PROCESS REPLAY LAB / SA-PROC-001
This lab is a process-safe launch surface for the three public teaching simulations. It uses precomputed data and source notes only; no recipe execution or facility workflow is active.
RUN ONE QUESTION
For process education, the first job is not to expose a recipe. It is to keep geometry, saturation, method, limitation, and source notes attached to the claim.
Replay radial film-thickness profiles to see why rotation, source shape, pressure regime, and geometry matter before a sputter recipe is trusted.
+/-3.97% / 7.7 nm / 100 nm / 2 radial profiles
Open simulation ->Compare long-throw and short-throw evaporation profiles, then separate open-field uniformity from sidewall shadowing.
2.1 nm / 100 nm / 11.1 nm / 100 nm / sidewall factor 0.18
Open simulation ->Replay dose saturation, 100-cycle thickness arithmetic, temperature-window framing, and aspect-ratio conformality warnings.
0.11 nm/cycle / 11.0 nm / 2 s
Open simulation ->Replay feature aspect ratio and scattering proxy to see why PVD coverage is not just blanket thickness.
62.057 / AR 0.5 / pressure proxy 10 / 15 cases
Open simulation ->MODEL BOUNDARY
The public replay is designed for intuition and paper figures. It is not a tool recipe, process qualification, or wafer-fab instruction.
Open radial thickness, line-of-sight, and ALD saturation datasets with their assumptions visible.
Use the public source notes and limitations when making slides, drafts, or teaching figures.
No process upload, tool account, facility credential, live execution, or qualified recipe claim is present.