{ "schema": "semiagora.litho-scanner-track-metric-contract.v1", "version": "2026-08-30-litho-scanner-track-v1", "experimentId": "SA-PROC-LITHO-SCANNER-TRACK-024", "stateContractVersion": "2026-08-30-litho-scanner-track-v1", "executionMode": "deterministic-original-dimensionless-teaching-model", "coefficientOrigin": "Original bounded teaching coefficients authored for this packet; not fitted, calibrated, source-derived, or transferable to physical process settings.", "sourceNumericUse": "none", "roundDigits": 9, "numericClosureTolerance": 0, "sweep": { "rowCount": 6912, "physicalRows": 3456, "evidencePairs": 3456, "orderedStateCount": 8, "orderedStateIsTime": false }, "axisCoefficients": { "lithography_family": { "duv-dry-scanner-like": { "coatAffinity": 0.72, "imagingAffinity": 0.74, "focusDoseTolerance": 0.76, "bakeDevelopTolerance": 0.72, "thicknessControl": 0.7, "evidenceFlow": 0.82 }, "duv-immersion-scanner-like": { "coatAffinity": 0.7, "imagingAffinity": 0.8, "focusDoseTolerance": 0.78, "bakeDevelopTolerance": 0.7, "thicknessControl": 0.68, "evidenceFlow": 0.8 }, "euv-scanner-like": { "coatAffinity": 0.66, "imagingAffinity": 0.82, "focusDoseTolerance": 0.58, "bakeDevelopTolerance": 0.62, "thicknessControl": 0.64, "evidenceFlow": 0.78 }, "coat-track-like": { "coatAffinity": 0.9, "imagingAffinity": 0.56, "focusDoseTolerance": 0.6, "bakeDevelopTolerance": 0.74, "thicknessControl": 0.86, "evidenceFlow": 0.76 }, "post-exposure-bake-track-like": { "coatAffinity": 0.76, "imagingAffinity": 0.62, "focusDoseTolerance": 0.64, "bakeDevelopTolerance": 0.88, "thicknessControl": 0.74, "evidenceFlow": 0.74 }, "develop-track-like": { "coatAffinity": 0.72, "imagingAffinity": 0.64, "focusDoseTolerance": 0.66, "bakeDevelopTolerance": 0.82, "thicknessControl": 0.7, "evidenceFlow": 0.72 } }, "scanner_track_balance_mode": { "scanner-centered-like": { "interfaceControl": 0.66, "overlayControl": 0.82, "trackControl": 0.54, "bakeDevelopCompatibility": 0.64, "evidenceFlow": 0.76, "modelLimitBurden": 0.44 }, "track-centered-like": { "interfaceControl": 0.82, "overlayControl": 0.62, "trackControl": 0.84, "bakeDevelopCompatibility": 0.8, "evidenceFlow": 0.74, "modelLimitBurden": 0.46 } }, "resist_coat_state": { "coat-constrained-like": { "coatUniformity": 0.18, "interfaceReadiness": 0.28, "imageBurden": 0.76 }, "interface-transitional-like": { "coatUniformity": 0.56, "interfaceReadiness": 0.54, "imageBurden": 0.46 }, "coat-supported-like": { "coatUniformity": 0.88, "interfaceReadiness": 0.86, "imageBurden": 0.18 } }, "focus_dose_state": { "focus-constrained-like": { "doseMargin": 0.62, "focusMargin": 0.2, "balanceMargin": 0.42, "imageBurden": 0.7 }, "dose-constrained-like": { "doseMargin": 0.24, "focusMargin": 0.68, "balanceMargin": 0.48, "imageBurden": 0.64 }, "focus-dose-supported-like": { "doseMargin": 0.86, "focusMargin": 0.84, "balanceMargin": 0.86, "imageBurden": 0.18 } }, "bake_develop_state": { "bake-develop-constrained-like": { "processMargin": 0.3, "developmentBurden": 0.78, "thermalMargin": 0.34 }, "bake-develop-supported-like": { "processMargin": 0.84, "developmentBurden": 0.2, "thermalMargin": 0.82 } }, "overlay_field_state": { "field-supported-like": { "overlayMargin": 0.84, "edgeBurden": 0.18, "fieldMargin": 0.82 }, "edge-overlay-constrained-like": { "overlayMargin": 0.42, "edgeBurden": 0.74, "fieldMargin": 0.42 } } }, "proxyEquations": { "ordered_state_norm": "round9(stateIndex / 7)", "coat_uniformity_readiness_proxy": "round9(clamp01(0.10 + 0.46*coat.coatUniformity + 0.18*family.coatAffinity + 0.14*chain.interfaceControl + 0.12*(1 - abs(stateNorm - 0.22))))", "resist_interface_readiness_proxy": "round9(clamp01(0.10 + 0.30*coat.interfaceReadiness + 0.22*coatUniformity + 0.16*chain.interfaceControl + 0.12*focusDose.balanceMargin + 0.10*(1 - coat.imageBurden)))", "focus_dose_balance_readiness_proxy": "round9(clamp01(0.08 + 0.30*focusDose.balanceMargin + 0.22*focusDose.doseMargin + 0.16*family.focusDoseTolerance + 0.14*chain.trackControl + 0.10*(1 - abs(stateNorm - 0.45))))", "aerial_image_resist_response_proxy": "round9(clamp01(0.08 + 0.24*resistInterfaceReadiness + 0.22*focusDoseBalance + 0.18*family.imagingAffinity + 0.12*stateNorm + 0.10*bakeDevelop.processMargin + 0.06*(1 - overlayField.edgeBurden)))", "overlay_control_readiness_proxy": "round9(clamp01(0.10 + 0.28*chain.overlayControl + 0.20*overlayField.overlayMargin + 0.18*bakeDevelop.thermalMargin + 0.14*family.bakeDevelopTolerance + 0.10*(1 - bakeDevelop.developmentBurden*stateNorm)))", "bake_develop_readiness_proxy": "round9(clamp01(0.10 + 0.30*bakeDevelop.processMargin + 0.20*family.bakeDevelopTolerance + 0.16*chain.bakeDevelopCompatibility + 0.14*overlayField.fieldMargin + 0.10*(1 - stateNorm*bakeDevelop.developmentBurden)))", "pattern_transfer_progress_proxy": "round9(clamp01(0.08 + 0.24*aerialImageResistResponse + 0.20*resistInterfaceReadiness + 0.18*bakeDevelopReadiness + 0.14*stateNorm + 0.10*overlayControlReadiness + 0.06*family.imagingAffinity))", "resist_profile_burden_proxy": "round9(clamp01(0.06 + 0.24*(1 - focusDose.focusMargin) + 0.18*(1 - aerialImageResistResponse) + 0.16*overlayField.edgeBurden + 0.14*stateNorm + 0.12*(1 - overlayControlReadiness) + 0.10*coat.imageBurden))", "stochastic_print_failure_burden_proxy": "round9(clamp01(0.05 + 0.30*resistProfileBurden*(0.45 + 0.55*stateNorm) + 0.20*(1 - patternTransferProgress) + 0.16*(1 - bakeDevelopReadiness) + 0.12*overlayField.edgeBurden + 0.10*coat.imageBurden))", "pattern_failure_escape_burden_proxy": "round9(clamp01(0.06 + 0.26*stochasticPrintFailureBurden + 0.22*(1 - coatUniformity) + 0.18*(1 - resistInterfaceReadiness) + 0.14*(1 - aerialImageResistResponse) + 0.12*focusDose.imageBurden + 0.08*bakeDevelop.developmentBurden))", "resist_thickness_control_proxy": "round9(clamp01(0.10 + 0.24*overlayControlReadiness + 0.20*chain.trackControl + 0.18*family.thicknessControl + 0.14*overlayField.fieldMargin + 0.08*(1 - resistProfileBurden) + 0.06*(1 - stateNorm)))", "within_field_pattern_uniformity_proxy": "round9(clamp01(0.10 + 0.24*patternTransferProgress + 0.20*overlayControlReadiness + 0.18*bakeDevelopReadiness + 0.14*aerialImageResistResponse + 0.08*(1 - stochasticPrintFailureBurden) + 0.06*thicknessControl))", "wafer_pattern_uniformity_proxy": "round9(clamp01(0.10 + 0.24*overlayControlReadiness + 0.20*thicknessControl + 0.18*bakeDevelopReadiness + 0.14*overlayField.fieldMargin + 0.08*(1 - resistProfileBurden) + 0.06*family.evidenceFlow))", "stochastic_escape_burden_proxy": "round9(clamp01(0.06 + 0.30*patternFailureEscapeBurden + 0.20*stochasticPrintFailureBurden + 0.16*coat.imageBurden + 0.14*focusDose.imageBurden + 0.10*(1 - withinFieldPatternUniformity) + 0.10*bakeDevelop.developmentBurden))", "process_drift_burden_proxy": "round9(clamp01(0.06 + 0.24*abs(stateNorm - 0.50) + 0.20*bakeDevelop.developmentBurden + 0.18*focusDose.imageBurden + 0.14*overlayField.edgeBurden + 0.10*(1 - chain.trackControl) + 0.08*coat.imageBurden))", "model_limit_burden_proxy": "round9(clamp01(0.08 + 0.28*chain.modelLimitBurden + 0.20*bakeDevelop.developmentBurden + 0.16*stateNorm + 0.12*focusDose.imageBurden + 0.10*overlayField.edgeBurden + 0.06*(1 - family.evidenceFlow)))", "metrology_readiness_proxy": "round9(clamp01(0.10 + 0.18*withinFieldPatternUniformity + 0.16*waferPatternUniformity + 0.16*(1 - patternFailureEscapeBurden) + 0.14*thicknessControl + 0.12*overlayControlReadiness + 0.08*stateNorm + 0.06*chain.evidenceFlow))", "etch_handoff_readiness_proxy": "round9(clamp01(0.08 + 0.22*thicknessControl + 0.20*waferPatternUniformity + 0.18*withinFieldPatternUniformity + 0.14*(1 - stochasticEscapeBurden) + 0.10*metrologyReadiness + 0.08*family.thicknessControl))", "scanner_track_handoff_readiness_proxy": "round9(clamp01(0.08 + 0.18*patternTransferProgress + 0.16*aerialImageResistResponse + 0.15*overlayControlReadiness + 0.14*withinFieldPatternUniformity + 0.12*waferPatternUniformity + 0.10*etchHandoffReadiness + 0.07*(1 - stochasticEscapeBurden)))" }, "integerLedgerEquations": { "scanner_input_total_tokens": "72 + 3*familyIndex + 2*chainIndex + bakeDevelopIndex + overlayFieldIndex + stateIndex", "coat_uniformity_support_tokens": "14 + 3*coatIndex + 2*overlayFieldIndex + (stateIndex % 2)", "focus_dose_support_tokens": "12 + 3*focusDoseIndex + 2*(1 - bakeDevelopIndex) + (stateIndex % 3)", "unresolved_scanner_input_tokens": "scanner_input_total_tokens - coat_uniformity_support_tokens - focus_dose_support_tokens", "scanner_input_ledger_residual": "scanner_input_total_tokens - coat_uniformity_support_tokens - focus_dose_support_tokens - unresolved_scanner_input_tokens", "resist_process_total_tokens": "82 + 2*familyIndex + 2*chainIndex + coatIndex + focusDoseIndex + stateIndex", "bake_response_tokens": "18 + 4*focusDoseIndex + 2*chainIndex + ((7 - stateIndex) % 3)", "develop_profile_tokens": "10 + 5*coatIndex + overlayFieldIndex + floor(stateIndex/2)", "unresolved_resist_process_tokens": "resist_process_total_tokens - bake_response_tokens - develop_profile_tokens", "resist_process_ledger_residual": "resist_process_total_tokens - bake_response_tokens - develop_profile_tokens - unresolved_resist_process_tokens", "lithography_handoff_total_tokens": "96 + 3*familyIndex + 2*focusDoseIndex + chainIndex + bakeDevelopIndex + stateIndex", "stochastic_review_tokens": "24 + 5*coatIndex + chainIndex + (stateIndex % 2)", "overlay_review_tokens": "18 + 4*focusDoseIndex + 2*bakeDevelopIndex + floor(stateIndex/3)", "metrology_review_tokens": "14 + 4*bakeDevelopIndex + (2 - coatIndex) + chainIndex", "unresolved_lithography_handoff_tokens": "lithography_handoff_total_tokens - stochastic_review_tokens - overlay_review_tokens - metrology_review_tokens", "lithography_handoff_ledger_residual": "lithography_handoff_total_tokens - stochastic_review_tokens - overlay_review_tokens - metrology_review_tokens - unresolved_lithography_handoff_tokens" }, "scannerTrackLithographyRegimePrecedence": [ "coat-uniformity-limited when coat uniformity readiness < 0.48", "resist-interface-limited when resist interface readiness < 0.52", "focus-dose-balance-limited when focus-dose balance readiness < 0.52", "overlay-readiness-limited when overlay control readiness < 0.54", "bake-develop-limited when bake-develop readiness < 0.54", "stochastic-pattern-limited when pattern-transfer progress < 0.58 or pattern-failure escape burden > 0.58", "etch-metrology-readiness-limited when etch handoff readiness < 0.60 or metrology readiness < 0.60 or model-limit burden > 0.60", "bounded-scanner-track-review otherwise" ], "decisionThresholds": { "coatUniformityLimited": 0.48, "resistInterfaceLimited": 0.52, "focusDoseBalanceLimited": 0.52, "overlayReadinessLimited": 0.54, "bakeDevelopLimited": 0.54, "patternTransferLimited": 0.58, "patternFailureEscapeHigh": 0.58, "etchReadinessLimited": 0.6, "metrologyReadinessLimited": 0.6, "modelLimitHigh": 0.6 }, "bandRules": { "commonReadiness": { "limitedBelow": 0.54, "boundedAtOrAbove": 0.68 }, "patternFailureEscape": { "lowerAtOrBelow": 0.4, "higherAbove": 0.58 }, "priority": { "highAbove": 0.58, "lowerAtOrBelow": 0.4 }, "measurement": { "planRequiredBelow": 0.66 }, "note": "All thresholds are original dimensionless categorical label rules, not physical limits, control limits, or acceptance criteria.", "yieldGate": { "patternContinuityBelow": 0.6, "stochasticEscapeAbove": 0.52, "withinFieldUniformityBelow": 0.6, "waferUniformityBelow": 0.58, "etchHandoffBelow": 0.64, "metrologyBelow": 0.66 }, "downstreamRieMaskReadiness": { "limitedBelow": 0.6, "boundedAtOrAbove": 0.68 }, "downstreamRiePatternUniformity": { "limitedIfEitherBelow": 0.6, "boundedIfBothAtOrAbove": 0.66 } }, "boundary": "Normalized outputs are teaching metadata only. They do not calculate or authorize wavelength, numerical aperture, mask, illumination, focus, dose, overlay, stage motion, resist identity, coating, thickness, bake, reaction-diffusion, development, dissolution, roughness, stochastic defects, pattern profile, etch mask performance, metrology result, equipment action, recipe, qualification, disposition, reliability, or production fitness.", "roleGatePrecedence": { "lithographyOperator": [ "review regime limitation first", "review process drift", "otherwise proceed to evidence review" ], "lithographyEngineer": [ "review regime limitation first", "review model and evidence boundary", "otherwise bounded comparison ready" ], "integration": "always blocked pending owned evidence and downstream review", "yield": [ "review pattern continuity", "review stochastic-defect burden", "review within-field or wafer pattern uniformity", "review RIE handoff and metrology", "otherwise bounded teaching review" ] }, "serialization": { "numericFormat": "finite decimal rounded to 9 places; no exponent notation", "integerLedgers": "base-10 integers with exact zero residuals", "categoricalLabels": "closed enumerations only", "csvJsonIdentity": "Every CSV cell must equal the canonical JSON value under string conversion." }, "validationGates": [ "complete Cartesian row order", "all eight regimes represented", "every closed categorical label represented", "20 normalized proxies finite in [0,1]", "three exact integer ledgers close at zero", "112 prohibited fields are numeric zero", "evidence pairs physically identical", "CSV and canonical JSON cell identity", "two isolated byte-identical reruns", "no generator import in independent verifier", "no source body or source numeric use", "public v109 hold and final hygiene" ], "reachabilityAmendments": [ { "id": "RA-001", "date": "2026-08-30", "reason": "The first deterministic sweep reached all eight regimes but masked four downstream labels after precedence filtering.", "changes": [ "yield review-etch-handoff threshold changed from <0.62 to <0.64", "yield review-metrology threshold changed from <0.62 to <0.66 after the etch-handoff branch", "downstream RIE mask-readiness limited band changed from <0.54 to <0.60 while bounded remains >=0.68", "downstream RIE pattern-uniformity limited condition changed from either proxy <0.54 to either proxy <0.60 while bounded remains both >=0.66" ], "invariants": [ "all 20 proxy equations unchanged", "all 16 integer ledger equations unchanged", "source, rights, axis, evidence-pair, prohibited-zero, and public-v109 boundaries unchanged" ] } ], "status": "metric-contract-locked" }