LESSON PACKET / SA-PROC-001
Sputter, evaporation, and ALD belong together because each asks the same research question: what condition produced this film, and what evidence says it was uniform, conformal, or saturated?
PROCESS CHAIN
The MVP does not publish facility recipes. It teaches the observable: radial uniformity for sputter, line-of-sight shadowing for evaporation, and self-limiting cycle growth for ALD.
A sputter film can hit the target thickness at wafer center while still losing thickness near the edge. Rotation helps average angular variation, but it does not erase radial geometry.
+/-3.97% / open simulation ->Thermal and e-beam evaporation are directional. A long throw can make the open field look good while topography still creates line-of-sight shadowing.
2.1 nm edge loss / open simulation ->ALD turns cycle count into thickness only after each half-reaction saturates and the process stays inside a usable temperature and transport window.
0.11 nm/cycle / open simulation ->SIMULATION BUNDLE
Each object keeps its run card, downloads, methods, limits, and source links attached. The lesson explains the ideas; the simulation pages carry the reusable evidence card.
Replay radial film-thickness profiles to see why rotation, source shape, pressure regime, and geometry matter before a sputter recipe is trusted.
Open Sputter Uniformity ->Compare long-throw and short-throw evaporation profiles, then separate open-field uniformity from sidewall shadowing.
Open Evaporation LOS ->Replay dose saturation, 100-cycle thickness arithmetic, temperature-window framing, and aspect-ratio conformality warnings.
Open ALD GPC ->Replay feature aspect ratio and scattering proxy to see why PVD coverage is not just blanket thickness.
Open PVD Step Coverage ->SOURCE SPINE
These links support the teaching vocabulary. They do not authorize copying recipes, redistributing restricted manuals, or claiming tool qualification.
https://mrl.illinois.edu/facilities/research-cores/micronano-fabrication-and-cleanroom/deposition-tools
Open source ->https://pubmed.ncbi.nlm.nih.gov/19947596/
Open source ->https://cris.vtt.fi/en/publications/surface-chemistry-of-atomic-layer-deposition-a-case-study-for-the/
Open source ->https://www.nist.gov/publications/atomic-layer-deposition-mos2-films-using-bistert-butylimido-bisdimethylamidomolybdenum
Open source ->DATA TO COLLECT NEXT
For the next build, the best materials are public-safe metrology summaries. Recipe parameters can stay private while the evidence contract still improves.
Store the data with conditions, metrology method, uncertainty, redistribution rights, and limitations.
Store the data with conditions, metrology method, uncertainty, redistribution rights, and limitations.
Store the data with conditions, metrology method, uncertainty, redistribution rights, and limitations.
Store the data with conditions, metrology method, uncertainty, redistribution rights, and limitations.
Store the data with conditions, metrology method, uncertainty, redistribution rights, and limitations.
Store the data with conditions, metrology method, uncertainty, redistribution rights, and limitations.
No live tool operation, recipe upload, account workflow, payment, comment, newsletter signup, job/event submission, or facility credential collection is active in this MVP.