# Thin-Film Deposition Process Model Card

SemiAgora process simulations in this packet are educational replays. They are designed to teach which knobs matter before a learner sees a facility recipe.

## Included Simulations

- `SA-PROC-PVD-SPUTTER-UNIFORMITY-001`: radial thickness uniformity for a sputter-style source.
- `SA-PROC-PVD-EVAP-LINEOFSIGHT-001`: evaporation open-field thickness and line-of-sight shadowing.
- `SA-PROC-CVD-ALD-GPC-001`: ALD dose saturation, temperature-window framing, and aspect-ratio conformality.
- `process_thin_film_models.py`: compact reference script for the public teaching equations.

## Public Boundary

These files do not contain qualified recipes, process windows, proprietary tool settings, chamber histories, target conditioning procedures, or production metrology. They should not be used to process wafers.

## Source Spine

- UIUC Materials Research Laboratory deposition tool descriptions: https://mrl.illinois.edu/facilities/research-cores/micronano-fabrication-and-cleanroom/deposition-tools
- Steven M. George, Atomic Layer Deposition: An Overview: https://pubmed.ncbi.nlm.nih.gov/19947596/
- Riikka L. Puurunen, Surface chemistry of atomic layer deposition: https://cris.vtt.fi/en/publications/surface-chemistry-of-atomic-layer-deposition-a-case-study-for-the/
- NIST ALD publication record: https://www.nist.gov/publications/atomic-layer-deposition-mos2-films-using-bistert-butylimido-bisdimethylamidomolybdenum

## Recommended Next Data

When real facility-safe data become available, add measured witness-wafer thickness maps, ellipsometry or profilometry summaries, measured ALD GPC curves, chamber-independent sample metadata, and a clear statement of what can be publicly redistributed.