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SASemiAgoraSemiconductor knowledge & engineeringOpen lesson

SIMULATION / SA-PROC-METRO-CDSEM-OVERLAY-001

CD-SEM and overlay control
CD / Overlay

Replay CD site statistics and overlay vectors so lithography evidence carries linewidth and registration together.

sectionExploresectionRun CardsectionExportsectionMethodssectionLimitssectionEvidence

EXPLORE

Start with the observable.

Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.

guided exploration
  • Compare the 3 x 3 CD map against the nominal 100 nm target.
  • Inspect overlay vector direction and magnitude before using a single p95 value.
  • Use CD and overlay together when planning lithography evidence for a paper figure.
Open visual lab ->Open lesson ->

RUN CARD

Conditions before conclusions.

The public page replays saved dimensional-metrology data. It does not upload SEM images, run overlay correction, or release process-control limits.

precomputed replay

Primary knobs

  • Nominal CD: 100 nm
  • CD sites: 3 x 3 teaching sample
  • Overlay: dx/dy vectors at nine sites
  • Derived metrics: CD range, CD 3 sigma, overlay p95 and worst site
outputs

Saved outputs

  • CD site matrix
  • overlay-vector table
  • mean, range, and 3-sigma CD
  • overlay p95 and worst-site warning

EXPORT

Download the public artifacts.

These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.

download

Dataset JSON

/data/process-cd-sem-overlay-control-web-v1.json

Open file ->
download

Model script

/data/process_metrology_models.py

Open file ->
download

Metrology model card

/data/process-metrology-model-card.md

Open file ->

METHODS

How the number was made.

Methods are written for citation discipline: the extraction rule matters as much as the plotted value.

method

Compute CD mean, range, and 3-sigma from saved site samples.

Keep this method attached when reusing the figure or metric.

method

Compute overlay vector magnitude from dx and dy registration errors.

Keep this method attached when reusing the figure or metric.

method

Report p95 and worst-site overlay so nominal alignment is not overtrusted.

Keep this method attached when reusing the figure or metric.

method

Keep CD and overlay separate because linewidth control and layer registration fail differently.

Keep this method attached when reusing the figure or metric.

LIMITS

What this page does not claim.

The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.

non-claim

No SEM image processing, line-edge roughness, focus/exposure context, sampling-plan optimization, tool matching, or uncertainty budget is included.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

No qualified metrology, process-control release, scanner correction, facility procedure, or production overlay claim is implied.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

Real dimensional-metrology evidence requires calibrated tools, raw images or summary files, sampling plans, gauge studies, and rights-clean data.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

This replay is not a CD-SEM recipe, overlay correction deck, or wafer disposition rule.

Carry this boundary into any derivative note, paper draft, or slide.

EVIDENCE

Trace the claim back to artifacts.

The evidence route remains the catalog-level browser; this page is the simulation-level reading card.

evidence note

The dataset preserves CD matrix values, overlay vectors, and derived dimensional metrics.

SA-PROC-METRO-CDSEM-OVERLAY-001

evidence note

The model card keeps image-processing and scanner-control claims outside the public MVP.

SA-PROC-METRO-CDSEM-OVERLAY-001

evidence note

NIST dimensional-metrology sources anchor critical-dimension and pattern-control vocabulary.

SA-PROC-METRO-CDSEM-OVERLAY-001

Source spine

These links anchor the public teaching model. They do not convert the replay into a qualified process recipe or signoff result.

NIST dimensional metrology for nanoscale patternsPublic NIST page describing nanoscale pattern dimensions, critical-dimension control, and metrology needs.

Public execution boundary

No server-side live ngspice execution, uploads, accounts, payments, comments, newsletter signup, or job/event submissions are active on this page.