# Plasma Etch Heteroscedastic UQ Replay Model Card

Version: 2026-08-19-v76

## Purpose

This browser lab teaches why an etch window needs both mean response and uncertainty response. It uses original synthetic factor-class rows and proxy metrics.

## Public Boundary

- No process recipe.
- No gas-ratio recommendation.
- No equipment-control instruction.
- No chamber, wafer, or fab qualification.
- No copied paper data, plots, figures, or text.

## Evidence

Source signal: https://arxiv.org/abs/2511.04990v1

Daily run: 07_assets/factory_lab/daily/2026-08-19/20260819_135955/