0.6024Best safe optimizer scoreUNKNOWNInspect metric contract
1:1 / center / nominalBest caseUNKNOWNInspect metric contract
27 casesSweep rowsUNKNOWNInspect metric contract
SIMULATION / SA-PROC-UQ-002-PLASMA-ETCH-HET-UQ-001
Plasma etch heteroscedastic UQ
Etch Het-UQ
Replay aspect ratio, wafer zone, and normalized bias class to see why etch uncertainty grows across the wafer instead of staying constant.
EXPLORE
Start with the observable.
Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.
- Compare center, mid-radius, and edge rows before trusting a single etch trend.
- Read uncertainty sigma beside anisotropy, selectivity, and CD bias.
- Treat the optimizer score as a caution flag, not a recipe recommendation.
RUN CARD
Conditions before conclusions.
This page replays saved plasma etch UQ data and does not run a plasma tool, chamber model, recipe, endpoint workflow, or optimizer service.
Primary knobs
- Feature aspect ratio
- Wafer zone
- Normalized bias class
Saved outputs
- Anisotropy index
- Selectivity proxy
- CD bias
- Uncertainty sigma
- Safe optimizer score
EXPORT
Download the public artifacts.
These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.
Dataset JSON
/data/plasma-etch-heteroscedastic-uq-web-v1.json
Open file ->Dataset CSV
/data/plasma-etch-heteroscedastic-uq-v65.csv
Open file ->v65 daily signal summary CSV
/data/v65-daily-signal-summary.csv
Open file ->v65 daily signal model script
/data/v65_daily_signal_sims.mjs
Open file ->v65 daily signal model card
/data/v65-daily-signal-model-card.md
Open file ->METHODS
How the number was made.
Methods are written for citation discipline: the extraction rule matters as much as the plotted value.
A normalized response surface makes anisotropy rise with bias while aspect ratio and edge position add penalties.
Keep this method attached when reusing the figure or metric.
Uncertainty sigma grows with wafer-zone penalty, feature aspect ratio, and distance from nominal bias.
Keep this method attached when reusing the figure or metric.
The safe optimizer score penalizes uncertainty so the best row is not chosen by nominal pass probability alone.
Keep this method attached when reusing the figure or metric.
LIMITS
What this page does not claim.
The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.
No gas chemistry, RF power, pressure, chuck temperature, endpoint signal, mask stack, or process recipe is represented.
Carry this boundary into any derivative note, paper draft, or slide.
No equipment instruction, qualification claim, or production process decision is made.
Carry this boundary into any derivative note, paper draft, or slide.
Real use requires DOE, CD-SEM/profile metrology, selectivity measurement, wafer maps, and process-owner review.
Carry this boundary into any derivative note, paper draft, or slide.
EVIDENCE
Trace the claim back to artifacts.
The evidence route remains the catalog-level browser; this page is the simulation-level reading card.
The dataset stores every aspect-ratio, wafer-zone, bias-class, uncertainty, and optimizer-score row.
SA-PROC-UQ-002-PLASMA-ETCH-HET-UQ-001
CSV export preserves the heteroscedastic UQ table for methods review.
SA-PROC-UQ-002-PLASMA-ETCH-HET-UQ-001
The lesson route frames optimization as evidence literacy, not tool operation.
SA-PROC-UQ-002-PLASMA-ETCH-HET-UQ-001
Source spine
These links anchor the public teaching model. They do not convert the replay into a qualified process recipe or signoff result.
Public execution boundary
No server-side live ngspice execution, uploads, accounts, payments, comments, newsletter signup, or job/event submissions are active on this page.