{
  "schema": "semiagora.process-simulation.v1",
  "experiment_id": "SA-PROC-METRO-TLM-CONTACT-001",
  "title": "TLM contact-resistance extraction",
  "execution_mode": "precomputed-only",
  "model_boundary": "Educational transfer-length-method extraction replay. It teaches intercept, sheet resistance, and contact-resistance vocabulary; it is not a calibrated contact module or device-process qualification.",
  "lesson_route": "/learn/process-metrology",
  "simulation_route": "/simulations/process-tlm-contact-resistance",
  "measurement_context": {
    "pad_width_um": 100,
    "method": "linear fit of total resistance versus contact gap",
    "units": "ohm"
  },
  "gap_um": [5, 10, 20, 40, 80],
  "total_resistance_ohm": [12, 16, 24, 40, 72],
  "derived_metrics": {
    "fit_slope_ohm_per_um": 0.8,
    "fit_intercept_ohm": 8,
    "contact_resistance_per_pad_ohm": 4,
    "sheet_resistance_ohm_sq": 80,
    "contact_resistance_width_ohm_mm": 0.4,
    "teaching_transfer_length_um": 1,
    "specific_contact_resistivity_ohm_cm2": 0.000004
  },
  "methods": [
    "Fit total resistance as intercept plus slope times contact spacing.",
    "Interpret half the intercept as one contact resistance in the teaching model.",
    "Estimate sheet resistance from slope times pad width.",
    "Keep contact geometry and transfer-length assumptions visible with the extracted number."
  ],
  "limitations": [
    "No current crowding model, contact-end correction, metal spreading resistance, thermal effect, Kelvin structure, uncertainty budget, or process calibration is included.",
    "No qualified metrology, contact-module recipe, facility setting, wafer acceptance, or production contact-resistance claim is implied.",
    "Real contact-resistance evidence requires layout details, raw I-V data, fit residuals, calibration status, and rights-clean process context.",
    "This replay is a teaching extraction and must not be used to qualify silicide, implant, anneal, or metallization recipes."
  ],
  "sources": [
    {
      "label": "BYU Cleanroom contact resistance and TLM",
      "url": "https://cleanroom.byu.edu/contact_resistance",
      "note": "Public cleanroom education page describing TLM structures, varying contact spacing, I-V measurement, and extraction intent."
    }
  ]
}