Emerging device, memory & integration atlas
MRAM, FeFET/HZO, IGZO, 2D CFET, p-GaN contacts, GaN HEMT, and 3D integration across five disjoint evidence dimensions, held gates, contradictions, and replacement slots
TOUCH LABS
Start with the six-family etch-depth atlas: choose HAR, ALE, selective etch, DRIE, strip and ash, or wet etch, then load one validated CSV and keep profile, selectivity, transport, mask, residue, metrology, role, and replacement-evidence boundaries visible. Continue into RIE mechanism, vacuum and gas delivery, plasma source and sheath state, particle Monte Carlo topography, process-device-yield integration, metrology, devices, memory, circuits, reliability, and verification.
REPRODUCIBLE LABS
Models are labeled by fidelity. Every result exposes its assumptions, execution method, validation state, and downloadable evidence.
MRAM, FeFET/HZO, IGZO, 2D CFET, p-GaN contacts, GaN HEMT, and 3D integration across five disjoint evidence dimensions, held gates, contradictions, and replacement slots
Planar, fin, and nanosheet geometry; total and width-normalized Ioff; gm/Id operating conditions; synthetic TLM; contact drop; residual splits; corner versus Monte Carlo; and five disjoint SPICE layers
Eight same-contract uncertainty budgets across LER/LWR, PSD, aperture, finite sampling, SRAM hierarchy, plasma etch, Gauge R&R, and hybrid bonding with explicit refusal states
Compare solver, numerical, model, metric, and signoff states across timestep, tolerance, initial-condition, saved-signal, and measurement-definition cases without treating convergence as validity
Known-ground-truth condition, lot, wafer, site, and replicate hierarchy with covariance-aware variance closure, missingness coverage, uncertainty denominators, and fixed-condition boundaries
Seeded paired edge traces, exact left-right correlation, extraction bandwidth, local-CD aperture, histogram conservation, and bounded device-to-SRAM sensitivity proxies
Choose HAR, ALE, selective etch, DRIE, strip and ash, or wet etch; load one validated family CSV; inspect profile, selectivity, residue, surface, metrology, exact-ledger, and role-gate evidence
Variation families, device and circuit evidence, reliability and yield context, genealogy, four role views, three exact ledgers, upstream packet postures, and the v120 human-review gate
Ion drive, neutral reactivity, passivation, directionality, mask resilience, feature access, six mechanism regimes, exact ledgers, role gates, and the bounded feature-profile handoff
Flow-model regime, admitted load, wall release, conductance, nominal and effective pumping, chamber and foreline inventory, settling, distribution, exact ledgers, role gates, and the bounded plasma handoff
Bounded architecture, drive, pressure, bias, gas response, wall loss, matching, sheath, ion/neutral delivery, energy-angle breadth, radial state, exact ledgers, role gates, feature bridge, and replacement evidence
Directional RIE and sputter deposition across source, species, surface, reflection, secondary transport, exact geometry, conservation, role views, and replacement gates
Series-junction scaling, reference-junction correction, drift, mechanical hysteresis, cross-sensitivity, residual, uncertainty, traceability, and replacement gates
Bias, gate state, band alignment, broadening, background transport, contact pressure, sweep direction, trap memory, and stable negative-slope evidence gates
Potential, carriers, and solved current-voltage response
Gate control, two drain biases, current, and solved surface inversion
Gate bias, surface carriers, quasi-static C-V, and high-frequency boundary
FinFET fin-count PPA, GAA nanosheet electrostatics, and variability boundaries
Stacked n/p devices, MOL contacts, vias, local interconnect, thermal coupling, delay, energy, and integration risk
Semi-insulating SiC, GaN buffer traps, HEMT mode, package thermal path, dynamic Ron, and reliability gates
Stress class, drain bias, recovery window, trap memory, current collapse, thermal risk, and method caution
Device context, design lever, DOE plan, surrogate uncertainty, extrapolation risk, mesh stability, calibration anchor, and decision gate
Electrostatic control, footprint, contacts, capacitance, variability, thermal coupling, integration risk, evidence maturity, and circuit handoff
Complex intrinsic and fixture-embedded S-parameters, reference impedance, correction classes, residual error, fixture passivity, linear stability, fT/fmax, RF noise, and replacement evidence
Photon energy, LED and laser boundaries, ideal detector responsivity, all-pass ring transfer, MZI phase, and replacement-evidence gates
Geometry, normalized current distribution, edge and constriction state, photon or dark context, mechanism ambiguity, timing/radiometry lineage, uncertainty, and replacement gates
Tier assignment, oxide access transport, contacts, inter-tier links, WL/BL loading, thermal budget, extraction maturity, cell/subarray sensitivities, contradictions, and replacement evidence
Input, output, gain, and sampled noise margins
Stage count, capacitive load, frequency, delay, and switching power
Current mirror compliance, output resistance, sense regeneration, and decision margin
FO4 delay, VDD, temperature, energy, leakage, and EDP timing vocabulary
Precharge, wordline, differential bitlines, read disturb, and load-dependent delay
Butterfly curve, maximum square, and hold/read comparison
Wordline amplitude, cell-VDD assist, pass/fail shmoo, and write waveform
Mux ratio, shared sense load, transfer efficiency, write off-state, and output timing
Sense margin, column I/O, read-disturb sizing, assist taxonomy, and cache behavior evidence layers
DRAM/HBM bank behavior, retention, RowHammer, NAND, 3D NAND, PCM, ReRAM, FeFET, MRAM, hierarchy, and CIM tradeoffs
DRAM stack, base die, TSV, interposer, PHY, controller, thermal, bandwidth, capacity, and yield tradeoffs
Retention tails, temperature, refresh tax, activation pressure, ECC/scrub coverage, thermal stress, residual risk, and next evidence checks
SRAM, DRAM, HBM, NAND, MRAM, FeFET, ReRAM, PCM, SCM, embedded NVM, eDRAM, and CIM placement evidence
Switch probability, write energy, read margin, retention proxy, and disturb risk
Actual GDS layers, DRC, LVS, PEX, and pre/post timing
DRC/LVS/PEX/timing checkpoints, evidence confidence, fix-risk proxy, and safe evidence checks
Wire length, layer class, route style, fanout load, checkpoint stage, RC, slew, and slack-risk proxies
Utilization, macro channels, PDN strategy, routing congestion, IR-drop, CTS pressure, skew, and timing-risk gates
Drive strength, input slew, output load, pin cap, setup/hold slack, max-cap/slew risk, and report-stage evidence
Clock skew/latency, route overflow/completion, extracted RC, IR/current-density pressure, report mismatch, replacement slots, and owner review
Model assumptions, characterization, routed reports, test structures, measurement state, discrepancy, uncertainty, provenance, and claim maturity
Crossed/nested design, part spread, repeatability, operator/tool/interaction reproducibility, bias, linearity, stability, resolution, uncertainty, and discrimination
Sputter uniformity, PVD step coverage, evaporation line-of-sight, and ALD growth-per-cycle saturation
Oxidation, lithography, plasma etch UQ, CMP, implant, and anneal evidence cards
Wafer zone, changing uncertainty, CD bias, selectivity, and optimizer caution
Ellipsometry, sheet resistance, TLM, CD/overlay, SPC, DOE, and lithography-to-etch feedforward evidence cards
Sparse physical metrology, model uncertainty, drift, guardband, Cpk proxy, escape risk, and sample-more decisions
Signal quality, FDC state, VM uncertainty, sampling coverage, feedforward handoff, false-alarm risk, wafer-at-risk, and role review
O2 plasma, O3 ozone, contact angle, residue proxy, and recovery boundaries
RTA activation, thermal budget, implant recovery, TED, and silicide contact windows
Contamination removal, native oxide, HMDS adhesion, and clean-sequence evidence queue
Cleanroom particle budget, vacuum pumpdown, tool availability, and utilities load cards
Package parasitics, thermal stack, wafer sort guardband, and reliability stress cards
Roughness, stiffness spread, particle state, metrology sigma, and readiness bands
Read/write protocol, assertions, and verified timing trace
80-access fault test with SA0/SA1 injection and cycle replay
Exhaustive one- and two-bit codeword fault injection
Storage-capacitor leakage, sensing boundary, and refresh margin
Cell current, bitline capacitance, and sense-enable timing
Lumped versus 3/5-section RC delay and Elmore approximation
Coupling capacitance, victim peak noise, and recovery time
Load current, rail resistance, voltage gradient, and endpoint supply loss