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SIMULATION / SA-PROC-CTRL-001

Lithography-to-etch feedforward control replay
Litho-etch feedforward

A browser CSV lab that links post-lithography CD and overlay observations to downstream etch correction, post-etch CD, Cpk proxy, delay proxy, and role-specific evidence gates.

sectionExploresectionRun CardsectionExportsectionMethodssectionLimitssectionEvidence

EXPLORE

Start with the observable.

Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.

guided exploration
  • Filter wafer zone, lithography CD bin, overlay signature, resist state, feedforward action, and focus bucket to inspect a process-control chain.
  • Compare pre-etch CD, etch-bias proxy, post-etch CD, CD sigma, Cpk proxy, defect-risk proxy, and inverter-delay proxy before judging a correction.
  • Use the next role view to decide whether the row belongs to operator record checking, engineer model adjustment, integration review, or yield-distribution confirmation.
  • Treat release gate labels as teaching gates for evidence fitness, not as manufacturing release decisions.
Open visual lab ->Open lesson ->

BROWSER INTERACTIVE LAB

Filter the saved CSV. Inspect matching replay rows.

No server solver is running here. The browser filters a precomputed table and redraws the plot locally.

loading matching rows / x: case index
Loading replay rowsReading the saved CSV in this browser.
post etch cd nm proxyinverter delay delta ps proxycpk proxy

Each metric is normalized independently for shape inspection. Vertical positions do not compare magnitude across metrics.

no matching replay row

n/apost etch cd nm proxy

n/ainverter delay delta ps proxy

n/acpk proxy

Change one or more controls to find a saved row. No unrelated CSV value is substituted.

case idwafer zonepost litho cd binoverlay signatureresist statefeedforward actionfocus bucketpre etch cd nm proxyetch bias nm proxypost etch cd nm proxyinverter delay delta ps proxycd sigma nm proxydefect risk proxycpk proxyrelease gatenext role view
Loading saved replay rows...

RUN CARD

Conditions before conclusions.

The browser filters saved CSV rows and redraws local plots. It does not run SEMulator3D, TCAD, SPICE, a scanner, an etcher, or any server-side process simulator, and it never emits equipment settings.

precomputed browser CSV process-control replay

Primary knobs

  • wafer_zone: center, mid, edge
  • post_litho_cd_bin: narrow, nominal, wide
  • overlay_signature: centered, x_shift, y_shift, rotation
  • resist_state: thin, nominal, thick
  • feedforward_action: none, track_remeasure, etch_bias_offset, hold_for_review
  • focus_bucket: low_focus, nominal_focus, high_focus
outputs

Saved outputs

  • pre-etch CD proxy
  • overlay error proxy
  • etch bias proxy
  • post-etch CD proxy
  • gate-width delta proxy
  • drive-current delta proxy
  • inverter-delay delta proxy
  • CD sigma proxy
  • defect-risk proxy
  • Cpk proxy
  • release gate
  • next role view

EXPORT

Download the public artifacts.

These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.

download

Feedforward replay CSV

/data/lithography-etch-feedforward-control-replay-v78.csv

Open file ->
download

Web result JSON

/data/lithography-etch-feedforward-control-replay-web-v1.json

Open file ->
download

Model card

/data/lithography-etch-feedforward-control-replay-model-card-v1.md

Open file ->

METHODS

How the number was made.

Methods are written for citation discipline: the extraction rule matters as much as the plotted value.

method

Generate a 1296-row synthetic teaching grid over wafer zone, lithography CD bin, overlay signature, resist state, feedforward action, and focus bucket.

Keep this method attached when reusing the figure or metric.

method

Compute pre-etch CD, overlay error, etch bias, post-etch CD, gate-width delta, drive-current delta, inverter-delay delta, CD sigma, defect-risk proxy, Cpk proxy, release gate, and next role view.

Keep this method attached when reusing the figure or metric.

method

Use public source anchors only for vocabulary and motivation; all visible rows and labels are original SemiAgora teaching proxies.

Keep this method attached when reusing the figure or metric.

LIMITS

What this page does not claim.

The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.

non-claim

Feedforward action labels are educational categories, not manufacturing instructions or tool setpoints.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

Cpk and defect-risk labels are invented evidence-fitness proxies and cannot be used as process-control, yield, product, or shipment decisions.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

A real deployment would require owned metrology data, tool state, process-owner review, sampling plans, uncertainty budgets, and safety/quality governance.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

No live server solver, uploaded wafer data, equipment-control workflow, process recipe, or release workflow is active on the public page.

Carry this boundary into any derivative note, paper draft, or slide.

EVIDENCE

Trace the claim back to artifacts.

The evidence route remains the catalog-level browser; this page is the simulation-level reading card.

evidence note

The CSV preserves every factor class and process-to-electrical proxy used by the browser lab.

SA-PROC-CTRL-001

evidence note

The JSON stores row counts, role views, public boundaries, source anchors, methods, limitations, and high-risk examples.

SA-PROC-CTRL-001

evidence note

The role-view matrix links this route to lithography, dry etch, metrology, and yield handoff questions.

SA-PROC-CTRL-001

evidence note

The public page is chain literacy only: post-lithography observation, downstream etch consequence, Cpk-style proxy, and delay proxy remain teaching artifacts.

SA-PROC-CTRL-001

Source spine

These links anchor the public teaching model. They do not convert the replay into a qualified process recipe or signoff result.

Feedforward control for semiconductor manufacturingTopic signal only; SemiAgora does not copy article body, sponsored framing, figures, SEMulator3D setup, or vendor claims.ASML measuring accuracyPublic metrology vocabulary anchor for overlay, alignment, and measurement discipline.ASML lithography technologyPublic lithography system vocabulary anchor; no tool operation or recipe instruction is reproduced.NIST CHIPS Metrology ProgramOfficial metrology program anchor for fit-for-purpose measurement and standards framing.NIST metrology and process-control uncertaintyOfficial/public uncertainty source anchor already used by SemiAgora process role views.SemiAgora global platform scan v2Public reading-room route for link-first daily study; internal v2 gap matrix selects this as the next chain lab.

Public execution boundary

No server-side live ngspice execution, uploads, accounts, payments, comments, newsletter signup, or job/event submissions are active on this page.