination evidence", "owned dispense, immersion, spray, brush, acoustic, rinse, spin, vapor, pressure, flow, temperature, time, and environmental evidence", "owned particle count, size distribution, composition, location, adhesion, removal, and redeposition evidence", "owned organic, ionic, metallic, polymeric, etch, strip, CMP, and process-residue evidence", "owned native-oxide, termination, regrowth, roughness, surface-energy, charge, wetting, and contact-angle evidence", "owned drying front, liquid film, droplet, vapor, humidity, watermark, recontamination, and queue evidence", "owned feature geometry, pattern density, capillary response, mechanical stability, collapse, stiction, and adhesion evidence", "owned within-wafer, wafer-to-wafer, edge, pattern-dependent, chamber, and temporal uniformity evidence", "owned particle, chemical, optical, electrical, surface, film, defect, and contamination metrology with calibration, uncertainty, sampling, raw-data lineage, and review evidence", "explicit separation of batch immersion, single-wafer spin, brush scrub, dual-fluid spray, megasonic assist, and collapse-controlled drying claims without cross-family numeric transfer", "explicit validation of every transport, wetting, cavitation, particle-removal, oxide, drying, capillary, collapse, adhesion, or contamination model before use", "downstream CMP and metrology approval plus accountable integration, yield, qualification, and disposition review", "documented confirmation that no normalized label is used as a chemistry, concentration, tool setting, process limit, equipment command, acceptance criterion, or production decision" ], "requiredSections": [ "Explore", "Run Card", "Export", "Methods", "Limits", "Evidence" ], "limitation": "Original dimensionless clean-surface teaching replay only. No chemistry, concentration, material value, particle or residue measurement, oxide or wetting state, acoustic condition, brush or spray setting, temperature, time, flow, pressure, humidity, drying result, watermark result, collapse or adhesion result, metrology result, equipment action, recipe, qualification, disposition, CMP approval, or production fitness is computed or implied." }