27.8 nmBest thicknessUNKNOWNInspect metric contract
0.08 degFit residual spanUNKNOWNInspect metric contract
+/-0.8 nmTeaching intervalUNKNOWNInspect metric contract
SIMULATION / SA-PROC-METRO-ELLIPSOMETRY-001
Ellipsometry thickness fit
Ellipsometry Fit
Replay a thin-film thickness fit and inspect residuals so a plotted film thickness is not separated from its optical-model assumptions.
EXPLORE
Start with the observable.
Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.
- Compare three candidate thickness curves before reading the selected value.
- Inspect residual sign and span so the best thickness is not just a single number.
- Use the page as a template for future ellipsometry, XRR, or profilometry evidence cards.
RUN CARD
Conditions before conclusions.
The public page replays saved fitting data. It does not upload spectra, run optical solvers, certify reference materials, or qualify films.
Primary knobs
- Wavelength samples: 400 nm to 700 nm
- Candidate thickness values: 26.5, 27.8, and 29.0 nm
- Observable: psi angle in degrees
- Fit metric: mean squared residual
Saved outputs
- measured psi samples
- candidate fitted curves
- residual vectors
- best-fit thickness and model-boundary notes
EXPORT
Download the public artifacts.
These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.
Dataset JSON
/data/process-ellipsometry-thickness-fit-web-v1.json
Open file ->Model script
/data/process_metrology_models.py
Open file ->Metrology model card
/data/process-metrology-model-card.md
Open file ->METHODS
How the number was made.
Methods are written for citation discipline: the extraction rule matters as much as the plotted value.
Compare measured and candidate psi curves at the same wavelength samples.
Keep this method attached when reusing the figure or metric.
Select the lowest mean squared residual while keeping the residual vector visible.
Keep this method attached when reusing the figure or metric.
Report a teaching confidence interval only as an uncertainty prompt.
Keep this method attached when reusing the figure or metric.
Keep optical-stack assumptions attached to any reused thickness number.
Keep this method attached when reusing the figure or metric.
LIMITS
What this page does not claim.
The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.
No calibrated optical constants, roughness layer, backside reflection, depolarization, or covariance matrix is included.
Carry this boundary into any derivative note, paper draft, or slide.
No qualified metrology, certified reference-material traceability, facility setting, wafer acceptance, or production-film claim is implied.
Carry this boundary into any derivative note, paper draft, or slide.
Measured signoff requires tool calibration, reference materials, uncertainty budget, and rights-clean raw data.
Carry this boundary into any derivative note, paper draft, or slide.
This replay must not be used as a process recipe or film acceptance criterion.
Carry this boundary into any derivative note, paper draft, or slide.
EVIDENCE
Trace the claim back to artifacts.
The evidence route remains the catalog-level browser; this page is the simulation-level reading card.
The dataset preserves measured samples, candidate curves, residuals, and fit scores.
SA-PROC-METRO-ELLIPSOMETRY-001
The model card states the public metrology boundary before any thickness claim travels.
SA-PROC-METRO-ELLIPSOMETRY-001
NIST thin-film metrology sources anchor the reference-material and measurement vocabulary.
SA-PROC-METRO-ELLIPSOMETRY-001
Source spine
These links anchor the public teaching model. They do not convert the replay into a qualified process recipe or signoff result.
Public execution boundary
No server-side live ngspice execution, uploads, accounts, payments, comments, newsletter signup, or job/event submissions are active on this page.