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LESSON PACKET / SA-PROC-UQ-002

Wafer-aware etch uncertainty before optimization.
Process

A single etch trend line is too clean for real process thinking. This packet keeps aspect ratio, wafer zone, CD bias, selectivity, and uncertainty sigma together so the learner sees why an optimizer needs a boundary.

packetSA-PROC-UQ-002runSimulation ObjectlearnEvidence SequencemethodMethodslimitsBoundaries

EVIDENCE SEQUENCE

What the learner should inspect first.

This surface connects the daily-scan source signal to an original SemiAgora simulation object without copying source text, code, figures, PDK files, or process recipes.

01

Start with nominal profile outputs: anisotropy, selectivity, and CD bias.

Open the run card to inspect the saved rows, methods, limits, and export files behind this step.

Inspect run card ->
02

Add wafer position and watch uncertainty sigma move instead of staying fixed.

Open the run card to inspect the saved rows, methods, limits, and export files behind this step.

Inspect run card ->
03

Use the safe optimizer score as a warning about over-trusting a nominal best row.

Open the run card to inspect the saved rows, methods, limits, and export files behind this step.

Inspect run card ->

METHODS

Precomputed model contract.

The goal is useful study scaffolding and paper-planning discipline, not calibrated production evidence.

method

Normalized response-surface data only.

The simulation object keeps the same statement beside downloadable JSON and CSV evidence.

method

Heteroscedastic uncertainty grows with zone penalty, aspect ratio, and bias distance.

The simulation object keeps the same statement beside downloadable JSON and CSV evidence.

method

The simulation page exports JSON, CSV, methods, limits, and source notes.

The simulation object keeps the same statement beside downloadable JSON and CSV evidence.

LIMITS

Useful, but deliberately bounded.

No account, upload, payment, comment, newsletter, live solver, facility workflow, or product-release surface is enabled.

non-claim

No gas chemistry, RF power, chamber setting, pressure, endpoint, or recipe.

Keep this boundary attached when reusing the card for lesson writing, figure planning, or research notes.

non-claim

No equipment-control or qualification workflow.

Keep this boundary attached when reusing the card for lesson writing, figure planning, or research notes.

non-claim

Real work needs DOE, CD/profile metrology, selectivity data, wafer maps, and owner review.

Keep this boundary attached when reusing the card for lesson writing, figure planning, or research notes.

SOURCE ANCHOR

Link-only public source spine.

SemiAgora uses the source as a signal and citation anchor, then writes original summaries and original toy data with explicit limitations.

ArXiv plasma etch UQ signal

https://arxiv.org/abs/2511.04990

Open source ->