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SASemiAgoraSemiconductor knowledge & engineeringOpen run card

LESSON PACKET / SA-PROC-ETCH-RIE-010

An etch result is not yet a mechanism claim.
Process / Equipment / Metrology

Ion drive, reactive-neutral availability, passivation, directionality, mask resilience, feature access, removal pathways, damage, profile control, exact balances, role-specific gates, upstream plasma context, and the bounded feature-profile handoff stay separate so a teaching pattern is not mistaken for a chemistry, recipe, or equipment decision.

Open simulationOpen replay lab ->
packetSA-PROC-ETCH-RIE-010runSimulation ObjectlearnEvidence SequencemethodMethodslimitsBoundaries

EVIDENCE SEQUENCE

What the learner should inspect first.

This surface connects the daily-scan source signal to an original SemiAgora simulation object without copying source text, code, figures, PDK files, or process recipes.

01

Begin with dielectric-like and conductor-like teaching families, then state what those labels cannot establish without an owned material stack, composition, geometry, and incoming condition.

Open the run card to inspect the saved rows, methods, limits, and export files behind this step.

Inspect run card ->
02

Keep ion access, neutral reactivity, passivation retention, chemical removal, physical removal, and ion-neutral synergy separate before reading the six mechanism-regime labels.

Open the run card to inspect the saved rows, methods, limits, and export files behind this step.

Inspect run card ->
03

Follow ion, neutral, and mask token allocation through three exact integer ledgers while recognizing that bookkeeping closure is not physical calibration or predictive validation.

Open the run card to inspect the saved rows, methods, limits, and export files behind this step.

Inspect run card ->
04

Compare operator, process-engineer, integration, and yield gates around mask retention, damage, profile control, selectivity, lateral loss, and model-to-measurement evidence.

Open the run card to inspect the saved rows, methods, limits, and export files behind this step.

Inspect run card ->
05

End at the categorical vacuum/plasma context and four fields allowed to bridge into SA-PROC-FEATURE-PMC-007, plus the owned measurements, uncertainty, validation, and review needed to replace them.

Open the run card to inspect the saved rows, methods, limits, and export files behind this step.

Inspect run card ->

METHODS

Precomputed model contract.

The goal is useful study scaffolding and paper-planning discipline, not calibrated production evidence.

method

Complete deterministic 2 x 3 x 3 x 3 x 2 x 2 x 2 x 8 x 2 Cartesian sweep with evidence posture excluded from the physical key and every physical calculation.

The simulation object keeps the same statement beside downloadable JSON and CSV evidence.

method

Original dimensionless algebra separates ion, neutral, passivation, mask, transport, removal, anisotropy, selectivity, damage, profile-control, and stability states.

The simulation object keeps the same statement beside downloadable JSON and CSV evidence.

method

Ion, neutral, and mask integer teaching ledgers close at exact zero for all 6,912 rows and are independently replayed without importing the generator.

The simulation object keeps the same statement beside downloadable JSON and CSV evidence.

method

Eighteen link-only official, primary, academic, open-documentation, open-source, and industry-taxonomy anchors plus thirteen claim nodes define terminology, rights, scope, measurement ownership, and replacement-evidence questions without supplying a generated number.

The simulation object keeps the same statement beside downloadable JSON and CSV evidence.

LIMITS

Useful, but deliberately bounded.

No account, upload, payment, comment, newsletter, live solver, facility workflow, or product-release surface is enabled.

non-claim

No named film, stack, gas, chemistry, pressure, flow, power, bias, voltage, frequency, temperature, ion energy, energy distribution, flux, density, time, etch rate, selectivity ratio, CD, depth, angle, roughness, damage metric, charge metric, geometry, aspect ratio, surface coefficient, endpoint threshold, calibration, or measured row.

Keep this boundary attached when reusing the card for lesson writing, figure planning, or research notes.

non-claim

No ViennaPS or licensed-solver output, equipment setpoint, RF or matching command, gas-panel, MFC, pressure, valve, temperature, endpoint, wafer-disposition, maintenance, clean, or safety action; no recipe, optimization, supplier ranking, qualification, or signoff.

Keep this boundary attached when reusing the card for lesson writing, figure planning, or research notes.

non-claim

The browser filters a saved CSV and redraws normalized states; it does not run a plasma, surface-kinetics, or feature-profile solver, predict a process, control equipment, or establish production fitness.

Keep this boundary attached when reusing the card for lesson writing, figure planning, or research notes.

SOURCE ANCHOR

Link-only public source spine.

SemiAgora uses the source as a signal and citation anchor, then writes original summaries and original toy data with explicit limitations.

DOE, NIST, AVS, AIP, TU Wien, ViennaTools, and industry RIE mechanism and evidence spine

https://science.osti.gov/-/media/fes/pdf/2023/DOE_FES_PlasmaScience_Semiconductors_Final.pdf

Open source ->