LESSON PACKET / SA-PROC-002
Oxidation, lithography, etch, CMP, and ion implantation belong in one starter pack because each converts a tool condition into a measurable material or pattern result.
PROCESS CHAIN
The MVP stays recipe-free. It teaches which observable must accompany the process claim: thickness, CD, profile, nonuniformity, endpoint margin, projected range, and activation.
Oxide thickness, consumed silicon, and diffusion broadening all move with time and temperature. A process claim needs those markers attached before the number travels.
43 nm dry / 174 nm wet / open simulation ->The nominal critical dimension is not enough. Dose and focus latitude determine whether the pattern is robust or just lucky at the center point.
18 / 25 pass points / open simulation ->Etch evidence should keep sidewall angle, lateral CD loss, selectivity, and mask remaining visible together.
45 nm RIE mask left / open simulation ->A blanket removal rate does not fully explain dishing, erosion, radial nonuniformity, or endpoint margin.
120 nm/min max replay / open simulation ->Implant energy sets a depth distribution. Anneal activates dopants while also broadening the profile.
Rp 80 nm / 72% activation / open simulation ->SIMULATION BUNDLE
Each object carries Explore, Run Card, Export, Methods, Limits, and Evidence. The lecture gives the story; the simulation page carries the reusable artifact.
Compare dry and wet oxidation growth, silicon consumption, and diffusion broadening before treating thermal steps as reusable evidence.
Open Oxidation Budget ->Replay a dose/focus matrix to see why a printed CD is only useful when the process window and variation boundary are visible.
Open Litho Window ->Compare isotropic, directional, and low-selectivity etch cases to keep mask budget, CD loss, and sidewall profile attached.
Open Etch Profile ->Replay Preston-style removal, pattern-density warnings, radial nonuniformity, and endpoint margin before citing a CMP result.
Open CMP Planarization ->Replay projected range, straggle, activation, and diffusion broadening to keep doping evidence separate from a recipe.
Open Implant Anneal ->Replay focus, exposure, CD-error proxy, overlay proxy, and pass/fail window to explain process windows without scanner recipes.
Open Litho Window ->Replay aspect ratio, bias class, and wafer location to compare anisotropy, selectivity, CD bias, and pass-probability proxy.
Open Etch UQ ->Replay pattern density, feature width, overpolish proxy, and pad age to connect layout density with dishing, erosion, nonuniformity, and planarization evidence.
Open CMP Dishing ->Filter chemistry, pressure, RF power, and overetch to inspect etch-rate, CD-bias, LER, DIBL, and inverter-delay teaching proxies.
Open Etch CD Chain ->SOURCE SPINE
These links are teaching anchors. They do not authorize recipe copying, restricted manual redistribution, or qualification claims.
https://ocw.mit.edu/courses/6-152j-micro-nano-processing-technology-fall-2005/
Open source ->https://ocw.mit.edu/courses/6-152j-micro-nano-processing-technology-fall-2005/pages/lecture-notes/
Open source ->https://ocw.mit.edu/courses/6-774-physics-of-microfabrication-front-end-processing-fall-2004/pages/readings/
Open source ->https://ocw.mit.edu/courses/6-152j-micro-nano-processing-technology-fall-2005/59b9f31d836355a3380aa156925508bc_lecture17.pdf
Open source ->https://web.mit.edu/cmp/publications/papers/noh_final.pdf
Open source ->https://ocw.mit.edu/courses/2-830j-control-of-manufacturing-processes-sma-6303-spring-2008/resources/2-semiconductor-process-variation/
Open source ->DATA TO COLLECT NEXT
The next upgrade is not secret recipes. It is public-safe metrology with uncertainty, conditions, and redistribution rights attached.
Store the data with measurement method, uncertainty, process boundary, source rights, and non-claims.
Store the data with measurement method, uncertainty, process boundary, source rights, and non-claims.
Store the data with measurement method, uncertainty, process boundary, source rights, and non-claims.
Store the data with measurement method, uncertainty, process boundary, source rights, and non-claims.
Store the data with measurement method, uncertainty, process boundary, source rights, and non-claims.
Store the data with measurement method, uncertainty, process boundary, source rights, and non-claims.
No live tool operation, recipe upload, account workflow, payment, comment, newsletter signup, job/event submission, or facility credential collection is active in this MVP.