{
  "schema": "semiagora.process-simulation.v1",
  "experiment_id": "SA-PROC-CLEAN-DHF-NATIVE-OXIDE-001",
  "title": "Dilute HF native-oxide window",
  "execution_mode": "precomputed-only",
  "model_boundary": "Educational native-oxide window replay using normalized exposure; not a chemical process setting, qualified HF procedure, or measured wafer result.",
  "limitations": [
    "No recipe, concentration, bath timing, tool sequence, facility procedure, or endpoint-control instruction is included.",
    "No wafer-release, contamination-control, metrology qualification, safety approval, or qualified process-window claim is made.",
    "All curves are educational teaching proxies and must be replaced by facility-approved measurements before process decisions.",
    "Material compatibility, pattern sensitivity, queue time, and safety review must be handled by qualified local procedures."
  ],
  "sources": [
    {
      "label": "Stanford SNF Pre-Diffusion Clean",
      "url": "https://snfguide.stanford.edu/taxonomy/term/712/all/feed?order=field_equipment_name&sort=desc",
      "note": "Public SNF guide page describing SC1, SC2, and optional HF dip roles for organics, particles, metals, and native oxide context."
    },
    {
      "label": "Stanford SNF Standard Clean 1",
      "url": "https://snfguide.stanford.edu/guide/chemicals/acids/standard-clean-1",
      "note": "Public SNF chemical page anchoring SC1 as a particle and surface-preparation clean before growth furnaces."
    },
    {
      "label": "Stanford SNF HMDS",
      "url": "https://snfguide.stanford.edu/guide/chemicals/primers/hmds",
      "note": "Public SNF guide page describing HMDS as a photoresist adhesion promoter."
    },
    {
      "label": "NIST wet chemical cleaning publication",
      "url": "https://www.nist.gov/publications/wet-chemical-cleaning-plasma-oxide-grown-heated-001-inp-surfaces",
      "note": "Public NIST publication page anchoring wet cleaning as surface preparation before epitaxy, metal/dielectric deposition, and diffusion."
    }
  ],
  "axes": [
    "normalized exposure index"
  ],
  "samples": [
    {
      "normalized_exposure_index": 0,
      "native_oxide_remaining_nm": 1.8,
      "contact_angle_proxy_deg": 18,
      "reoxidation_sensitivity": 0.05,
      "queue_time_risk": 0.08
    },
    {
      "normalized_exposure_index": 1,
      "native_oxide_remaining_nm": 1.15,
      "contact_angle_proxy_deg": 42,
      "reoxidation_sensitivity": 0.18,
      "queue_time_risk": 0.15
    },
    {
      "normalized_exposure_index": 2,
      "native_oxide_remaining_nm": 0.58,
      "contact_angle_proxy_deg": 65,
      "reoxidation_sensitivity": 0.34,
      "queue_time_risk": 0.29
    },
    {
      "normalized_exposure_index": 3,
      "native_oxide_remaining_nm": 0.22,
      "contact_angle_proxy_deg": 78,
      "reoxidation_sensitivity": 0.52,
      "queue_time_risk": 0.46
    },
    {
      "normalized_exposure_index": 4,
      "native_oxide_remaining_nm": 0.08,
      "contact_angle_proxy_deg": 84,
      "reoxidation_sensitivity": 0.68,
      "queue_time_risk": 0.64
    },
    {
      "normalized_exposure_index": 5,
      "native_oxide_remaining_nm": 0.03,
      "contact_angle_proxy_deg": 87,
      "reoxidation_sensitivity": 0.78,
      "queue_time_risk": 0.76
    }
  ],
  "derived_metrics": {
    "oxide_after_index_3_nm": 0.22,
    "hydrophobic_contact_angle_index_4_deg": 84,
    "reoxidation_sensitivity_index_5": 0.78
  },
  "verification": {
    "sample_count": 6,
    "oxide_decreases": true,
    "hydrophobicity_increases": true,
    "reoxidation_risk_increases": true,
    "queue_risk_increases": true
  }
}