31 / 81Passing grid pointsUNKNOWNInspect metric contract
-80 to 80 nmFocus sweepUNKNOWNInspect metric contract
-8% to 8%Exposure sweepUNKNOWNInspect metric contract
SIMULATION / SA-SEED-PROC-LITHO-WINDOW-001
Lithography focus-exposure process window
Litho Window
Replay focus, exposure, CD-error proxy, overlay proxy, and pass/fail window to explain process windows without scanner recipes.
EXPLORE
Start with the observable.
Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.
- Inspect where CD and overlay constraints overlap instead of optimizing one metric alone.
- Use failed grid points to name process-window risk without recipe settings.
- Compare this new card with the older process lithography-window replay.
RUN CARD
Conditions before conclusions.
This page replays saved lithography-window data and does not run a scanner, OPC, resist, or recipe workflow.
Primary knobs
- Focus offset
- Exposure delta
- CD and overlay constraints
Saved outputs
- CD-error proxy
- Overlay proxy
- Pass/fail window
EXPORT
Download the public artifacts.
These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.
Dataset JSON
/data/lithography-focus-exposure-window-web-v1.json
Open file ->Seed sweep summary CSV
/data/github-open-source-seed-sweep-summary.csv
Open file ->Seed model script
/data/github_open_source_seed_sims.py
Open file ->Seed model card
/data/github-open-source-seed-sims-model-card.md
Open file ->METHODS
How the number was made.
Methods are written for citation discipline: the extraction rule matters as much as the plotted value.
CD error is modeled as a quadratic focus term plus exposure sensitivity.
Keep this method attached when reusing the figure or metric.
Overlay proxy increases with absolute focus and exposure offset.
Keep this method attached when reusing the figure or metric.
A grid point passes only when both CD and overlay proxies remain inside the teaching thresholds.
Keep this method attached when reusing the figure or metric.
LIMITS
What this page does not claim.
The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.
No mask, resist chemistry, OPC, scanner, dose recipe, focus-exposure matrix from a fab, or calibrated wafer data.
Carry this boundary into any derivative note, paper draft, or slide.
No facility workflow or process recipe is exposed.
Carry this boundary into any derivative note, paper draft, or slide.
Metrology such as CD-SEM, overlay, and wafer maps is required before calibrated claims.
Carry this boundary into any derivative note, paper draft, or slide.
EVIDENCE
Trace the claim back to artifacts.
The evidence route remains the catalog-level browser; this page is the simulation-level reading card.
Seed sweep JSON stores every focus, exposure, CD, overlay, and pass/fail row.
SA-SEED-PROC-LITHO-WINDOW-001
CSV export preserves the process-window grid.
SA-SEED-PROC-LITHO-WINDOW-001
Promotion queue records this as a P0 process simulation candidate.
SA-SEED-PROC-LITHO-WINDOW-001
Source spine
These links anchor the public teaching model. They do not convert the replay into a qualified process recipe or signoff result.
Public execution boundary
No server-side live ngspice execution, uploads, accounts, payments, comments, newsletter signup, or job/event submissions are active on this page.