# SA-PROC-ETCH-RIE-010 Model Card

## Purpose

This packet is an original, deterministic, dimensionless teaching map for comparing bounded reactive-ion etch mechanism tendencies. It separates chemical removal, physical removal, ion-neutral synergy, passivation, directionality, mask burden, transport burden, profile control, damage review, and evidence gates.

It is designed for education, source navigation, review questions, role-specific interpretation, and deterministic software verification.

## What It Is

- A complete 6,912-row Cartesian replay over 3,456 physical teaching states and adjacent evidence-posture pairs.
- A dielectric-like versus conductor-like application-family comparison with no named material or stack.
- A set of original normalized coefficients, equations, thresholds, and categorical gates.
- Three exact integer teaching-token ledgers for ion allocation, neutral allocation, and mask retention.
- A categorical bridge from the public vacuum/gas and CCP/ICP packets to the public particle Monte Carlo feature packet.

## What It Is Not

This is not a physical plasma solver, plasma chemistry solver, sheath solver, feature-scale transport solver, topography simulator, etch-rate model, selectivity model, damage model, endpoint model, recipe, equipment controller, calibration, qualification result, production predictor, or named-tool equivalent.

The ordered states R00-R07 are not time. Token counts are not particles, atoms, molecules, flux, dose, thickness, or inventory. Every scalar proxy is dimensionless and synthetic.

## Source Boundary

The source catalog is link-only. Source publications and documentation establish vocabulary, ownership, evidence questions, rights, and validation responsibilities only.

No source text, figure, table, equation, coefficient, default parameter, geometry, code, species identity, process condition, measurement, or output is copied into the packet. All coefficients and thresholds in the metric contract are original SemiAgora teaching choices.

## ViennaPS Boundary

ViennaPS is a candidate for a separate isolated reproduction, not an implementation dependency of this packet. The reviewed release line includes 4.6.2, and project release records state that versions 4.3.0 and later use GNU GPL v3.

No ViennaPS code, default, example, parameter, geometry, binary, dependency, screenshot, or output enters this packet. A future reproduction must remain in D-drive scratch until version, license, distribution, dependencies, inputs, determinism, and evidence are separately approved.

## State And Determinism

The physical key contains surface family, ion drive, neutral reactivity, passivation state, angular spread, mask resilience, feature access, and ordered state. Evidence posture is metadata and is excluded from all physical calculations and keys.

Rows are emitted in the fixed order declared by the state contract, with evidence posture changing fastest. Adjacent teaching_assumption and replacement_slot rows must be identical in every field except the evidence posture.

No random seed is needed. Repeated generation from identical source and contract files must produce byte-identical CSV, JSON, and source-spine artifacts.

## Three Exact Ledgers

1. Ion total equals direct-impact plus activation plus unassigned tokens.
2. Neutral total equals chemical plus synergy plus passivation plus unreacted tokens.
3. Mask start equals eroded plus remaining tokens.

All residuals must be exactly zero. These identities prove software bookkeeping only; they do not validate physical conservation or mask survival.

## Role Views

- Operator: damage burden, mask retention, and bounded-state readiness.
- Process engineer: passivation limits, ion-neutral balance, and profile-control review.
- Integration: categorical downstream feature handoff behind an evidence gate.
- Yield: selectivity-margin and lateral-loss review.

No role view may issue an equipment command, recipe recommendation, endpoint action, lot disposition, qualification, signoff, or supplier ranking.

## Replacement Evidence

Operational replacement requires an accountable run; owned chamber and feature geometry; calibrated ion energy and current or validated equivalents; neutral or radical evidence; surface composition or coverage; target, mask, and stop-layer rates; profile CD, depth, and sidewall metrology; damage or charging evidence; endpoint traces tied to post-process metrology; incoming stack and chamber history; uncertainty; and independent review.

The replacement_slot label only reserves a place for that evidence. It does not upgrade generated data.

## Prohibited Use

Do not use this packet to choose gases, materials, pressure, flow, power, bias, voltage, frequency, temperature, time, endpoint threshold, chamber condition, mask thickness, equipment action, maintenance action, safety action, wafer disposition, or production setting.

Do not report a proxy as an etch rate, selectivity ratio, angle, CD, depth, roughness, damage measurement, process window, calibrated prediction, vendor comparison, or production result.

## Publication Gate

Do not edit 09_website/ or reserve a public version until:

1. Source and scope validation passes.
2. Link reachability has no hard failure.
3. The generator produces the complete packet.
4. A no-import independent verifier replays every row, equation, gate, ledger, zero field, and serialization rule.
5. Same-input byte repeatability and hygiene checks pass.
6. The compact website transport plan is explicit.