{
  "schema": "semiagora.process-surface-treatment.v1",
  "experiment_id": "SA-PROC-SURF-O2-PLASMA-001",
  "title": "O2 plasma surface activation replay",
  "execution_mode": "precomputed-only",
  "engine": "SemiAgora surface-treatment kinetics model",
  "model_boundary": "Educational contact-angle and residue-proxy replay; not a plasma tool recipe, wafer qualification, or measured SemiAgora process.",
  "observables": [
    "water contact angle",
    "hydroxylation proxy",
    "organic residue proxy",
    "ion exposure risk index",
    "hydrophobic recovery after air exposure"
  ],
  "cases": [
    {
      "id": "gentle-o2-plasma",
      "intent": "lower ion exposure, slower activation",
      "normalized_rf_dose": 0.55,
      "time_s": [
        0,
        5,
        10,
        20,
        30,
        60,
        120
      ],
      "water_contact_angle_deg": [
        72.0,
        54.77,
        42.04,
        25.68,
        16.75,
        7.75,
        6.05
      ],
      "hydroxylation_proxy_percent": [
        0.0,
        18.6,
        33.8,
        56.2,
        71.0,
        91.6,
        99.3
      ],
      "organic_residue_proxy_percent": [
        100.0,
        86.0,
        73.9,
        54.6,
        40.4,
        16.3,
        2.7
      ],
      "ion_exposure_risk_index": [
        0.0,
        1.3,
        2.6,
        5.1,
        7.6,
        14.5,
        27.0
      ]
    },
    {
      "id": "nominal-o2-plasma",
      "intent": "fast hydrophilic activation teaching reference",
      "normalized_rf_dose": 1.0,
      "time_s": [
        0,
        5,
        10,
        20,
        30,
        60,
        120
      ],
      "water_contact_angle_deg": [
        72.0,
        44.08,
        27.97,
        13.31,
        8.43,
        6.09,
        6.0
      ],
      "hydroxylation_proxy_percent": [
        0.0,
        31.3,
        52.8,
        77.7,
        89.5,
        98.9,
        100.0
      ],
      "organic_residue_proxy_percent": [
        100.0,
        76.0,
        57.7,
        33.3,
        19.2,
        3.7,
        0.1
      ],
      "ion_exposure_risk_index": [
        0.0,
        2.4,
        4.7,
        9.1,
        13.3,
        24.9,
        43.5
      ]
    },
    {
      "id": "extended-o2-plasma",
      "intent": "strong activation with louder ion-exposure warning",
      "normalized_rf_dose": 1.6,
      "time_s": [
        0,
        5,
        10,
        20,
        30,
        60,
        120
      ],
      "water_contact_angle_deg": [
        72.0,
        33.38,
        17.35,
        7.95,
        6.34,
        6.0,
        6.0
      ],
      "hydroxylation_proxy_percent": [
        0.0,
        45.1,
        69.9,
        90.9,
        97.3,
        99.9,
        100.0
      ],
      "organic_residue_proxy_percent": [
        100.0,
        64.4,
        41.5,
        17.2,
        7.1,
        0.5,
        0.0
      ],
      "ion_exposure_risk_index": [
        0.0,
        3.7,
        7.3,
        14.1,
        20.4,
        36.7,
        59.9
      ]
    }
  ],
  "air_recovery": {
    "after_nominal_60_s_treatment": true,
    "age_h": [
      0,
      0.25,
      1,
      4,
      24,
      72
    ],
    "water_contact_angle_deg": [
      6.09,
      14.19,
      20.92,
      31.16,
      46.19,
      51.93
    ],
    "note": "Recovery is included so learners do not treat activated surfaces as permanent."
  },
  "derived_metrics": {
    "nominal_contact_angle_30_s_deg": 8.43,
    "nominal_contact_angle_60_s_deg": 6.09,
    "nominal_organic_removal_60_s_percent": 96.3,
    "nominal_recovered_contact_angle_24_h_deg": 46.19,
    "extended_ion_exposure_risk_120_s_index": 59.9
  },
  "verification": {
    "cases": 3,
    "contact_angle_decreases_with_time": true,
    "organic_residue_decreases_with_time": true,
    "risk_increases_with_time": true,
    "air_recovery_increases_contact_angle": true
  },
  "sources": [
    {
      "label": "Harrick Plasma surface chemistry modification",
      "url": "https://harrickplasma.com/surface-chemistry/",
      "note": "Public application note for plasma-driven surface chemistry, wettability, hydroxylation, and air recovery boundaries."
    },
    {
      "label": "UNC CHANL oxygen plasma system",
      "url": "https://chanl.unc.edu/instrument/oxygen-plasma-system/",
      "note": "Public cleanroom instrument page listing surface activation, cleaning, wettability alteration, and adhesion preparation."
    },
    {
      "label": "UIUC MRL UV/Ozone Cleaner",
      "url": "https://mrl.illinois.edu/facilities/equipment/uvozone-cleaner",
      "note": "Public cleanroom equipment page describing UV/O3 organic-contaminant removal, hydrophilicity, and deposition-prep use."
    }
  ],
  "limitations": [
    "No plasma density, sheath physics, ion energy distribution, chamber pressure, gas flow, sample temperature, endpoint signal, or material-specific etch rate is modeled.",
    "The RF-dose labels are normalized teaching axes and must not be copied into facility settings.",
    "Contact-angle values are synthetic teaching replays, not measured wafer data.",
    "Real use requires material compatibility, charging and damage review, metrology, safety approval, and tool-specific training."
  ]
}