{ "schema": "semiagora.endpoint-sensor-public-manifest.v1", "version": "2026-08-30-endpoint-sensor-packet-v1", "packetVersion": "2026-08-30-endpoint-sensor-v1", "experimentId": "SA-EQP-ENDPOINT-SENSOR-029", "generatedAt": "2026-08-30T00:00:00+09:00", "status": "packet-only-not-deployed", "counts": { "rows": 6912, "physicalRows": 3456, "evidencePairs": 3456, "evidencePairComparisons": 656640, "columns": 192, "sources": 20, "claimNodes": 16, "normalizedProxyEquations": 20, "exactIntegerLedgerEquations": 16, "exactIntegerLedgers": 3, "prohibitedZeroFields": 112 }, "axes": [ { "id": "sensor_family", "count": 6, "values": [ "oes-endpoint-monitor-like", "interferometric-endpoint-monitor-like", "rga-endpoint-monitor-like", "pressure-context-monitor-like", "rf-impedance-monitor-like", "temperature-context-monitor-like" ], "meaning": "Six bounded endpoint-sensor modality vocabularies; not transferable sensors, channels, wavelengths, masses, settings, thresholds, calibrations, tools, recipes, or 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"endpointSensorRegimes": [ "signal-capture-limited", "signal-formation-limited", "drift-control-limited", "calibration-traceability-limited", "transition-discrimination-limited", "false-endpoint-control-limited", "sensor-fusion-readiness-limited", "bounded-endpoint-sensor-review" ], "requiredPhenomena": [ "sensor-family-and-process-context-separation", "signal-formation-and-transition-observability-separation", "drift-control-and-calibration-traceability-separation", "oes-interferometry-rga-pressure-rf-temperature-observation-boundary", "weak-signal-ambiguity-and-false-endpoint-response", "multisensor-alignment-disagreement-and-fusion-response", "measurement-traceability-and-downstream-metrology-handoff", "traceability-model-limit-and-owned-evidence-boundary" ], "upstreamBridges": [ { "sourceExperimentId": "SA-PROC-CMP-028", "allowedFields": [ "downstream_endpoint_sensor_readiness_band", "downstream_endpoint_signal_separation_band", "downstream_endpoint_drift_priority_band", "downstream_false_endpoint_priority_band", "downstream_metrology_priority_band", "downstream_endpoint_evidence_gate", "downstream_metrology_evidence_gate", "teaching_cmp_handoff_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-PROC-ETCH-RIE-010", "allowedFields": [ "feature_particle_mix_band", "feature_directionality_band", "feature_passivation_band", "feature_profile_handoff_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-PROC-DEP-CVD-PECVD-013", "allowedFields": [ "downstream_thickness_uniformity_band", "downstream_conformality_band", "downstream_stress_damage_priority_band", "downstream_metrology_priority_band", "downstream_film_evidence_gate", "teaching_cvd_handoff_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-EQP-PLASMA-CCP-ICP-008", "allowedFields": [ "feature_bridge_ion_fraction_norm", "feature_bridge_neutral_fraction_norm", "feature_bridge_energy_band", "feature_bridge_angular_spread", "feature_bridge_radial_factor", "feature_bridge_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false } ], "downstreamBridge": { "targetExperimentId": "SA-MET-INSPECTION-030", "allowedFields": [ "downstream_inspection_sensor_readiness_band", "downstream_measurement_traceability_band", "downstream_sampling_priority_band", "downstream_endpoint_disagreement_priority_band", "downstream_uncertainty_priority_band", "downstream_inspection_evidence_gate", "downstream_metrology_evidence_gate", "teaching_endpoint_sensor_handoff_gate" ], "physicalUnitsAllowed": false, "automaticRecipeHandoffAllowed": false, "automaticSensorThresholdHandoffAllowed": false, "automaticEquipmentActionAllowed": false, "automaticDispositionAllowed": false }, "replacementEvidenceRequirements": [ "accountable run, lot, wafer, process, sensor, equipment, metrology, integration, yield, calibration, and disposition ownership", "revisioned chamber, viewport, optical path, sampling path, gauge, RF pickup, temperature sensor, acquisition, synchronization, and analysis configuration", "owned etch, deposition, chamber-clean, material-stack, gas, plasma, pressure, RF, thermal, geometry, open-area, and queue histories", "owned OES wavelength, spectral response, collection geometry, background, noise, viewport transmission, gain, offset, and reference evidence", "owned interferometer source, wavelength, spot, alignment, reflectance, phase, fringe, optical model, stack, thickness, depth, and interface evidence", "owned RGA inlet, transport, pressure, temperature, ionization, fragmentation, mass calibration, channel, background, contamination, and response evidence", "owned chamber pressure, gauge range, zero, thermal state, contamination, control-loop, transient, sampling, and calibration evidence", "owned RF voltage, current, phase, impedance, harmonic, reflected-power, arc, coupling, matching, acquisition, and calibration evidence", "owned wafer, wall, electrode, viewport, and sensor temperature with emissivity, optical access, lag, spatial response, and calibration evidence", "owned signal amplitude, slope, derivative, baseline, noise floor, bandwidth, latency, synchronization, missing-data, and filtering evidence", "owned endpoint truth, interface transition, process stop, overprocess, weak-signal, false-positive, false-negative, and disagreement evidence", "owned modality-specific preprocessing, feature selection, fusion logic, model revision, validation split, drift response, and fallback evidence", "owned sensor, process, film, profile, defect, and endpoint metrology with calibration, uncertainty, sampling, raw-data lineage, and review evidence", "owned upstream CMP, etch, deposition, and plasma-state categorical handoff plus downstream inspection and metrology review evidence", "explicit validation of every optical, mass-spectrometric, pressure, RF, thermal, statistical, fusion, and endpoint-decision model before use", "documented confirmation that no normalized label is used as a channel choice, threshold, calibration, process limit, equipment command, acceptance criterion, or production decision" ], "requiredSections": [ "Explore", "Run Card", "Export", "Methods", "Limits", "Evidence" ], "limitation": "Original dimensionless endpoint-sensor teaching replay only. No physical wavelength, mass channel, pressure, RF value, temperature, signal, drift, calibration, uncertainty, endpoint threshold, process-stop result, metrology result, equipment action, recipe, qualification, disposition, or production fitness is computed or implied." }