{
  "schema": "semiagora.eqp-simulation.v1",
  "experiment_id": "SA-EQP-VACUUM-PUMPDOWN-001",
  "title": "Vacuum pumpdown envelope",
  "execution_mode": "precomputed-only",
  "model_boundary": "Educational pumpdown-envelope replay for reading volume, effective speed, target pressure, and leak-floor vocabulary; not a pump selection, leak-check, or tool-operation procedure.",
  "limitations": [
    "No facility operation, tool-control command, endpoint setting, interlock setting, emergency procedure, or maintenance instruction is included.",
    "No gas, chemical, exhaust, abatement, electrical, UPW, vacuum, or HVAC handling guidance is included.",
    "No process recipe, process window, qualified PM plan, production dispatch rule, capacity commitment, or safety signoff is included.",
    "All numbers are educational proxies and must be replaced by qualified facility, EHS, equipment, and process-owner evidence before engineering decisions."
  ],
  "sources": [
    {
      "label": "ISO 14644-1 cleanroom particle classification",
      "url": "https://www.iso.org/standard/53394.html",
      "note": "Official ISO page anchoring cleanroom air-cleanliness vocabulary by airborne-particle concentration."
    },
    {
      "label": "ISO 14644-4 cleanroom design and start-up",
      "url": "https://www.iso.org/standard/72379.html",
      "note": "Official ISO page anchoring cleanroom requirements, design, construction, start-up, verification, and life-cycle vocabulary."
    },
    {
      "label": "SEMI E10 equipment RAM and utilization",
      "url": "https://www.semi.org/en/Standards/CTR_031244",
      "note": "Official SEMI page anchoring equipment reliability, availability, maintainability, and utilization language."
    },
    {
      "label": "SEMI E10 and E79 equipment performance metrics",
      "url": "https://www.semi.org/en/products-services/standards/step/equipment-performance-metrics",
      "note": "Official SEMI education page linking RAM, utilization, OEE, and throughput vocabulary."
    },
    {
      "label": "NIST manufacturing machinery maintenance",
      "url": "https://www.nist.gov/el/applied-economics-office/manufacturing/topics-manufacturing/manufacturing-machinery-maintenance",
      "note": "Official NIST page anchoring maintenance-method vocabulary for smart manufacturing."
    },
    {
      "label": "NIST CHIPS research and development programs",
      "url": "https://www.nist.gov/chips/research-development-programs",
      "note": "Official NIST page anchoring semiconductor metrology, standards, and precision-equipment calibration context."
    },
    {
      "label": "NIST CHIPS materials and manufacturing equipment facilities",
      "url": "https://www.nist.gov/chips/chips-incentives-funding-opportunities/facilities-for-semiconductor-materials-and",
      "note": "Official NIST page defining semiconductor materials and manufacturing-equipment facilities for public program vocabulary."
    },
    {
      "label": "ASML EUV lithography systems",
      "url": "https://www.asml.com/en/products/euv-lithography-systems",
      "note": "Official ASML page anchoring high-vacuum and precision-wafer-handler vocabulary for EUV tools."
    },
    {
      "label": "SEMI smart manufacturing sustainability",
      "url": "https://www.semi.org/en/blogs/technology-and-trends/accelerating-sustainability-with-smart-manufacturing-in-semiconductors%E2%80%93session-at-semicon-west-2024",
      "note": "Official SEMI page anchoring smart manufacturing, sustainability, and efficiency vocabulary."
    }
  ],
  "axes": [
    "teaching chamber case",
    "target pressure",
    "time to target"
  ],
  "start_pressure_torr": 760.0,
  "cases": [
    {
      "label": "loadlock_fast_roughing_teaching_case",
      "volume_l": 42,
      "effective_speed_l_s": 24,
      "leak_floor_torr": 0.003,
      "target_torr": 0.05,
      "time_to_target_s": 17.0,
      "time_constant_s": 1.75,
      "normalized_recovery_index": 0.405
    },
    {
      "label": "process_chamber_nominal_teaching_case",
      "volume_l": 180,
      "effective_speed_l_s": 36,
      "leak_floor_torr": 0.0008,
      "target_torr": 0.01,
      "time_to_target_s": 56.6,
      "time_constant_s": 5.0,
      "normalized_recovery_index": 1.348
    },
    {
      "label": "large_chamber_recovery_teaching_case",
      "volume_l": 420,
      "effective_speed_l_s": 48,
      "leak_floor_torr": 0.0015,
      "target_torr": 0.02,
      "time_to_target_s": 93.0,
      "time_constant_s": 8.75,
      "normalized_recovery_index": 2.214
    }
  ],
  "derived_metrics": {
    "fastest_case": "loadlock_fast_roughing_teaching_case",
    "slowest_case": "large_chamber_recovery_teaching_case",
    "nominal_chamber_time_s": 56.6,
    "large_to_loadlock_time_ratio": 5.47
  },
  "verification": {
    "case_count": 3,
    "positive_times": true,
    "large_chamber_slowest": true,
    "targets_above_floor": true,
    "all_cases_precomputed": true
  }
}