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ownership, review owner, and disposition owner", "revisioned chamber, showerhead or inlet, plasma source if present, substrate assembly, and wafer-stage configuration", "owned precursor identity, source container, delivery line, carrier context, conditioning state, use history, and change history", "owned gas identity, composition, flow, calibration, traceability, and uncertainty evidence", "pressure, pumping, throttle, residence, depletion, exhaust, and chamber-history evidence with uncertainty", "wafer temperature, spatial temperature map, substrate contact, thermal history, and calibration evidence", "plasma-source power, coupling, match, density, radical, and utilization evidence with calibration and uncertainty where applicable", "substrate bias, ion energy, ion flux, charging, arc or excursion, and exposure evidence with uncertainty where applicable", "chamber-wall, liner, clean, seasoning, memory, particle, and maintenance-cycle evidence", "revisioned reactor, inlet, showerhead, 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