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SIMULATION / SA-PROC-008-SPUTTER-PVD-STEP-001

Sputter/PVD step coverage and continuity
PVD Step Coverage

Replay feature aspect ratio and scattering proxy to see why PVD coverage is not just blanket thickness.

sectionExploresectionRun CardsectionExportsectionMethodssectionLimitssectionEvidence

EXPLORE

Start with the observable.

Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.

guided exploration
  • Compare blanket thickness with bottom and sidewall coverage before trusting a film.
  • Use aspect ratio as the first warning that line-of-sight deposition may fail inside features.
  • Treat scattering as a qualitative knob, not a pressure recipe.

RUN CARD

Conditions before conclusions.

This page replays saved PVD surrogate data and does not run a chamber, equipment model, or recipe workflow.

precomputed process-window sweep

Primary knobs

  • Feature aspect ratio
  • Pressure/scattering proxy
  • Continuity score rule
outputs

Saved outputs

  • Bottom coverage
  • Sidewall coverage
  • Overhang risk
  • Continuity score

EXPORT

Download the public artifacts.

These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.

download

Dataset JSON

/data/sputter-pvd-step-coverage-web-v1.json

Open file ->
download

Dataset CSV

/data/sputter-pvd-step-coverage-v64.csv

Open file ->
download

v64 deep simulation summary CSV

/data/v64-deep-simulations-summary.csv

Open file ->
download

v64 deep model script

/data/v64_deep_semiconductor_sims.mjs

Open file ->
download

v64 deep model card

/data/v64-deep-simulations-model-card.md

Open file ->

METHODS

How the number was made.

Methods are written for citation discipline: the extraction rule matters as much as the plotted value.

method

Bottom coverage decays with feature aspect ratio and is slightly moderated by scattering proxy.

Keep this method attached when reusing the figure or metric.

method

Sidewall coverage increases with scattering but loses ground as aspect ratio grows.

Keep this method attached when reusing the figure or metric.

method

Continuity score combines bottom/sidewall coverage with an overhang-risk penalty.

Keep this method attached when reusing the figure or metric.

LIMITS

What this page does not claim.

The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.

non-claim

No target material, wafer rotation, pressure, power, collimation, ionization, or chamber recipe is represented.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

No production step coverage, reliability, or integration recommendation is made.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

Use cross-section metrology, sheet resistance, TEM/SEM, and process ownership before calibrated claims.

Carry this boundary into any derivative note, paper draft, or slide.

EVIDENCE

Trace the claim back to artifacts.

The evidence route remains the catalog-level browser; this page is the simulation-level reading card.

evidence note

v64 deep results store every aspect-ratio, scattering, coverage, and continuity row.

SA-PROC-008-SPUTTER-PVD-STEP-001

evidence note

CSV export preserves the step-coverage table.

SA-PROC-008-SPUTTER-PVD-STEP-001

evidence note

The existing thin-film lesson keeps this card inside deposition learning rather than equipment operation.

SA-PROC-008-SPUTTER-PVD-STEP-001

Source spine

These links anchor the public teaching model. They do not convert the replay into a qualified process recipe or signoff result.

Public execution boundary

No server-side live ngspice execution, uploads, accounts, payments, comments, newsletter signup, or job/event submissions are active on this page.