# HAR Profile Evolution Model Card

## Identity

- Experiment: SA-PROC-ETCH-HAR-011
- Version: 2026-08-28-har-v1
- Mode: original dimensionless precomputed teaching replay
- Applications: DRAM-capacitor-like, 3D-NAND-channel-like, contact-like, TSV-like
- Public status: packet-only; Sites v109 remains unchanged

## Intended Use

The packet teaches how high-aspect-ratio profile concerns can be separated and compared across bounded categorical states. It supports vocabulary, mechanism comparison, role-specific review gates, evidence planning, and compact public transport design.

It is not a physical plasma solver, feature-scale trajectory solver, etch-rate model, geometry simulator, recipe optimizer, endpoint system, or production decision aid.

## State And Outputs

A complete 6,912-row Cartesian sweep represents 3,456 physical states, each paired with teaching-assumption and replacement-evidence-slot metadata. Inputs are application family, ordinal aspect burden, neutral transport, charge deflection, sidewall protection, mask resilience, and H00-H07 ordered replay state.

Outputs separate bottom access, mask retention, ARDE burden, bowing, twisting, notching, microtrenching, bottom opening, distortion, profile control, stability, exact bookkeeping ledgers, four role gates, and categorical bridges.

## Coefficient Origin

Every coefficient and threshold is an original SemiAgora teaching choice. Nothing is copied, fitted, calibrated, reverse engineered, or inferred from a paper, vendor page, named tool, customer run, chamber, recipe, geometry, or measured wafer.

The generated values are dimensionless proxies. H00-H07 are not seconds, duration, endpoint position, chamber steps, or a process sequence.

## Evidence Postures

- teaching_assumption: a bounded teaching row
- replacement_slot: the same physical row awaiting rights-cleared evidence

The two rows in each pair must be identical for every non-evidence field. Evidence metadata cannot improve a score, open a gate, or change serialization.

## Regime Semantics

The regime chain provides teaching labels for transport starvation, charging deflection, mask limitation, sidewall-protection limitation, bottom-open limitation, distortion dominance, notch or microtrench risk, and bounded profile behavior. Precedence is contractual, not scientific ranking.

No regime is a diagnosis, root-cause proof, defect classifier, production alarm, or process recommendation.

## Role Views

- Operator: bounded trace review, charge-deflection review, or mask-retention review
- Process engineer: transport, sidewall-protection, profile-control, or bounded-comparison review
- Integration: teaching profile handoff ready or blocked
- Yield: bottom-open, mask-loss, distortion, or bounded profile monitor

These labels never authorize setpoint changes, endpoint stops, lot holds, maintenance, qualification, signoff, or wafer disposition.

## Upstream And Downstream Bridges

SA-PROC-ETCH-RIE-010 and SA-PROC-FEATURE-PMC-007 provide categorical context only. No physical state, geometry, gas, material, energy, flux, trajectory, or recipe is imported.

SA-MET-INSPECTION-030 receives categorical profile-shape, bottom-open, mask-state, metrology-priority, and evidence-gate fields only. It receives no target, tolerance, sampling plan, disposition rule, or automatic process action.

## ViennaPS Boundary

ViennaPS is an open-source reproduction candidate and remains link-only in this packet. A future reproduction must be isolated, pin the exact version and license, record dependencies, declare geometry and parameters, define seed or determinism posture, retain solver outputs separately, and compare against rights-cleared measurements with uncertainty.

No ViennaPS code, default, example, geometry, parameter, mesh, ray trace, result, binary, or solver claim is bundled here.

## Replacement Evidence Required

A calibrated or predictive claim requires accountable run ownership; revisioned feature geometry and stack; plasma and surface diagnostics; profile CD, depth, sidewall, bowing, twisting, notch, microtrench, mask, bottom-open, and uniformity measurements as applicable; uncertainty and gauge evidence; chamber and incoming-state traceability; endpoint-to-post-metrology correlation; and independent review.

## Known Limitations

- No physical units, geometry, material, gas, chamber, tool, or recipe
- No pattern-density loading model
- No three-dimensional stochastic trajectory solution
- No surface charging field solution
- No measured profile, wafer map, or uncertainty
- No device, reliability, cost, throughput, environmental, or yield prediction
- Application families are teaching archetypes, not equivalent processes
- Categorical bridges do not prove causal continuity

## Prohibited Use

Do not use the packet to select a gas, material, mask, chamber, tool, power, pressure, temperature, duration, endpoint, clean, maintenance action, lot disposition, process window, supplier, or production release. Do not present any row as measured, calibrated, qualified, predictive, safe, or production fit.

## Website Hold

Do not edit 09_website/, save or reserve a Sites version, or deploy from this packet work unit. Website integration is a later release-gated task after independent packet completion and compact-transport review.