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"metrics": { "file": "lpcvd-furnace-metric-contract-v1.json", "sha256": "321058BC240524197B5E3B6D8075349FB0D3E98268D6F6D7AF64C1861765A758" }, "verifier": { "file": "independent-verifier-contract-v1.json", "sha256": "2FB97ACE0420E714E5B26B31D2C46E0EA4B3E5312C1B53ACB2F64DED3A067651" }, "sourceCatalog": { "file": "source_catalog_v1.json", "sha256": "236EC50739D48A59CE724DA89701A18E7E78A4B7CEE2713F6EED0C83742166A5" }, "claimMap": { "file": "source_claim_map_v1.json", "sha256": "D9D4895B6DD06B5C15FB8C88BF5060926C949108B629A7543D86814FEAC6F958" } }, "furnaceRegimes": [ "thermal-ramp-limited", "reactant-delivery-starved", "surface-growth-limited", "longitudinal-depletion-limited", "thermal-uniformity-limited", "film-property-limited", "metrology-readiness-limited", "bounded-batch-furnace" ], "requiredPhenomena": [ "process-family-hot-wall-and-load-context", "reactant-delivery-depletion-and-interwafer-access", "surface-growth-and-reaction-posture", "boat-position-load-end-and-center-context", "ramp-soak-thermal-history-and-uniformity", "thickness-within-wafer-and-wafer-to-wafer-variation", "stress-composition-interface-and-surface-readiness", "metrology-traceability-throughput-and-handoff" ], "upstreamBridges": [ { "sourceExperimentId": "SA-EQP-VAC-GAS-009", "allowedFields": [ "upstream_vac_gas_delivery_band", "upstream_vac_gas_stability_band", "upstream_vac_gas_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-PROC-DEP-CVD-PECVD-013", "allowedFields": [ "upstream_cvd_pecvd_reaction_band", "upstream_cvd_pecvd_uniformity_band", "upstream_cvd_pecvd_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-PROC-DEP-ALD-PEALD-014", "allowedFields": [ "upstream_ald_surface_band", "upstream_ald_stress_band", "upstream_ald_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-PROC-ETCH-WET-019", "allowedFields": [ "upstream_wet_surface_band", "upstream_wet_residue_band", "upstream_wet_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false } ], "downstreamBridge": { "targetExperimentId": "SA-MET-INSPECTION-030", "allowedFields": [ "downstream_thickness_uniformity_band", "downstream_thermal_history_band", "downstream_film_property_priority_band", "downstream_metrology_priority_band", "downstream_inspection_evidence_gate", "teaching_furnace_handoff_gate" ], "physicalUnitsAllowed": false, "automaticRecipeHandoffAllowed": false, "automaticFilmHandoffAllowed": false, "automaticEquipmentActionAllowed": false, "automaticDispositionAllowed": false }, "replacementEvidenceRequirements": [ "accountable run identifier, lot and wafer ownership, process owner, equipment owner, metrology owner, and disposition owner", "revisioned furnace, process tube, liner, boat, injector, exhaust, heater-zone, thermocouple, controller, and sequencing configuration", "owned substrate, incoming surface, target film or conversion layer, underlying layer, interface, and prior-process histories", "owned precursor, reactant, carrier, diluent, byproduct, wall-condition, contamination, and exhaust evidence appropriate to each claim", "owned process-family classification and material-specific growth or conversion evidence", "boat slot, wafer position, load size, spacing, dummy-wafer, baffle, load-end, and center-load ownership", "owned pressure, delivery, flow, residence, depletion, interwafer-access, pumping, and leak-state evidence", "owned furnace-wall, wafer, ramp, soak, cooldown, zone, and spatial thermal histories with calibrated sensors and traceability", "owned surface-reaction, gas-phase-reaction, nucleation, growth, oxidation, nitridation, and model-limit measurements with uncertainty", "owned thickness, within-wafer, wafer-to-wafer, load-end, load-center, lot-to-lot, and equipment-to-equipment variation evidence", "owned composition, stoichiometry, density, refractive-index, resistivity, and material-property measurements appropriate to the film", "owned stress, curvature, defect, particle, roughness, interface, contamination, and surface-readiness evidence", "owned endpoint or completion signal, algorithm, threshold, latency, stop action, and false-trigger review where applicable", "owned tube history, wall deposition, seasoning, clean, maintenance, consumable, leak-check, and matching evidence", "owned loading, unload, queue, cycle, utilization, throughput, and equipment-availability evidence", "owned metrology methods, sampling plan, calibration state, detection limits, uncertainty, and raw-data lineage", "explicit separation of furnace-wall state, controller state, wafer thermal state, and film-result evidence", "explicit validation of any physical oxidation, deposition, nitridation, thermal, transport, or stress model before use", "independent review of model boundary, proxy ownership, replacement completeness, and non-predictive teaching use", "downstream inspection approval and accountable integration, yield, reliability, and disposition review" ], "requiredSections": [ "Explore", "Run Card", "Export", "Methods", "Limits", "Evidence" ], "limitation": "Original dimensionless batch-furnace teaching replay only. No physical chemistry, material identity, sequence, temperature, ramp, soak, pressure, flow, transport, depletion fraction, oxidation, nitridation, deposition rate, thickness, uniformity, composition, stress, surface, interface, defect, metrology result, equipment state, recipe, qualification, reliability, or production fitness is computed or implied." }