{ "schema": "semiagora.drie-public-manifest.v1", "version": "2026-08-29-packet-v1", "packetVersion": "2026-08-29-drie-v1", "experimentId": "SA-PROC-ETCH-DRIE-017", "generatedAt": "2026-08-29T00:00:00+09:00", "status": "packet-only-not-deployed", "counts": { "rows": 6912, "physicalRows": 3456, "evidencePairs": 3456, "evidencePairComparisons": 656640, "columns": 192, "sources": 20, "claimNodes": 16, "normalizedProxyEquations": 20, "exactIntegerLedgerEquations": 16, "exactIntegerLedgers": 3, "prohibitedZeroFields": 112 }, "axes": [ { "id": "application_family", "count": 4, "values": [ "mems_structure_like", "through_substrate_via_like", "xray_grating_like", "microfluidic_channel_like" ], "meaning": "Teaching application archetype without customer, device design, feature dimension, mask stack, tool, recipe, or qualification." }, { "id": "drie_mode", "count": 3, "values": [ "time_multiplexed_bosch_like", "continuous_cryogenic_like", "adapted_multiplexed_like" ], "meaning": "Bounded mode taxonomy only; no named chemistry, temperature, sequence, duty cycle, product, or equipment command." }, { "id": "passivation_balance_state", "count": 3, "values": [ "passivation_deficient_like", "passivation_balanced_like", "passivation_excessive_like" ], "meaning": "Original categorical teaching context for sidewall protection versus bottom clearance; not a film, species, thickness, rate, or recipe." }, { "id": "feature_transport_state", "count": 3, "values": [ "transport_restricted_like", "transport_nominal_like", "transport_open_like" ], "meaning": "Original categorical feature-access context; not aspect ratio, depth, width, flux, conductance, or transport calculation." }, { "id": "mask_margin_state", "count": 2, "values": [ "mask_margin_limited_like", "mask_margin_available_like" ], "meaning": "Original categorical evidence state; not mask material, thickness, stress, selectivity, erosion rate, or fabrication instruction." }, { "id": "interface_approach_state", "count": 2, "values": [ "bulk_continuation_like", "interface_approach_like" ], "meaning": "Original categorical context for interface-risk review; not an interface material, depth, endpoint, charge state, footing, or notch dimension." }, { "id": "ordered_state", "count": 8, "values": [ "D00", "D01", "D02", "D03", "D04", "D05", "D06", "D07" ], "meaning": "Eight ordered review states for deterministic branch coverage; explicitly not time, depth, cycle count, dose, progress, endpoint, or equipment state." }, { "id": "evidence_posture", "count": 2, "values": [ "teaching_assumption", "replacement_slot" ], "meaning": "Metadata only. It is outside the physical key and cannot change any coefficient, proxy, token, regime, gate, bridge, or label." } ], "ranges": { "ordered_state_norm": { "min": 0, "max": 1 }, "etch_delivery_stability_proxy": { "min": 0.5268, "max": 0.790342857 }, "passivation_coverage_proxy": { "min": 0.4212, "max": 0.8936 }, "bottom_clearance_proxy": { "min": 0.4812, "max": 0.8716 }, "sidewall_protection_proxy": { "min": 0.3548, "max": 0.7396 }, "vertical_directionality_proxy": { "min": 0.591624, "max": 0.799304 }, "feature_transport_access_proxy": { "min": 0.3992, "max": 0.7884 }, "aspect_ratio_progress_proxy": { "min": 0.389464, "max": 0.887352 }, "loading_burden_proxy": { "min": 0.2728, "max": 0.8032 }, "scallop_control_proxy": { "min": 0.451208, "max": 0.84332 }, "taper_control_proxy": { "min": 0.5378472, "max": 0.8038312 }, "footing_risk_burden_proxy": { "min": 0.275256, "max": 0.69124 }, "notching_risk_burden_proxy": { "min": 0.268968, "max": 0.686264 }, "mask_margin_proxy": { "min": 0.42, 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"sourceBodiesStored": false, "sourceNumericUse": "none" }, "currentPublicBaseline": { "version": "v109", "versionId": "appgprj_6a6f4d3affc0819189d99a8f29062540~appgver_005d791cd0f881919fe28dce4fc90e8f", "deploymentId": "appgdep_6a91677cd40081919caf523a472130f6", "sourceCommit": "c3888cc26eb434d9ca88e76889f781194044db4a", "changedByThisPacket": false, "publicVersionReserved": "none", "releaseDecision": "hold" }, "publicDelivery": { "mode": "metadata-manifest-plus-csv-rows", "rowsEmbedded": false, "rowArtifact": "drie-profile-state-v1.csv", "rowArtifactSha256": "5B9533EB797ED1EBEA965BF5A2BBAC026AFCF5CC20B53F115D2F7C113C27C315", "canonicalRowBearingArtifact": "drie-profile-state-web-v1.json", "canonicalRowBearingArtifactSha256": "678C54F3672378D5CA3AACEA0C0308B1212051B9D24A451A8E5EE8B42F3A8BE3", "independentValidationArtifact": "validation-report-v1.json", "independentValidationArtifactSha256": "AE1E468043A9FD9D45E1A500F1E6B35FEE75AA21E26F339A8BCBC3AD30CCF08A", "sourceSpineArtifact": "drie-source-spine-v1.json", "sourceSpineArtifactSha256": "F4915B8AC3FB898DC9CA7F8D6D4CC0B2135A81EBBD474333E0F337986AACA3A0", "publicHoldArtifact": "public-hold-verification-v1.json", "publicHoldArtifactSha256": "7B9F7975260C347EC3D904BEE192D6FCAAEBDB095CE80BDA569354BE965C1DA2" }, "contracts": { "state": { "file": "drie-state-contract-v1.json", "sha256": "040DC057FE8FD668EA83614F84876F185CEFD97CFF62A15B7EAC7DC113946B34" }, "metrics": { "file": "drie-metric-contract-v1.json", "sha256": "A4C374D8AE76DAFE427EE840CD0C3CA0B619CD14275F9A087E5135CD37DA48DE" }, "verifier": { "file": "independent-verifier-contract-v1.json", "sha256": "267D94463F3D5D05ED4919F0853B09A99CF7972E6DAAC2F316A08E9F603ECA74" }, "sourceCatalog": { "file": "source_catalog_v1.json", "sha256": "98452B5571FE74D28630053FE4A8880DF31198096DB758916C16F0C564D56CAD" }, "claimMap": { "file": "source_claim_map_v1.json", "sha256": "488E03C3C2257963101D99B2A58AA8A059D9456E40D566E705EC1916A9C2A3C7" } }, "drieRegimes": [ "etch-delivery-starved", "passivation-deficient", "passivation-excessive", "feature-transport-limited", "mask-margin-limited", "interface-footing-limited", "profile-roughness-limited", "bounded-drie" ], "requiredPhenomena": [ "mode-and-cycle-allocation", "passivation-and-bottom-clearance", "feature-transport-and-arde", "scallop-and-sidewall-roughness", "taper-and-profile-fidelity", "mask-margin-and-erosion", "interface-footing-and-notching", "metrology-throughput-and-reliability" ], "upstreamBridges": [ { "sourceExperimentId": "SA-EQP-VAC-GAS-009", "allowedFields": [ "upstream_vac_delivery_band", "upstream_vac_exhaust_band", "upstream_vac_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-EQP-PLASMA-CCP-ICP-008", "allowedFields": [ "upstream_plasma_neutrality_band", "upstream_plasma_ion_burden_band", "upstream_plasma_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-PROC-ETCH-RIE-010", "allowedFields": [ "upstream_rie_profile_band", "upstream_rie_surface_state_band", "upstream_rie_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-PROC-ETCH-HAR-011", "allowedFields": [ "upstream_har_transport_band", "upstream_har_profile_band", "upstream_har_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false } ], "downstreamBridge": { "targetExperimentId": "SA-MET-INSPECTION-030", "allowedFields": [ "downstream_depth_uniformity_band", "downstream_profile_band", "downstream_sidewall_priority_band", "downstream_metrology_priority_band", "downstream_drie_evidence_gate", "teaching_drie_handoff_gate" ], "physicalUnitsAllowed": false, "automaticRecipeHandoffAllowed": false, "automaticGeometryHandoffAllowed": false, "automaticEquipmentActionAllowed": false, "automaticDispositionAllowed": false }, "replacementEvidenceRequirements": [ "accountable run identifier, wafer ownership, review owner, and disposition owner", "revisioned chamber, ICP source, substrate electrode, thermal chuck, backside contact, load-lock, exhaust, and sequencing configuration", "owned substrate, mask, hard-mask, interface, stop layer, carrier, adhesive, and neighboring-material identities with preparation and change histories", "owned etch, passivation, carrier, diluent, byproduct, residue, contamination, and surface-termination evidence appropriate to each claim", "cycle sequence, valve response, overlap, transition, stabilization, repeatability, and uncertainty evidence for multiplexed operation", "substrate temperature, spatial temperature map, thermal contact, backside cooling, condensation state, and calibration evidence where applicable", "source power, coupling, match, bias, ion, neutral, electron, ultraviolet, charging, and source-to-wafer exposure evidence with uncertainty", "pressure, pumping, throttle, conductance, chamber volume, residence, exhaust, wall state, conditioning, and chamber-history evidence", "revisioned mask opening, open area, pattern density, layout neighborhood, wafer position, and sampling geometry", "revisioned feature width, depth, pitch, aspect ratio, sidewall, interface, footing, notch, scallop, taper, and undercut geometry", "mask thickness, composition, patterning, stress, erosion, selectivity numerator and denominator, and uncertainty evidence", "depth, etch-rate, depth-uniformity, etch-lag, ARDE, macroloading, microloading, and across-wafer evidence", "sidewall passivation, bottom clearing, polymer or oxide-like residue, micrograss-like defect, byproduct, and post-etch ownership evidence", "top, middle, bottom, sidewall, interface, opening, recess-front, and wafer-map measurements with uncertainty", "scallop, curtaining, roughness, taper, bowing, twisting, footing, notching, CD, and profile evidence appropriate to each claim", "surface structure, fracture, adhesion, electrical interface, contamination, damage, defect, and reliability evidence appropriate to the application", "time-order, wafer-to-wafer, chamber-to-chamber, maintenance, wall-state, mask-lot, and drift evidence", "throughput, availability, process duration, cycle count, queueing, utilization, abatement, and ownership evidence", "measurement-system analysis, calibration records, uncertainty budget, sampling plan, detection limits, and gauge capability", "model version, assumptions, parameters, applicability limits, independent review, rights review, safety review, and accountable approval" ], "requiredSections": [ "Explore", "Run Card", "Export", "Methods", "Limits", "Evidence" ], "limitation": "Original dimensionless DRIE teaching replay only. No physical chemistry, sequence, temperature, plasma, transport, aspect ratio, mask behavior, etch rate, profile, scallop, roughness, taper, footing, notching, depth, geometry, equipment capability, recipe, qualification, reliability, or production fitness is computed or implied." }