{
  "schema": "semiagora.daily-signal-simulation.v1",
  "execution_mode": "precomputed-only",
  "experiment_id": "SA-PROC-UQ-002-PLASMA-ETCH-HET-UQ-001",
  "slug": "plasma-etch-heteroscedastic-uq",
  "title": "Plasma etch heteroscedastic UQ",
  "model_boundary": "normalized response-surface and heteroscedastic uncertainty model, no chamber recipe",
  "public_boundary": [
    "No live server solver execution.",
    "No process recipe, chamber setting, endpoint workflow, equipment operation, qualification signoff, upload, account, payment, comment, newsletter signup, or submission workflow.",
    "Third-party sources remain link-only anchors unless separately reviewed for rights, models, and dependencies."
  ],
  "headline_metric": {
    "name": "Best safe optimizer score",
    "value": 0.6024,
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      "feature_aspect_ratio": 1,
      "wafer_zone": "center",
      "bias_class": "nominal",
      "anisotropy_index": 0.771,
      "selectivity_proxy": 3.634,
      "cd_bias_nm": 1.35,
      "uncertainty_sigma": 0.047,
      "pass_probability_proxy": 0.6235,
      "optimizer_score": 0.6024
    }
  },
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      "wafer_zone": "center",
      "bias_class": "gentle",
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      "selectivity_proxy": 4.004,
      "cd_bias_nm": -0.65,
      "uncertainty_sigma": 0.0645,
      "pass_probability_proxy": 0.5976,
      "optimizer_score": 0.5686
    },
    {
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      "feature_aspect_ratio": 1,
      "wafer_zone": "center",
      "bias_class": "nominal",
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      "selectivity_proxy": 3.634,
      "cd_bias_nm": 1.35,
      "uncertainty_sigma": 0.047,
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      "optimizer_score": 0.6024
    },
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      "bias_class": "aggressive",
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      "selectivity_proxy": 3.264,
      "cd_bias_nm": 3.35,
      "uncertainty_sigma": 0.0645,
      "pass_probability_proxy": 0.5839,
      "optimizer_score": 0.5549
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      "uncertainty_sigma": 0.0789,
      "pass_probability_proxy": 0.5561,
      "optimizer_score": 0.5206
    },
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      "bias_class": "nominal",
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      "cd_bias_nm": 2.79,
      "uncertainty_sigma": 0.0614,
      "pass_probability_proxy": 0.5482,
      "optimizer_score": 0.5206
    },
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      "wafer_zone": "mid-radius",
      "bias_class": "aggressive",
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      "selectivity_proxy": 3.188,
      "cd_bias_nm": 4.79,
      "uncertainty_sigma": 0.0789,
      "pass_probability_proxy": 0.5087,
      "optimizer_score": 0.4732
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      "optimizer_score": 0.4286
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      "uncertainty_sigma": 0.0776,
      "pass_probability_proxy": 0.4634,
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      "bias_class": "aggressive",
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      "cd_bias_nm": 8.84,
      "uncertainty_sigma": 0.1149,
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      "optimizer_score": 0.1707
    },
    {
      "domain": "process",
      "feature_aspect_ratio": 4,
      "wafer_zone": "edge",
      "bias_class": "gentle",
      "anisotropy_index": 0.515,
      "selectivity_proxy": 3.3025,
      "cd_bias_nm": 6.46,
      "uncertainty_sigma": 0.1311,
      "pass_probability_proxy": 0.1852,
      "optimizer_score": 0.1262
    },
    {
      "domain": "process",
      "feature_aspect_ratio": 4,
      "wafer_zone": "edge",
      "bias_class": "nominal",
      "anisotropy_index": 0.585,
      "selectivity_proxy": 2.9325,
      "cd_bias_nm": 8.46,
      "uncertainty_sigma": 0.1136,
      "pass_probability_proxy": 0.1772,
      "optimizer_score": 0.1261
    },
    {
      "domain": "process",
      "feature_aspect_ratio": 4,
      "wafer_zone": "edge",
      "bias_class": "aggressive",
      "anisotropy_index": 0.655,
      "selectivity_proxy": 2.5625,
      "cd_bias_nm": 10.46,
      "uncertainty_sigma": 0.1311,
      "pass_probability_proxy": 0.1377,
      "optimizer_score": 0.0787
    }
  ],
  "methods": [
    "A normalized response surface makes anisotropy rise with bias while aspect ratio and edge position add penalties.",
    "Uncertainty sigma grows with wafer-zone penalty, feature aspect ratio, and distance from nominal bias.",
    "The safe optimizer score penalizes uncertainty so the best row is not chosen by nominal pass probability alone."
  ],
  "limitations": [
    "No gas chemistry, RF power, pressure, chuck temperature, endpoint signal, mask stack, or process recipe is represented.",
    "No equipment instruction, qualification claim, or production process decision is made.",
    "Real use requires DOE, CD-SEM/profile metrology, selectivity measurement, wafer maps, and process-owner review."
  ],
  "evidence": [
    "The dataset stores every aspect-ratio, wafer-zone, bias-class, uncertainty, and optimizer-score row.",
    "CSV export preserves the heteroscedastic UQ table for methods review.",
    "The lesson route frames optimization as evidence literacy, not tool operation."
  ],
  "sources": [
    {
      "label": "ArXiv plasma etch UQ signal",
      "url": "https://arxiv.org/abs/2511.04990",
      "note": "Daily-scan source anchor for wafer-aware plasma etch uncertainty; SemiAgora uses original normalized teaching data."
    }
  ],
  "source_seed_run": "07_assets/factory_lab/daily/2026-08-14/20260814_140522/"
}