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"releaseDecision": "hold" }, "publicDelivery": { "mode": "metadata-manifest-plus-csv-rows", "rowsEmbedded": false, "rowArtifact": "litho-scanner-track-state-v1.csv", "rowArtifactSha256": "EF82471A54232DE3AB8D6ECA27362A01C5105F4D4A4C877A98B9DDA69F9EE2F4", "canonicalRowBearingArtifact": "litho-scanner-track-state-web-v1.json", "canonicalRowBearingArtifactSha256": "51A321C7FE083D69D2635DC0D3F4E39C9959046FB8A30ADA55BD2BC7F09892A8", "independentValidationArtifact": "validation-report-v1.json", "independentValidationArtifactSha256": "625B7EBAF8751BB9F0478211264DCDDBC99A8DBA0EE7111B8ABB61A138F39BCD", "sourceSpineArtifact": "litho-scanner-track-source-spine-v1.json", "sourceSpineArtifactSha256": "149E2AB7208BBB94C7BA436FFA9D00C7CF04DDDC07DF870DB93713E552EDDD38", "publicHoldArtifact": "public-hold-verification-v1.json", "publicHoldArtifactSha256": "AA2CEEDD0DF79114BDFB1D7E609D6F82172298387409013CC99AFE1CE0F4AC76" }, "contracts": { "state": { "file": "litho-scanner-track-state-contract-v1.json", "sha256": "93A86D46F96D1766A385AEC09968D2CD07382F2207327736103B65678EB1DE41" }, "metrics": { "file": "litho-scanner-track-metric-contract-v1.json", "sha256": "DD914086E639AEDCC4727CAAF5FF8F20155F16A87A1A7DB775FF12DBDBF0A715" }, "verifier": { "file": "independent-verifier-contract-v1.json", "sha256": "12D6EF269FF8B8479479821F43E3B9C005D7233AA1A293BC593F6759EA84AEDD" }, "sourceCatalog": { "file": "source_catalog_v1.json", "sha256": "FCB44429DA48027A03685D11FCBA75A1C84A75A17CA9641D626B67B25D3417C5" }, "claimMap": { "file": "source_claim_map_v1.json", "sha256": "BCE867907F34B69F5EA12DA8AAE96D3A9C49D481F46D79CA85E1E6169DCBAF5A" } }, "scannerTrackLithographyRegimes": [ "coat-uniformity-limited", "resist-interface-limited", "focus-dose-balance-limited", "overlay-readiness-limited", "bake-develop-limited", "stochastic-pattern-limited", "etch-metrology-readiness-limited", "bounded-scanner-track-review" ], "requiredPhenomena": [ "scanner-track-family-and-balance-separation", "coat-uniformity-and-resist-interface-readiness", "focus-dose-window-and-image-response", "overlay-field-and-edge-readiness", "post-exposure-bake-and-development-readiness", "stochastic-printing-profile-and-escape-burden", "pattern-uniformity-metrology-and-etch-handoff", "traceability-model-limit-and-owned-evidence-boundary" ], "upstreamBridges": [ { "sourceExperimentId": "SA-PROC-ETCH-WET-019", "allowedFields": [ "upstream_wet_surface_readiness_band", "upstream_wet_adhesion_readiness_band", "upstream_wet_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-PROC-DEP-CVD-PECVD-013", "allowedFields": [ "upstream_cvd_hardmask_readiness_band", "upstream_cvd_topography_readiness_band", "upstream_cvd_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-PROC-DEP-ALD-PEALD-014", "allowedFields": [ "upstream_ald_interface_readiness_band", "upstream_ald_surface_risk_band", "upstream_ald_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false } ], "downstreamBridge": { "targetExperimentId": "SA-PROC-ETCH-RIE-010", "allowedFields": [ "downstream_rie_mask_readiness_band", "downstream_rie_pattern_uniformity_band", "downstream_rie_evidence_gate", "downstream_pattern_continuity_band", "downstream_stochastic_defect_priority_band", "downstream_overlay_uniformity_band", "downstream_inspection_priority_band", "downstream_inspection_evidence_gate", "teaching_scanner_track_handoff_gate" ], "physicalUnitsAllowed": false, "automaticRecipeHandoffAllowed": false, "automaticFilmHandoffAllowed": false, "automaticEquipmentActionAllowed": false, "automaticDispositionAllowed": false }, "replacementEvidenceRequirements": [ "accountable run, lot, wafer, scanner, track, process, metrology, integration, yield, and disposition ownership", "revisioned scanner, coater, bake, develop, transfer, environmental, and measurement configuration", "owned incoming surface, hardmask, underlayer, topography, contamination, adhesion, and prior-process histories", "owned resist, solvent, developer, underlayer, topcoat, rinse, and material-compatibility evidence", "owned coating, dispense, spin, edge treatment, thickness, uniformity, and defect evidence", "owned wavelength, illumination, mask, reticle, optics, focus, dose, stage, field, and alignment evidence", "owned post-apply bake, post-exposure bake, reaction-diffusion, development, rinse, and queue-history evidence", "owned feature, pitch, density, topography, field, edge, wafer-position, and pattern-context evidence", "owned CD, overlay, focus, thickness, profile, roughness, residue, collapse, and stochastic-defect evidence", "owned within-field, field-to-field, within-wafer, wafer-to-wafer, run-to-run, and tool-to-tool variation evidence", "owned optical and e-beam metrology methods, calibration, uncertainty, threshold, sampling, raw-data lineage, and review evidence", "explicit separation of DUV dry, DUV immersion, EUV, coat, PEB, and develop claims without cross-family numeric transfer", "explicit validation of every imaging, resist, reaction-diffusion, dissolution, stochastic, overlay, or pattern-transfer model before use", "independent review of model boundary, proxy ownership, replacement completeness, and non-predictive teaching use", "downstream RIE and inspection approval plus accountable integration, yield, reliability, qualification, and disposition review", "documented confirmation that no normalized label is used as a scanner setting, track recipe, process limit, or production decision" ], "requiredSections": [ "Explore", "Run Card", "Export", "Methods", "Limits", "Evidence" ], "limitation": "Original dimensionless scanner/track lithography teaching replay only. No wavelength, numerical aperture, illumination, mask, focus, dose, overlay, resist composition, film thickness, coating dynamics, bake or develop kinetics, critical dimension, line-edge roughness, stochastic defect probability, profile geometry, RIE target, metrology result, equipment action, recipe, qualification, disposition, reliability, or production fitness is computed or implied." }