{
  "schema": "semiagora.pvd-source-spine.v1",
  "version": "2026-08-29-pvd-v1",
  "experimentId": "SA-PROC-DEP-PVD-012",
  "generatedAt": "2026-08-29T00:00:00+09:00",
  "status": "link-only-no-source-body",
  "counts": {
    "sources": 20,
    "claimNodes": 16
  },
  "sourceNumericUse": "none",
  "sourceBodiesStored": false,
  "hardBoundary": "No source body, figure, table, equation, coefficient, geometry, gas identity, material recipe, operating value, dimension, pressure, power, rate, thickness, stress value, measurement trace, vendor result, source code, named-tool output, or publication-derived numeric value enters the generated SemiAgora packet.",
  "sources": [
    {
      "id": "osti-multilayer-sputter-uniformity",
      "label": "UCRL-JC-128289 magnetron sputter deposition and thickness uniformity study",
      "publisher": "Lawrence Livermore National Laboratory / U.S. Department of Energy OSTI",
      "url": "https://www.osti.gov/servlets/purl/310916",
      "sourceType": "primary-government-hosted-technical-paper",
      "rightsStatus": "link-only; U.S. government and publication notices apply",
      "use": "Target erosion, substrate motion, spatial deposition, and thickness-uniformity evidence ownership.",
      "numericUse": "none",
      "artifactUse": "no paper body, apparatus detail, condition, dimension, result, figure, table, equation, or value copied"
    },
    {
      "id": "osti-target-erosion-state",
      "label": "LLNL-JRNL-819053 target wear and magnetron sputter deposition study",
      "publisher": "Lawrence Livermore National Laboratory / U.S. Department of Energy OSTI",
      "url": "https://www.osti.gov/pages/servlets/purl/1840111",
      "sourceType": "primary-government-hosted-peer-reviewed-paper",
      "rightsStatus": "link-only; U.S. government and journal notices apply",
      "use": "Target erosion-state and source-evolution evidence ownership.",
      "numericUse": "none",
      "artifactUse": "no target condition, material, power, geometry, lifetime, result, model, figure, or value copied"
    },
    {
      "id": "osti-pressure-discharge-erosion",
      "label": "LLNL-JRNL-2006702 magnetron pressure and erosion study",
      "publisher": "Lawrence Livermore National Laboratory / U.S. Department of Energy OSTI",
      "url": "https://www.osti.gov/servlets/purl/3000816",
      "sourceType": "primary-government-hosted-peer-reviewed-paper",
      "rightsStatus": "link-only; U.S. government and journal notices apply",
      "use": "Pressure-collision, discharge-state, and target-erosion coupling taxonomy.",
      "numericUse": "none",
      "artifactUse": "no pressure, power, discharge curve, fit, equation, coefficient, result, figure, or value copied"
    },
    {
      "id": "osti-sandia-wafer-map",
      "label": "SAND2024-13760J sputter-deposition wafer-map study",
      "publisher": "Sandia National Laboratories / U.S. Department of Energy OSTI",
      "url": "https://www.osti.gov/servlets/purl/2472746",
      "sourceType": "primary-government-hosted-peer-reviewed-paper",
      "rightsStatus": "link-only; U.S. government and journal notices apply",
      "use": "Spatial sampling, wafer mapping, and deposition-evidence ownership.",
      "numericUse": "none",
      "artifactUse": "no material, tool, condition, map, supplement, result, figure, table, or value copied"
    },
    {
      "id": "nist-gas-composition-sputtering",
      "label": "Effect of gas composition during Pt sputtering on CoFeB thin films",
      "publisher": "National Institute of Standards and Technology",
      "url": "https://www.nist.gov/publications/effect-gas-composition-during-pt-sputtering-structural-and-magnetic-properties-cofeb",
      "sourceType": "primary-government-publication-record",
      "rightsStatus": "link-only; NIST and journal notices apply",
      "use": "Gas-mediated transport, interface, roughness, and film-property evidence ownership.",
      "numericUse": "none",
      "artifactUse": "bibliographic title only; no gas identity, measurement, material result, figure, paper body, or value copied"
    },
    {
      "id": "nist-oblique-sputter-orientation",
      "label": "Structural and magnetic properties of sputtered FePd thin films with oblique and normal orientation",
      "publisher": "National Institute of Standards and Technology",
      "url": "https://www.nist.gov/publications/structural-and-magnetic-properties-sputtered-fepd-thin-films-grown-mgo-single-crystal",
      "sourceType": "primary-government-publication-record",
      "rightsStatus": "link-only; NIST and journal notices apply",
      "use": "Incident-angle and orientation-dependent film evidence ownership.",
      "numericUse": "none",
      "artifactUse": "bibliographic title only; no angle, stack, condition, measurement, conclusion, figure, or value copied"
    },
    {
      "id": "nist-nanofab-sputter-tool",
      "label": "NIST NanoFab 4Wave IBD/BTD cluster sputter deposition system",
      "publisher": "National Institute of Standards and Technology",
      "url": "https://www.nist.gov/laboratories/tools-instruments/nanofab-tool-4wave-ibdbtd-cluster-sputter-deposition-system",
      "sourceType": "official-government-facility-page",
      "rightsStatus": "link-only",
      "use": "Sputter-tool, substrate motion, energetic-arrival, and uniformity taxonomy only.",
      "numericUse": "none",
      "artifactUse": "no tool setting, specification, material list, capability value, operating instruction, image, or wording copied"
    },
    {
      "id": "nist-thin-film-stress",
      "label": "Measurement of Surface and Growth Stresses in Thin Films",
      "publisher": "National Institute of Standards and Technology",
      "url": "https://www.nist.gov/mml/materials-science-and-engineering-division/measurement-surface-and-growth-stresses-thin-films",
      "sourceType": "official-government-metrology-page",
      "rightsStatus": "link-only",
      "use": "Growth-stress evolution, wafer-curvature metrology, and traceability boundary.",
      "numericUse": "none",
      "artifactUse": "no apparatus, equation, method detail, measurement, result, image, or value copied"
    },
    {
      "id": "nist-boulder-stress-metrology",
      "label": "Boulder Microfabrication Facility tools, capabilities, and infrastructure",
      "publisher": "National Institute of Standards and Technology",
      "url": "https://www.nist.gov/pml/boulder-microfabrication-facility-tools-capabilities-and-infrastructure",
      "sourceType": "official-government-facility-page",
      "rightsStatus": "link-only",
      "use": "Thin-film stress and wafer-curvature measurement taxonomy only.",
      "numericUse": "none",
      "artifactUse": "no instrument setting, specification, method, capability value, operating instruction, or image copied"
    },
    {
      "id": "ugent-simtra-software",
      "label": "DRAFT software page for SiMTRA",
      "publisher": "Ghent University",
      "url": "https://www.ugent.be/we/solidstatesciences/draft/en/services/software/software.htm",
      "sourceType": "official-university-software-page",
      "rightsStatus": "link-only; university, software, and registration terms apply",
      "use": "Binary-collision Monte Carlo transport, deposition profile, arrival energy, and direction taxonomy.",
      "numericUse": "none",
      "artifactUse": "no software, executable, manual body, parameter, geometry, algorithm, screenshot, output, or value copied"
    },
    {
      "id": "ugent-simtra-manual",
      "label": "SiMTRA user manual",
      "publisher": "Ghent University",
      "url": "https://www.ugent.be/we/solidstatesciences/draft/en/services/software/simtrafiles/manualsimtra",
      "sourceType": "official-university-software-documentation",
      "rightsStatus": "link-only; university and software notices apply",
      "use": "Racetrack, emission, gas-phase transport, chamber-surface, and deposition-profile model-boundary taxonomy.",
      "numericUse": "none",
      "artifactUse": "no manual text, configuration, interaction potential, parameter, geometry, algorithm, screenshot, result, or value copied"
    },
    {
      "id": "ugent-monte-carlo-transport-2006",
      "label": "Monte Carlo simulation of the transport of atoms in DC magnetron sputtering",
      "publisher": "Ghent University research repository",
      "url": "https://biblio.ugent.be/publication/329113",
      "sourceType": "primary-university-repository-record",
      "rightsStatus": "link-only; author, repository, and publisher rights apply",
      "use": "Sputtered-particle transport, collision, thermalization, geometry, and validation evidence ownership.",
      "numericUse": "none",
      "artifactUse": "no paper body, model, equation, coefficient, geometry, parameter, result, figure, table, or value copied"
    },
    {
      "id": "ugent-python-simtra-2025",
      "label": "A Python-based approach to sputter deposition simulations in combinatorial materials science",
      "publisher": "Ghent University research repository",
      "url": "https://biblio.ugent.be/publication/01JNX40EYPVMNCR8HHHVVZE5EN",
      "sourceType": "primary-university-repository-record",
      "rightsStatus": "link-only; author, repository, and publisher rights apply",
      "use": "Multiple-source Monte Carlo workflow, chamber geometry, deposition profile, and model-to-measurement ownership.",
      "numericUse": "none",
      "artifactUse": "no code, paper body, chamber, material, calibration, result, figure, table, or value copied"
    },
    {
      "id": "viennaps-documentation",
      "label": "ViennaPS Documentation",
      "publisher": "ViennaTools / TU Wien",
      "url": "https://viennatools.github.io/ViennaPS/",
      "sourceType": "official-open-software-documentation",
      "rightsStatus": "link-only; documentation and repository licenses apply",
      "use": "Feature-scale surface evolution, ray transport, and reproducibility boundary.",
      "numericUse": "none",
      "artifactUse": "no source code, example, geometry, parameter, screenshot, output, or documentation body copied"
    },
    {
      "id": "viennaps-sputter-example",
      "label": "ViennaPS examples including sputter deposition",
      "publisher": "ViennaTools / TU Wien",
      "url": "https://viennatools.github.io/ViennaPS/examples/",
      "sourceType": "official-open-software-documentation",
      "rightsStatus": "link-only; documentation and repository licenses apply",
      "use": "Sputter-deposition example existence and feature-scale reproduction taxonomy only.",
      "numericUse": "none",
      "artifactUse": "no example code, build command, configuration, geometry, parameter, image, result, or value copied"
    },
    {
      "id": "viennaps-multiparticle-model",
      "label": "ViennaPS Multi Particle Process",
      "publisher": "ViennaTools / TU Wien",
      "url": "https://viennatools.github.io/ViennaPS/models/prebuilt/multiParticle.html",
      "sourceType": "official-open-software-documentation",
      "rightsStatus": "link-only; documentation and repository licenses apply",
      "use": "Incident populations, sticking, reflection, sputter, and surface-interaction taxonomy.",
      "numericUse": "none",
      "artifactUse": "no equation, default, API code, parameter, algorithm, geometry, output, or documentation wording copied"
    },
    {
      "id": "tu-wien-virtual-fab",
      "label": "Process Simulation and Virtual Fabrication",
      "publisher": "TU Wien Institute for Microelectronics",
      "url": "https://www.iue.tuwien.ac.at/activities/process-simulation-and-virtual-fab",
      "sourceType": "official-university-program-page",
      "rightsStatus": "link-only; university notices apply",
      "use": "Cross-scale process, equipment, feature-topography, and virtual-fabrication framework anchor.",
      "numericUse": "none",
      "artifactUse": "no method body, software, equation, project result, image, or wording copied"
    },
    {
      "id": "applied-pvd-overview",
      "label": "Physical Vapor Deposition process overview",
      "publisher": "Applied Materials",
      "url": "https://www.appliedmaterials.com/eu/en/semiconductor/products/processes/pvd.html",
      "sourceType": "official-vendor-process-overview",
      "rightsStatus": "link-only; vendor rights apply",
      "use": "PVD, target-to-wafer condensation, barrier, seed, liner, metallization, and integration taxonomy only.",
      "numericUse": "none",
      "artifactUse": "no product claim, recipe, material stack, specification, image, ranking, result, or wording copied"
    },
    {
      "id": "applied-endura-pvd",
      "label": "Endura PVD",
      "publisher": "Applied Materials",
      "url": "https://www.appliedmaterials.com/in/en/product-library/endura-pvd.html",
      "sourceType": "official-vendor-product-taxonomy-page",
      "rightsStatus": "link-only; vendor rights apply",
      "use": "Metallization, bottom coverage, conformality, multi-chamber, packaging, and uniformity taxonomy only.",
      "numericUse": "none",
      "artifactUse": "no product claim, configuration, capacity, material, specification, image, ranking, result, or wording copied"
    },
    {
      "id": "thornton-structure-zone-1974",
      "label": "Influence of apparatus geometry and deposition conditions on thick sputtered coatings",
      "publisher": "Journal of Vacuum Science and Technology / American Vacuum Society",
      "url": "https://doi.org/10.1116/1.1312732",
      "sourceType": "primary-peer-reviewed-paper",
      "rightsStatus": "link-only; publisher rights apply",
      "use": "Apparatus geometry, shadowing, film structure, and stress-context evidence ownership.",
      "numericUse": "none",
      "artifactUse": "bibliographic title only; no paper body, zone diagram, condition, material, figure, table, result, equation, or value copied"
    }
  ],
  "claimMap": [
    {
      "node_id": "PVD-CLAIM-001",
      "claim": "PVD and sputtering are represented as a bounded target-to-wafer deposition family, not as a recipe or equipment command.",
      "source_ids": [
        "applied-pvd-overview",
        "nist-nanofab-sputter-tool"
      ],
      "boundary": "Taxonomy only; no vendor capability, physical condition, material choice, or operating instruction is reproduced."
    },
    {
      "node_id": "PVD-CLAIM-002",
      "claim": "Target erosion state belongs in the evidence chain because source geometry and use history can alter the emitted spatial context.",
      "source_ids": [
        "osti-target-erosion-state",
        "osti-multilayer-sputter-uniformity"
      ],
      "boundary": "The packet uses ordinal erosion states only and imports no target geometry, lifetime, wear profile, material, or value."
    },
    {
      "node_id": "PVD-CLAIM-003",
      "claim": "Gas-phase collisions can change transport direction and arrival context between target and wafer.",
      "source_ids": [
        "ugent-monte-carlo-transport-2006",
        "ugent-simtra-software",
        "osti-pressure-discharge-erosion"
      ],
      "boundary": "The packet uses a normalized scattering burden and no gas identity, pressure, mean free path, collision potential, or transport coefficient."
    },
    {
      "node_id": "PVD-CLAIM-004",
      "claim": "Angular arrival context is distinct from blanket incident-flux context and must remain separately reviewable.",
      "source_ids": [
        "ugent-simtra-manual",
        "nist-oblique-sputter-orientation"
      ],
      "boundary": "No angular distribution, incidence angle, source-to-substrate geometry, or measured orientation is imported."
    },
    {
      "node_id": "PVD-CLAIM-005",
      "claim": "Substrate motion can average a spatial flux field but does not by itself prove wafer uniformity.",
      "source_ids": [
        "osti-multilayer-sputter-uniformity",
        "nist-nanofab-sputter-tool"
      ],
      "boundary": "Motion is an ordinal teaching context; no rotation rate, trajectory, dwell, stage instruction, or uniformity value is represented."
    },
    {
      "node_id": "PVD-CLAIM-006",
      "claim": "Spatial deposition evidence requires wafer mapping and accountable sampling rather than a single center value.",
      "source_ids": [
        "osti-sandia-wafer-map",
        "nist-boulder-stress-metrology"
      ],
      "boundary": "No wafer map, sample location, instrument output, uncertainty, or measured value is copied."
    },
    {
      "node_id": "PVD-CLAIM-007",
      "claim": "Line-of-sight shadowing can separate bottom and sidewall access in feature contexts.",
      "source_ids": [
        "viennaps-sputter-example",
        "applied-endura-pvd",
        "thornton-structure-zone-1974"
      ],
      "boundary": "The packet contains no feature dimension, aspect ratio, profile coordinate, material stack, or named-tool prediction."
    },
    {
      "node_id": "PVD-CLAIM-008",
      "claim": "Resputter and redistribution are separate surface-fate categories in a bounded feature-deposition evidence map.",
      "source_ids": [
        "viennaps-multiparticle-model",
        "ugent-simtra-manual"
      ],
      "boundary": "No sputter yield, energy, sticking probability, surface coefficient, trajectory, or solver output is imported."
    },
    {
      "node_id": "PVD-CLAIM-009",
      "claim": "Overhang and continuity require explicit review before a feature-deposition handoff.",
      "source_ids": [
        "applied-endura-pvd",
        "viennaps-sputter-example"
      ],
      "boundary": "The labels are normalized teaching gates and do not predict pinch-off, voids, reliability, or process suitability."
    },
    {
      "node_id": "PVD-CLAIM-010",
      "claim": "Film stress is a measurement-owned growth outcome, not a direct inference from one process selector.",
      "source_ids": [
        "nist-thin-film-stress",
        "nist-boulder-stress-metrology",
        "thornton-structure-zone-1974"
      ],
      "boundary": "Only compressive-like, tensile-like, and balance proxies are produced; no stress unit, curvature, thickness, equation, or measured result is used."
    },
    {
      "node_id": "PVD-CLAIM-011",
      "claim": "Film structure and properties remain material, interface, thermal-history, and measurement dependent.",
      "source_ids": [
        "nist-gas-composition-sputtering",
        "nist-oblique-sputter-orientation",
        "thornton-structure-zone-1974"
      ],
      "boundary": "No material-specific prediction, phase claim, microstructure claim, interface result, or transferable condition is made."
    },
    {
      "node_id": "PVD-CLAIM-012",
      "claim": "Transport and feature-scale models need independent model-to-measurement replacement evidence.",
      "source_ids": [
        "ugent-python-simtra-2025",
        "tu-wien-virtual-fab",
        "viennaps-documentation"
      ],
      "boundary": "Model categories are references only; no code, model setup, geometry, calibration, fit, result, or validation score is bundled."
    },
    {
      "node_id": "PVD-CLAIM-013",
      "claim": "Vacuum/gas, plasma-source, and feature-topography contexts enter this packet only through categorical bridge labels.",
      "source_ids": [
        "ugent-simtra-software",
        "tu-wien-virtual-fab",
        "viennaps-multiparticle-model"
      ],
      "boundary": "No automatic upstream state, physical unit, trajectory, chamber state, or geometry is imported."
    },
    {
      "node_id": "PVD-CLAIM-014",
      "claim": "SIMTRA and ViennaPS remain isolated link-only reproduction candidates.",
      "source_ids": [
        "ugent-simtra-software",
        "ugent-simtra-manual",
        "viennaps-documentation"
      ],
      "boundary": "No executable, source code, package, example, manual body, configuration, binary, or generated output is stored."
    },
    {
      "node_id": "PVD-CLAIM-015",
      "claim": "Vendor pages support application and equipment taxonomy only.",
      "source_ids": [
        "applied-pvd-overview",
        "applied-endura-pvd",
        "nist-nanofab-sputter-tool"
      ],
      "boundary": "No supplier comparison, ranking, specification, process condition, performance claim, or procurement recommendation is made."
    },
    {
      "node_id": "PVD-CLAIM-016",
      "claim": "A passing teaching packet does not prove physical accuracy, calibration, qualification, safety, or production fitness.",
      "source_ids": [
        "nist-thin-film-stress",
        "ugent-python-simtra-2025",
        "tu-wien-virtual-fab"
      ],
      "boundary": "Every downstream decision remains blocked until owned measurements, uncertainty, model validation, and accountable approval replace teaching assumptions."
    }
  ]
}