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"source_claim_map_v1.json", "sha256": "9A982DB7EA439F47C94B4157AE0FB796B5F07EF2B05D09BEF6B010B9053ABE55" } }, "selectiveDepositionRegimes": [ "growth-surface-readiness-limited", "nongrowth-blocking-limited", "nucleation-contrast-limited", "selectivity-loss-limited", "pattern-loading-limited", "correction-recovery-limited", "metrology-readiness-limited", "bounded-selective-deposition-review" ], "requiredPhenomena": [ "selective-deposition-mechanism-and-cycle-mode-separation", "growth-surface-readiness-and-nongrowth-blocking-integrity", "desired-growth-continuity-and-nucleation-contrast", "selectivity-loss-and-defect-nucleation", "inhibitor-activation-retention-and-cycle-separation", "pattern-loading-edge-overgrowth-and-surface-diffusion", "correction-redose-recovery-and-material-loss-boundary", "metrology-traceability-defect-sampling-and-handoff" ], "upstreamBridges": [ { "sourceExperimentId": "SA-PROC-DEP-ALD-PEALD-014", "allowedFields": [ "upstream_ald_cycle_readiness_band", "upstream_ald_nucleation_band", "upstream_ald_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-PROC-DEP-CVD-PECVD-013", "allowedFields": [ "upstream_cvd_surface_reaction_band", "upstream_cvd_uniformity_band", "upstream_cvd_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-PROC-ETCH-SELECTIVE-016", "allowedFields": [ "upstream_selective_etch_correction_band", "upstream_selective_etch_interface_band", "upstream_selective_etch_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false }, { "sourceExperimentId": "SA-PROC-ETCH-WET-019", "allowedFields": [ "upstream_wet_surface_readiness_band", "upstream_wet_residue_risk_band", "upstream_wet_evidence_gate" ], "physicalUnitsAllowed": false, "automaticStateImportAllowed": false } ], "downstreamBridge": { "targetExperimentId": "SA-MET-INSPECTION-030", "allowedFields": [ "downstream_growth_continuity_band", "downstream_nongrowth_defect_band", "downstream_pattern_edge_priority_band", "downstream_metrology_priority_band", "downstream_inspection_evidence_gate", "teaching_selective_deposition_handoff_gate" ], "physicalUnitsAllowed": false, "automaticRecipeHandoffAllowed": false, "automaticFilmHandoffAllowed": false, "automaticEquipmentActionAllowed": false, "automaticDispositionAllowed": false }, "replacementEvidenceRequirements": [ "accountable run, lot, wafer, process, equipment, material, surface, metrology, integration, yield, and disposition ownership", "revisioned chamber, source delivery, pumping, heating, plasma or reactive assistance, sequencing, and monitoring configuration", "owned growth-surface and nongrowth-surface identities, incoming preparation, termination, contamination, and prior-process histories", "owned precursor, coreactant, inhibitor, activator, seed, correction, purge, carrier, and byproduct identities and purity evidence", "owned inhibitor or activation dose, adsorption, coverage, order, retention, desorption, decomposition, penetration, removal, and residue evidence", "owned desired-area adsorption, nucleation, growth continuity, thickness, composition, and interface evidence", "owned nongrowth-area adsorption, nucleation delay, defect nucleation, unwanted growth, overgrowth, and contamination evidence", "owned cycle order, pulse, exposure, purge, separation, redose, reactivation, correction, and repeated-cycle histories", "owned pattern pitch, density, loading, edge, center, feature access, surface diffusion, lateral growth, and three-dimensional transport evidence", "owned selectivity definition, numerator, denominator, detection limit, uncertainty, sampling, and reporting basis", "owned within-pattern, within-wafer, wafer-to-wafer, run-to-run, and tool-to-tool uniformity evidence", "owned in-situ and ex-situ metrology methods, calibration state, uncertainty, threshold, raw-data lineage, and defect-review evidence", "explicit separation of inherent, inhibitor-based, activation-based, correction-cycle, and pattern-transport claims with no cross-material numeric transfer", "explicit validation of every physical surface, reaction, nucleation, transport, diffusion, growth, correction, loading, or defect model before use", "independent review of model boundary, proxy ownership, replacement completeness, and non-predictive teaching use", "downstream inspection approval and accountable integration, yield, reliability, qualification, and disposition review" ], "requiredSections": [ "Explore", "Run Card", "Export", "Methods", "Limits", "Evidence" ], "limitation": "Original dimensionless selective-deposition teaching replay only. No physical chemistry, surface identity, inhibitor or activation state, sequence, temperature, pressure, pulse, purge, transport, diffusion, nucleation, deposition or correction rate, selectivity, thickness, uniformity, defectivity, metrology result, equipment state, recipe, qualification, reliability, or production fitness is computed or implied." }