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SIMULATION / SA-PROC-CVD-ALD-GPC-001

ALD growth-per-cycle saturation
ALD GPC

Replay dose saturation, 100-cycle thickness arithmetic, temperature-window framing, and aspect-ratio conformality warnings.

sectionExploresectionRun CardsectionExportsectionMethodssectionLimitssectionEvidence

EXPLORE

Start with the observable.

Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.

guided exploration
  • Sweep precursor pulse time until growth-per-cycle saturates.
  • Compare the ideal temperature window against incomplete-reaction and decomposition warnings.
  • Use the aspect-ratio table to see why ALD is conformal but not magically transport-free.

RUN CARD

Conditions before conclusions.

The public page replays saved ALD teaching data. It does not run reactor recipes, precursor dosing, or film qualification.

precomputed replay

Primary knobs

  • Precursor pulse: 0.05 s to 4 s
  • Nominal saturated GPC: 0.11 nm/cycle
  • Cycle count: 100
  • Aspect ratio: 1, 5, and 20
outputs

Saved outputs

  • GPC versus pulse time
  • thickness after 100 cycles
  • temperature-window interpretation
  • top/middle/bottom conformality table

EXPORT

Download the public artifacts.

These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.

download

Dataset JSON

/data/process-ald-growth-window-web-v1.json

Open file ->
download

Model script

/data/process_thin_film_models.py

Open file ->
download

Process model card

/data/process-thin-film-model-card.md

Open file ->

METHODS

How the number was made.

Methods are written for citation discipline: the extraction rule matters as much as the plotted value.

method

Use theta = 1 - exp(-dose / tau) as the self-limiting surface saturation replay.

Keep this method attached when reusing the figure or metric.

method

Multiply GPC by cycle count to keep thickness arithmetic explicit.

Keep this method attached when reusing the figure or metric.

method

Separate dose saturation from temperature-window interpretation.

Keep this method attached when reusing the figure or metric.

method

List high-aspect-ratio conformality as a transport warning rather than a guaranteed coverage claim.

Keep this method attached when reusing the figure or metric.

LIMITS

What this page does not claim.

The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.

non-claim

No precursor identity, pressure, purge time, sticking coefficient, byproduct transport, plasma enhancement, nucleation delay, or impurity incorporation is modeled.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

No dielectric constant, density, leakage, breakdown, stress, roughness, or reliability claim is made.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

The 0.11 nm/cycle scale is an educational arithmetic anchor, not a SemiAgora recipe.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

Real ALD qualification requires facility-approved process windows and film metrology.

Carry this boundary into any derivative note, paper draft, or slide.

EVIDENCE

Trace the claim back to artifacts.

The evidence route remains the catalog-level browser; this page is the simulation-level reading card.

evidence note

The dataset preserves pulse-time, temperature, and aspect-ratio tables with explicit limitations.

SA-PROC-CVD-ALD-GPC-001

evidence note

The model card links the ALD replay to public review and publication records.

SA-PROC-CVD-ALD-GPC-001

evidence note

The page keeps self-limiting growth separate from reactor-specific recipe claims.

SA-PROC-CVD-ALD-GPC-001

Public execution boundary

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