{
  "schema": "semiagora.process-simulation.v1",
  "experiment_id": "SA-PROC-CLEAN-WET-REMOVAL-001",
  "title": "Wet clean contamination removal",
  "execution_mode": "precomputed-only",
  "model_boundary": "Educational wet-clean replay using normalized contamination proxies; not a wet-bench recipe or measured wafer result.",
  "limitations": [
    "No recipe, concentration, bath timing, tool sequence, facility procedure, or endpoint-control instruction is included.",
    "No wafer-release, contamination-control, metrology qualification, safety approval, or qualified process-window claim is made.",
    "All curves are educational teaching proxies and must be replaced by facility-approved measurements before process decisions.",
    "Material compatibility, pattern sensitivity, queue time, and safety review must be handled by qualified local procedures."
  ],
  "sources": [
    {
      "label": "Stanford SNF Pre-Diffusion Clean",
      "url": "https://snfguide.stanford.edu/taxonomy/term/712/all/feed?order=field_equipment_name&sort=desc",
      "note": "Public SNF guide page describing SC1, SC2, and optional HF dip roles for organics, particles, metals, and native oxide context."
    },
    {
      "label": "Stanford SNF Standard Clean 1",
      "url": "https://snfguide.stanford.edu/guide/chemicals/acids/standard-clean-1",
      "note": "Public SNF chemical page anchoring SC1 as a particle and surface-preparation clean before growth furnaces."
    },
    {
      "label": "Stanford SNF HMDS",
      "url": "https://snfguide.stanford.edu/guide/chemicals/primers/hmds",
      "note": "Public SNF guide page describing HMDS as a photoresist adhesion promoter."
    },
    {
      "label": "NIST wet chemical cleaning publication",
      "url": "https://www.nist.gov/publications/wet-chemical-cleaning-plasma-oxide-grown-heated-001-inp-surfaces",
      "note": "Public NIST publication page anchoring wet cleaning as surface preparation before epitaxy, metal/dielectric deposition, and diffusion."
    }
  ],
  "axes": [
    "conceptual clean stage"
  ],
  "cases": [
    {
      "label": "incoming_surface",
      "organic_residue_percent": 100.0,
      "particle_index": 100.0,
      "metal_contamination_index": 100.0,
      "native_oxide_proxy_nm": 1.2,
      "review_note": "Incoming state before any public-safe conceptual clean."
    },
    {
      "label": "solvent_degrease_proxy",
      "organic_residue_percent": 42.0,
      "particle_index": 88.0,
      "metal_contamination_index": 96.0,
      "native_oxide_proxy_nm": 1.2,
      "review_note": "Organic residue falls, but particle and metal evidence is still needed."
    },
    {
      "label": "sc1_particle_clean_proxy",
      "organic_residue_percent": 18.0,
      "particle_index": 28.0,
      "metal_contamination_index": 74.0,
      "native_oxide_proxy_nm": 1.8,
      "review_note": "Particle proxy improves while oxide state remains part of the evidence."
    },
    {
      "label": "sc2_metal_clean_proxy",
      "organic_residue_percent": 14.0,
      "particle_index": 24.0,
      "metal_contamination_index": 22.0,
      "native_oxide_proxy_nm": 1.9,
      "review_note": "Metal contamination proxy improves, but this does not remove native oxide."
    },
    {
      "label": "rinse_dry_control_proxy",
      "organic_residue_percent": 12.0,
      "particle_index": 20.0,
      "metal_contamination_index": 20.0,
      "native_oxide_proxy_nm": 1.9,
      "review_note": "Final public-safe state still needs watermark, particle, metal, and oxide checks."
    }
  ],
  "derived_metrics": {
    "organic_residue_reduction_percent": 88.0,
    "particle_index_reduction_percent": 80.0,
    "metal_index_reduction_percent": 80.0,
    "native_oxide_final_proxy_nm": 1.9
  },
  "verification": {
    "case_count": 5,
    "organic_decreases": true,
    "particle_decreases": true,
    "metal_decreases": true,
    "native_oxide_not_removed_by_sequence": true,
    "all_cases_precomputed": true
  }
}