{
  "schema": "semiagora.github-seed-simulation.v1",
  "execution_mode": "precomputed-only",
  "experiment_id": "SA-SEED-PROC-LITHO-WINDOW-001",
  "slug": "lithography-focus-exposure-window",
  "title": "Lithography focus-exposure process window",
  "model_boundary": "normalized process-window grid, no resist, OPC, mask, or scanner recipe",
  "public_boundary": [
    "No live server solver execution.",
    "No PDK or compact-model ingestion.",
    "No process recipe, equipment operation, qualification signoff, upload, account, payment, comment, newsletter signup, or submission workflow.",
    "Third-party GitHub tools remain source links unless separately reviewed."
  ],
  "headline_metric": {
    "name": "passing_grid_points",
    "value": 31,
    "total": 81
  },
  "rows": [
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      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": -80,
      "exposure_delta_pct": -8,
      "cd_error_nm": 14.88,
      "overlay_proxy_nm": 3.32,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": -80,
      "exposure_delta_pct": -6,
      "cd_error_nm": 14.04,
      "overlay_proxy_nm": 3.18,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "exposure_delta_pct": -4,
      "cd_error_nm": 13.2,
      "overlay_proxy_nm": 3.04,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": -80,
      "exposure_delta_pct": -2,
      "cd_error_nm": 12.36,
      "overlay_proxy_nm": 2.9,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
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      "exposure_delta_pct": 0,
      "cd_error_nm": 11.52,
      "overlay_proxy_nm": 2.76,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "focus_nm": -80,
      "exposure_delta_pct": 2,
      "cd_error_nm": 10.68,
      "overlay_proxy_nm": 2.9,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "focus_nm": -80,
      "exposure_delta_pct": 4,
      "cd_error_nm": 9.84,
      "overlay_proxy_nm": 3.04,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "exposure_delta_pct": 6,
      "cd_error_nm": 9,
      "overlay_proxy_nm": 3.18,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": -80,
      "exposure_delta_pct": 8,
      "cd_error_nm": 8.16,
      "overlay_proxy_nm": 3.32,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": -60,
      "exposure_delta_pct": -8,
      "cd_error_nm": 9.84,
      "overlay_proxy_nm": 3.08,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "exposure_delta_pct": -6,
      "cd_error_nm": 9,
      "overlay_proxy_nm": 2.94,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "exposure_delta_pct": -4,
      "cd_error_nm": 8.16,
      "overlay_proxy_nm": 2.8,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": -60,
      "exposure_delta_pct": -2,
      "cd_error_nm": 7.32,
      "overlay_proxy_nm": 2.66,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": -60,
      "exposure_delta_pct": 0,
      "cd_error_nm": 6.48,
      "overlay_proxy_nm": 2.52,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": -60,
      "exposure_delta_pct": 2,
      "cd_error_nm": 5.64,
      "overlay_proxy_nm": 2.66,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": -60,
      "exposure_delta_pct": 4,
      "cd_error_nm": 4.8,
      "overlay_proxy_nm": 2.8,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": -60,
      "exposure_delta_pct": 6,
      "cd_error_nm": 3.96,
      "overlay_proxy_nm": 2.94,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": -60,
      "exposure_delta_pct": 8,
      "cd_error_nm": 3.12,
      "overlay_proxy_nm": 3.08,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "cd_error_nm": 6.24,
      "overlay_proxy_nm": 2.84,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "focus_nm": -40,
      "exposure_delta_pct": -6,
      "cd_error_nm": 5.4,
      "overlay_proxy_nm": 2.7,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": -40,
      "exposure_delta_pct": -4,
      "cd_error_nm": 4.56,
      "overlay_proxy_nm": 2.56,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "overlay_proxy_nm": 2.42,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
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    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "cd_error_nm": 2.88,
      "overlay_proxy_nm": 2.28,
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      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
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    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "cd_error_nm": 2.04,
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      "pass_window": true,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
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    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
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    {
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    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
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    {
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    {
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      "pass_window": true,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
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    {
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      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "pass_window": true,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "overlay_proxy_nm": 2.6,
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      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "overlay_proxy_nm": 2.36,
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      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 0,
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      "cd_error_nm": 2.52,
      "overlay_proxy_nm": 2.22,
      "pass_window": true,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 0,
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      "cd_error_nm": 1.68,
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      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "pass_window": true,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "focus_nm": 20,
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      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "overlay_proxy_nm": 2.32,
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      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "focus_nm": 20,
      "exposure_delta_pct": -2,
      "cd_error_nm": 1.56,
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      "pass_window": true,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 20,
      "exposure_delta_pct": 0,
      "cd_error_nm": 0.72,
      "overlay_proxy_nm": 2.04,
      "pass_window": true,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 20,
      "exposure_delta_pct": 2,
      "cd_error_nm": -0.12,
      "overlay_proxy_nm": 2.18,
      "pass_window": true,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 20,
      "exposure_delta_pct": 4,
      "cd_error_nm": -0.96,
      "overlay_proxy_nm": 2.32,
      "pass_window": true,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 20,
      "exposure_delta_pct": 6,
      "cd_error_nm": -1.8,
      "overlay_proxy_nm": 2.46,
      "pass_window": true,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 20,
      "exposure_delta_pct": 8,
      "cd_error_nm": -2.64,
      "overlay_proxy_nm": 2.6,
      "pass_window": true,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 40,
      "exposure_delta_pct": -8,
      "cd_error_nm": 6.24,
      "overlay_proxy_nm": 2.84,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 40,
      "exposure_delta_pct": -6,
      "cd_error_nm": 5.4,
      "overlay_proxy_nm": 2.7,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 40,
      "exposure_delta_pct": -4,
      "cd_error_nm": 4.56,
      "overlay_proxy_nm": 2.56,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "focus_nm": 40,
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      "cd_error_nm": 3.72,
      "overlay_proxy_nm": 2.42,
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      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "focus_nm": 40,
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      "cd_error_nm": 2.88,
      "overlay_proxy_nm": 2.28,
      "pass_window": true,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
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      "focus_nm": 40,
      "exposure_delta_pct": 2,
      "cd_error_nm": 2.04,
      "overlay_proxy_nm": 2.42,
      "pass_window": true,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 40,
      "exposure_delta_pct": 4,
      "cd_error_nm": 1.2,
      "overlay_proxy_nm": 2.56,
      "pass_window": true,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 40,
      "exposure_delta_pct": 6,
      "cd_error_nm": 0.36,
      "overlay_proxy_nm": 2.7,
      "pass_window": true,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 40,
      "exposure_delta_pct": 8,
      "cd_error_nm": -0.48,
      "overlay_proxy_nm": 2.84,
      "pass_window": true,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 60,
      "exposure_delta_pct": -8,
      "cd_error_nm": 9.84,
      "overlay_proxy_nm": 3.08,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 60,
      "exposure_delta_pct": -6,
      "cd_error_nm": 9,
      "overlay_proxy_nm": 2.94,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 60,
      "exposure_delta_pct": -4,
      "cd_error_nm": 8.16,
      "overlay_proxy_nm": 2.8,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 60,
      "exposure_delta_pct": -2,
      "cd_error_nm": 7.32,
      "overlay_proxy_nm": 2.66,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 60,
      "exposure_delta_pct": 0,
      "cd_error_nm": 6.48,
      "overlay_proxy_nm": 2.52,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 60,
      "exposure_delta_pct": 2,
      "cd_error_nm": 5.64,
      "overlay_proxy_nm": 2.66,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 60,
      "exposure_delta_pct": 4,
      "cd_error_nm": 4.8,
      "overlay_proxy_nm": 2.8,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 60,
      "exposure_delta_pct": 6,
      "cd_error_nm": 3.96,
      "overlay_proxy_nm": 2.94,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 60,
      "exposure_delta_pct": 8,
      "cd_error_nm": 3.12,
      "overlay_proxy_nm": 3.08,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 80,
      "exposure_delta_pct": -8,
      "cd_error_nm": 14.88,
      "overlay_proxy_nm": 3.32,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 80,
      "exposure_delta_pct": -6,
      "cd_error_nm": 14.04,
      "overlay_proxy_nm": 3.18,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 80,
      "exposure_delta_pct": -4,
      "cd_error_nm": 13.2,
      "overlay_proxy_nm": 3.04,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 80,
      "exposure_delta_pct": -2,
      "cd_error_nm": 12.36,
      "overlay_proxy_nm": 2.9,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 80,
      "exposure_delta_pct": 0,
      "cd_error_nm": 11.52,
      "overlay_proxy_nm": 2.76,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 80,
      "exposure_delta_pct": 2,
      "cd_error_nm": 10.68,
      "overlay_proxy_nm": 2.9,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 80,
      "exposure_delta_pct": 4,
      "cd_error_nm": 9.84,
      "overlay_proxy_nm": 3.04,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 80,
      "exposure_delta_pct": 6,
      "cd_error_nm": 9,
      "overlay_proxy_nm": 3.18,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    },
    {
      "simulation_id": "SA-SEED-PROC-LITHO-WINDOW-001",
      "domain": "process",
      "focus_nm": 80,
      "exposure_delta_pct": 8,
      "cd_error_nm": 8.16,
      "overlay_proxy_nm": 3.32,
      "pass_window": false,
      "teaching_point": "A process window is the usable intersection of CD, focus, exposure, and overlay constraints."
    }
  ],
  "methods": [
    "CD error is modeled as a quadratic focus term plus exposure sensitivity.",
    "Overlay proxy increases with absolute focus and exposure offset.",
    "A grid point passes only when both CD and overlay proxies remain inside the teaching thresholds."
  ],
  "limitations": [
    "No mask, resist chemistry, OPC, scanner, dose recipe, focus-exposure matrix from a fab, or calibrated wafer data.",
    "No facility workflow or process recipe is exposed.",
    "Metrology such as CD-SEM, overlay, and wafer maps is required before calibrated claims."
  ],
  "evidence": [
    "Seed sweep JSON stores every focus, exposure, CD, overlay, and pass/fail row.",
    "CSV export preserves the process-window grid.",
    "Promotion queue records this as a P0 process simulation candidate."
  ],
  "sources": [
    {
      "label": "SemiAgora GitHub seed sweep",
      "url": "https://github.com/CMU-SAFARI/ramulator2",
      "note": "Public-source expedition anchor; process cards remain original normalized teaching models with no recipe settings."
    },
    {
      "label": "DEVSIM",
      "url": "https://github.com/devsim/devsim",
      "note": "Open device/TCAD reference used as a future solver-back upgrade candidate, not executed by this process card."
    }
  ],
  "source_seed_run": "07_assets/factory_lab/experiments/GITHUB_OPEN_SOURCE_SEED_SWEEP_2026-08-14/"
}