{ "schema": "semiagora.mask-reticle-public-manifest.v1", "version": "2026-08-30-mask-reticle-packet-v1", "packetVersion": "2026-08-30-mask-reticle-v1", "experimentId": "SA-PROC-MASK-RETICLE-035", "generatedAt": "2026-08-30T00:00:00+09:00", "status": "packet-only-not-deployed", "counts": { "rows": 6912, "physicalRows": 3456, "evidencePairs": 3456, "evidencePairComparisons": 656640, "columns": 192, "sources": 20, "claimNodes": 16, "normalizedProxyEquations": 20, "exactIntegerLedgerEquations": 16, "exactIntegerLedgers": 3, "prohibitedZeroFields": 112 }, "axes": [ { "id": "mask_reticle_family", "count": 3, "values": [ "optical-binary-phase-shift-mask-like", "euv-reflective-mask-like", "curvilinear-data-intensive-mask-like" ], "meaning": "Categorical mask or reticle family only; not a product identity, design ownership, blank specification, writer capability, exposure recipe, or qualification." }, { "id": "data_write_state", "count": 4, "values": [ "data-fracture-write-constrained-like", 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image, sampling plan, or escape-rate result." }, { "id": "repair_qualification_state", "count": 2, "values": [ "repair-qualification-constrained-like", "repair-qualification-supported-like" ], "meaning": "Categorical repair and qualification evidence posture only; not a repair coordinate, recipe, residual measurement, acceptance result, or production release." }, { "id": "printability_transfer_state", "count": 2, "values": [ "printability-transfer-supported-like", "printability-transfer-constrained-like" ], "meaning": "Categorical printability and wafer-transfer evidence posture only; not an aerial image, exposure dose, focus setting, process window, wafer result, or lithography approval." }, { "id": "ordered_mask_state", "count": 8, "values": [ "mask-state-a", "mask-state-b", "mask-state-c", "mask-state-d", "mask-state-e", "mask-state-f", "mask-state-g", "mask-state-h" ], "meaning": "Deterministic teaching sweep index only; it is not time, process order, writer duration, mask age, 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"linkStatus": "pass", "reachable": 20, "accessGated": 0, "hardFailures": 0, "networkErrors": 0, "sourceBodiesStored": false, "sourceNumericUse": "none" }, "currentPublicBaseline": { "version": "v109", "versionId": "appgprj_6a6f4d3affc0819189d99a8f29062540~appgver_005d791cd0f881919fe28dce4fc90e8f", "deploymentId": "appgdep_6a91677cd40081919caf523a472130f6", "sourceCommit": "c3888cc26eb434d9ca88e76889f781194044db4a", "changedByThisPacket": false, "publicVersionReserved": "none", "releaseDecision": "hold" }, "publicDelivery": { "mode": "metadata-manifest-plus-csv-rows", "rowsEmbedded": false, "rowArtifact": "mask-reticle-state-v1.csv", "rowArtifactSha256": "84EACEF6D7AF9F20B71E221CC4ED3C88CB9BC252E2F5F7AEB20786BF0F618EA0", "canonicalRowBearingArtifact": "mask-reticle-state-web-v1.json", "canonicalRowBearingArtifactSha256": "BBEAC0467AD0EDBB695A9092260FD60FA044CFA1ED4383621E500A9028F319EC", "independentValidationArtifact": "validation-report-v1.json", "independentValidationArtifactSha256": "FBF562F34AB334005E5B1146E5DE3D3691D781267CBCEFC3F69CFB7E9FC10102", "sourceSpineArtifact": "mask-reticle-source-spine-v1.json", "sourceSpineArtifactSha256": "BFCB833359D5FECEFD0CA089E941E5A9C853890AA63183CF6F8367F45D4739CE", "publicHoldArtifact": "public-hold-verification-v1.json", "publicHoldArtifactSha256": "97F010714B2A571D785D2CE5EF56065243D8B9272FE3282C79304EE2791912F1" }, "contracts": { "state": { "file": "mask-reticle-state-contract-v1.json", "sha256": "EB5C6EAB12A6C51BFFE320E89FE783B0919889251771284FC5989D3988C4E768" }, "metrics": { "file": "mask-reticle-metric-contract-v1.json", "sha256": "6BFB29DE96606D962C83683C515E747BCDB5BC8A6C1BB03C31D9DE23BA02FA09" }, "verifier": { "file": "independent-verifier-contract-v1.json", "sha256": "8EC884A97E82F2527B30FF0469BEFE15D483CBBFF9CC0C1D01E7B68580A96B25" }, "sourceCatalog": { "file": "source_catalog_v1.json", "sha256": "EA33C001151E2BD362CE7BF4A778D3F9B2F4AD99C237067D52DC2A1B33D4A03A" }, "claimMap": { "file": "source_claim_map_v1.json", "sha256": "C01160581C70A63A331395CF790A123FE45BAC9B38958B51E42A6BA63F47255A" } }, "maskReticleRegimes": [ "data-integrity-limited", "write-process-limited", "placement-cd-limited", "defect-inspection-limited", "repair-qualification-limited", "printability-evidence-limited", "traceability-model-limit-limited", "bounded-mask-reticle-review" ], "requiredPhenomena": [ "mask-family-data-write-process-inspection-repair-and-wafer-transfer-separation", "design-database-oasis-job-deck-fracture-write-and-traceability-evidence-separation", "blank-pattern-defect-placement-registration-cd-and-uniformity-evidence-separation", "inspection-sensitivity-nuisance-classification-sampling-and-uncertainty-separation", "repair-method-repair-residual-qualification-and-printability-evidence-separation", "optical-euv-curvilinear-and-high-na-applicability-boundary", "facility-sensor-metrology-scanner-clean-surface-and-mask-shop-bridge-separation", "mask-data-process-metrology-lithography-model-limit-and-owned-action-boundary" ], "upstreamBridges": [ { "sourceExperimentId": "SA-EQP-FACILITY-ABATEMENT-034", "allowedFields": [ "downstream_mask_reticle_readiness_band", "downstream_gas_delivery_priority_band", "downstream_vacuum_foreline_priority_band", "downstream_exhaust_abatement_priority_band", "downstream_model_limit_priority_band", "downstream_mask_reticle_evidence_gate", "downstream_factory_evidence_gate", "teaching_facility_abatement_handoff_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-EQP-ENDPOINT-SENSOR-029", "allowedFields": [ "downstream_inspection_sensor_readiness_band", "downstream_measurement_traceability_band", "downstream_sampling_priority_band", "downstream_endpoint_disagreement_priority_band", "downstream_uncertainty_priority_band", "downstream_inspection_evidence_gate", "downstream_metrology_evidence_gate", "teaching_endpoint_sensor_handoff_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-MET-INSPECTION-030", "allowedFields": [ "downstream_fdc_measurement_readiness_band", "downstream_measurement_traceability_band", "downstream_sampling_priority_band", "downstream_nuisance_priority_band", "downstream_uncertainty_priority_band", "downstream_fdc_evidence_gate", "downstream_yield_evidence_gate", "teaching_metrology_handoff_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-PROC-LITHO-SCANNER-TRACK-024", "allowedFields": [ "downstream_rie_mask_readiness_band", "downstream_rie_pattern_uniformity_band", "downstream_rie_evidence_gate", "downstream_pattern_continuity_band", "downstream_stochastic_defect_priority_band", "downstream_overlay_uniformity_band", "downstream_inspection_priority_band", "downstream_inspection_evidence_gate", "teaching_scanner_track_handoff_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-PROC-CLEAN-SURFACE-027", "allowedFields": [ "downstream_cmp_surface_readiness_band", "downstream_cmp_particle_residue_risk_band", "downstream_cmp_oxide_wetting_band", "downstream_cmp_adhesion_readiness_band", "downstream_cmp_collapse_priority_band", "downstream_metrology_priority_band", "downstream_cmp_evidence_gate", "downstream_metrology_evidence_gate", "teaching_clean_surface_handoff_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false } ], "downstreamBridge": { "targetExperimentId": "SA-PROC-SUBSTRATE-WAFERING-036", "allowedFields": [ "downstream_substrate_wafering_readiness_band", "downstream_data_integrity_priority_band", "downstream_placement_cd_priority_band", "downstream_defect_inspection_priority_band", "downstream_model_limit_priority_band", "downstream_substrate_wafering_evidence_gate", "downstream_materials_evidence_gate", "teaching_mask_reticle_handoff_gate" ], "physicalUnitsAllowed": false, "automaticRecipeHandoffAllowed": false, "automaticMaskActionAllowed": false, "automaticExposureActionAllowed": false, "automaticEquipmentActionAllowed": false, "automaticDispositionAllowed": false }, "replacementEvidenceRequirements": [ "accountable design owner, mask shop, blank, mask, reticle, job, lot, wafer, exposure tool, and disposition ownership", "revisioned design database, OASIS payload, job deck, fracture configuration, writer configuration, inspection flow, repair flow, and change control", "owned blank, substrate, absorber, multilayer, resist, coating, process, and material-compatibility evidence", "owned placement, registration, CD, uniformity, coordinate-system, calibration, traceability, uncertainty, acceptance, and approval evidence", "owned blank-defect, patterned-defect, contamination, particle, inspection, classification, nuisance, sampling, and escape evidence", "owned writer stage, beam, drift, write-process, resist-process, transfer, cleaning, and handling evidence", "owned repair method, repair coordinate, material interaction, residual, contamination, reinspection, and qualification evidence", "owned optical, EUV, curvilinear, high-NA, fiducial, alignment, and exposure-system applicability evidence", "owned aerial-image, printability, programmed-defect, process-window, wafer-transfer, and correlation evidence", "owned mask CD XML, measurement schema, metadata, revision, timestamp, provenance, and retention evidence", "owned inspection detector, threshold, sensitivity, nuisance, false-association, review, and escalation evidence", "owned facility/abatement, endpoint sensor, inspection/metrology, scanner/track, and clean-surface bridge evidence", "owned failure, data corruption, write excursion, defect escape, repair excursion, handling damage, and contamination evidence", "approved mask-data engineering, mask-process engineering, mask-metrology engineering, lithography integration, quality, and change-control review", "accountable evidence owner, revision, timestamp, retention, qualification, release, hold, escalation, and disposition boundary", "owned source rights, citation link, bibliographic metadata, applicability, access-status, and evidence-boundary records" ], "requiredSections": [ "Explore", "Run Card", "Export", "Methods", "Limits", "Evidence" ], "limitation": "Original dimensionless mask and reticle evidence teaching replay only. No physical design database, job deck, write setting, placement or CD result, defect map, inspection threshold, repair criterion, printability result, exposure setting, equipment action, qualification, disposition, or production fitness is computed or implied." }