6144deterministic rowsUNKNOWNInspect metric contract
3072physical configurationsUNKNOWNInspect metric contract
0physical process valuesUNKNOWNInspect metric contract
SIMULATION / SA-EQP-PLASMA-CCP-ICP-008
CCP versus ICP chamber-state evidence map
Separate source, sheath, wall, delivery, and evidence state.
Compare bounded CCP and ICP reference archetypes across normalized drive, pressure regime, substrate bias, gas response, wall loss, matching state, radial zone, ion and neutral delivery, IEDF/IADF breadth, nonuniformity, role gates, and the restricted feature-scale handoff without exposing a recipe or equipment action.
EXPLORE
Start with the observable.
Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.
- Hold pressure, bias, gas response, wall loss, matching, radial zone, and evidence posture fixed; move through all 16 drive states and compare CCP and ICP source-coupling and plasma-density trajectories.
- Separate source coupling and bulk support from sheath burden, ion delivery, neutral delivery, IEDF breadth, IADF spread, and center-edge nonuniformity instead of reading one plasma score.
- Switch nominal and detuned matching or low and high wall loss to inspect how three exact integer teaching ledgers redistribute delivered, charged, and neutral tokens while every residual remains zero.
- Use operator, process-engineer, integration, and yield views to distinguish observable state, causal assumptions, feature-scale bridge eligibility, radial risk, and the evidence needed for replacement.
- Inspect the six allowed feature-bridge fields to SA-PROC-FEATURE-PMC-007 while keeping physical units, profile prediction, recipe handoff, and automatic equipment action disabled.
BROWSER CCP / ICP CHAMBER-STATE LAB
Source, sheath, wall, and wafer delivery stay separate.
Every value is an original dimensionless teaching proxy. The saved rows contain no physical pressure, gas flow, power, bias, density, energy, angle, chemistry, chamber geometry, measurement, recipe, matching action, or equipment control.
Coupling architecture
LoadingLoadingLoadingLoadingPhysical inputs remain zero
drive-state trace
Loading / Loading
DensitySheathNonuniformity
bounded causal state
Source to wafer-facing delivery
loadingSource coupling-
Plasma density-
Sheath burden-
Radial delivery-
normalized feature-bridge composition- ion / - neutral
Loading energy band- angular spread- radial factor
Operator view
Separate discharge support from actionable tool state.
LoadingRead sustained-state, matching, wall-loss, radial, and evidence gates together. None of these normalized states authorizes a setpoint, alarm disposition, matching action, maintenance step, or run decision.
Replacement evidence: Owned source and bias records, matching-network state, gas and vacuum delivery, chamber history, diagnostics, wafer context, safety controls, and an accountable run record.
Delivered drive ledger- tokensresidual -
- Bulk-
- Sheath-
- Match loss-
- Wall-
- Stored-
Generated charged ledger- tokensresidual -
- Wafer ion-
- Wall loss-
- Volume loss-
- Stored-
Generated neutral ledger- tokensresidual -
- Wafer neutral-
- Wall recombination-
- Exhaust-
- Stored-
feature-scale bridge boundary
Loading
The bridge can carry normalized ion fraction, neutral fraction, energy band, angular spread, radial factor, and evidence gate only.
- Physical units
- Blocked
- Profile prediction
- Blocked
- Automatic recipe handoff
- Blocked
- Target packet
- SA-PROC-FEATURE-PMC-007
| Drive | Normalized | Density | Sheath | Ion flux | Neutral flux | Nonuniformity | Evidence gate |
|---|
RUN CARD
Conditions before conclusions.
The browser filters and renders saved normalized rows. It does not solve a discharge, calculate a chemistry, run PIC/MCC or Boltzmann kinetics, operate a chamber or matching network, set a recipe, import eduPIC or PlasmaPy output, or predict a wafer profile.
Primary knobs
- bounded CCP or ICP reference archetype and 16 normalized drive states
- normalized low, middle, or high pressure regime plus low or high substrate-bias state
- electropositive-like or attachment-prone-like gas response and low or high wall-loss state
- nominal or detuned matching, center or edge radial zone, and teaching or replacement-slot evidence posture
Saved outputs
- source coupling, absorbed drive, bulk support, plasma density, electron burden, attachment, wall loss, and stored-state change proxies
- sheath burden, ion flux, neutral reactive flux, IEDF centroid/width, IADF spread, radial delivery, nonuniformity, and source-bias entanglement
- three exact integer teaching-token ledgers, twelve decision flags, four role gates, evidence gate, and readiness score
- six normalized feature-scale bridge fields with physical-unit, profile-prediction, recipe, and automatic-handoff claims disabled
EXPORT
Download the public artifacts.
These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.
CCP/ICP chamber-state CSV
/data/plasma-ccp-icp-chamber-state-v107.csv
Open file ->Web evidence manifest (JSON)
/data/plasma-ccp-icp-chamber-state-web-v1.json
Open file ->Model card
/data/plasma-ccp-icp-model-card-v1.md
Open file ->Metric contract
/data/plasma-ccp-icp-metric-contract-v1.json
Open file ->Source spine
/data/plasma-ccp-icp-source-spine-v1.json
Open file ->METHODS
How the number was made.
Methods are written for citation discipline: the extraction rule matters as much as the plotted value.
Complete deterministic 16 x 2 x 3 x 2 x 2 x 2 x 2 x 2 x 2 Cartesian sweep. Evidence posture is excluded from the physical key, seed, equations, ledgers, and physical gates, producing 3,072 paired physical states.
Keep this method attached when reusing the figure or metric.
Original dimensionless equations keep source coupling, absorbed drive, bulk excitation, plasma density, sheath burden, charged delivery, neutral delivery, wall loss, attachment, angular/energy breadth, radial delivery, and source-bias coupling separate.
Keep this method attached when reusing the figure or metric.
Drive, charged, and neutral integer teaching ledgers use deterministic largest-remainder allocation with physical-key seeding and close at exact zero in every row.
Keep this method attached when reusing the figure or metric.
Fourteen official or primary link-only anchors and ten claim nodes define vocabulary, provenance, rights, architecture, source/bias, wall/chemistry, uniformity, benchmark, feature-bridge, vendor-taxonomy, and replacement-evidence questions without supplying generated numbers.
Keep this method attached when reusing the figure or metric.
LIMITS
What this page does not claim.
The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.
CCP and ICP are bounded reference archetypes, not universal architectures or representations of a commercial chamber.
Carry this boundary into any derivative note, paper draft, or slide.
Pressure, source, bias, gas response, wall loss, match, radial state, flux, density, sheath, IEDF, IADF, and uniformity outputs are original normalized teaching proxies with no physical unit or copied source value.
Carry this boundary into any derivative note, paper draft, or slide.
The three integer token ledgers prove deterministic bookkeeping only; they do not establish physical conservation, calibration, predictive accuracy, or equipment behavior.
Carry this boundary into any derivative note, paper draft, or slide.
The replay is not a gas recipe, process window, equipment setpoint, matching-network action, maintenance instruction, supplier comparison, qualification result, production signoff, or named-tool equivalent.
Carry this boundary into any derivative note, paper draft, or slide.
EVIDENCE
Trace the claim back to artifacts.
The evidence route remains the catalog-level browser; this page is the simulation-level reading card.
6144 rows across 3072 physical configurations and 3072 evidence pairs, with 3072 CCP and 3072 ICP rows.
SA-EQP-PLASMA-CCP-ICP-008
Independent verification passed 16/16 with 190464 equation, 116736 token, 116736 gate, 199680 evidence-pair, and 804864 CSV/web comparisons.
SA-EQP-PLASMA-CCP-ICP-008
All three token-ledger residuals remain exactly zero; all 39 prohibited fields remain zero across 239616 checks.
SA-EQP-PLASMA-CCP-ICP-008
12 source anchors were directly reachable and 2 were access-gated with no hard failure; no source number, equation, curve, table, chemistry row, code, or solver output entered the packet.
SA-EQP-PLASMA-CCP-ICP-008
Source spine
These links anchor the public teaching model. They do not convert the replay into a qualified process recipe or signoff result.
The Gaseous Electronics Conference Radio-frequency Reference CellDefined parallel-plate RF reference-cell and reproducible experimental/model-comparison vocabulary for the bounded CCP archetype. Rights: link-only; NIST publication metadata and downloadable paper have separate rights noticesAn Inductively Coupled Plasma Source for the GEC RF Reference CellInductive-source architecture, diagnostic access, radial-density behavior, mode-transition, and chamber-wall-sensitivity scope. Rights: link-only; U.S. government journal article with third-party illustration caveatsKinetic-Energy Distributions of Ions in a Parallel-Plate RF Reference CellCCP sheath, ion-energy-distribution, pressure-dependence, and collisionality vocabulary. Rights: link-onlyIon Energy Distributions in Inductively Coupled RF DischargesMeasured ICP ion-energy, ion-species, and wafer-facing ion-current-density ownership vocabulary. Rights: link-onlyMeasurements and Modeling of IEDs in RF-Biased High-Density DischargesInductive-source versus substrate-bias channels, time-dependent sheath dynamics, diagnostics, and measured-model validation scope. Rights: link-onlyOptical CAT Measurements of Plasma Uniformity in an ICP DischargeSpatial nonuniformity, asymmetry, limited diagnostic access, and measurement-inversion ownership scope. Rights: link-onlyInfluence of Coil Geometry on Planar ICP Density DistributionCoil and power configuration, radial electron-density distribution, and diffusion-dominated wafer-region scope. Rights: link-only; publisher access restrictions may applySimulation Benchmarks for Low-Pressure Plasmas: Capacitive DischargesIndependent-code benchmarking, uncertainty, prescribed-case, and implementation-agreement vocabulary. Rights: link-only; repository record declares CC BY-NC-SA 3.0 for the deposited itemDesign of High Density Plasma Sources for Materials ProcessingBulk/sheath, high-density-source, ion-transport, uniformity, and materials-processing architecture vocabulary. Rights: link-only; commercial publisher rights applyGlobal Model of Ar, O2, Cl2, and Ar/O2 High-Density Plasma DischargesVolume-averaged particle/energy-balance vocabulary and the spatial-resolution limits of global models. Rights: link-only; UC Berkeley digital-collection use notice appliesExperimental and Modeling Study of O and Cl Atom Surface RecombinationPlasma-wall interaction, wall recombination, chamber-surface state, and model-input ownership scope. Rights: link-only; publisher rights applyPlasma Process MetrologyDiagnostic, measured-data, model-validation, process-control, and replacement-evidence ownership boundary. Rights: link-onlyInductively Coupled Plasma Reactive Ion EtchingSeparate inductive-source and substrate-bias architecture vocabulary only. Rights: link-only commercial terminologyEtch Essentials: The Building Blocks of AI Era MicrochipsCCP, ICP, dry-etch, ion/neutral, and application-segmentation terminology only. Rights: link-only commercial terminology
Public execution boundary
No server-side live ngspice execution, uploads, accounts, payments, comments, newsletter signup, or job/event submissions are active on this page.