RTA activation and diffusion tradeoff
Replay normalized rapid-thermal-anneal budgets to compare dopant activation, diffusion broadening, and sheet-resistance proxy.
91.71% / 16.52 nm / 386.8 ohm/sq
Open simulation ->PROCESS REPLAY LAB / SA-PROC-005
This lab collects four precomputed thermal-processing simulations for paper-first review: RTA activation, thermal budget mode, damage recovery, and silicide contact window.
RUN ONE QUESTION
Every card keeps a condition, output, method, source, and limitation attached. The point is evidence discipline, not facility operation.
Replay normalized rapid-thermal-anneal budgets to compare dopant activation, diffusion broadening, and sheet-resistance proxy.
91.71% / 16.52 nm / 386.8 ohm/sq
Open simulation ->Compare furnace soak, spike RTA, and millisecond anneal modes so shallow-junction benefit and temperature-control risk stay visible together.
0.36 / 3.2 nm / 0.92 score
Open simulation ->Replay post-implant defect recovery, activated fraction, and transient-enhanced-diffusion tail growth on one normalized anneal axis.
73.0% / 30.84% / 29.97 nm
Open simulation ->Replay under-reacted, target-window, and over-annealed contact cases so sheet resistance and morphology risk stay paired.
4.4 ohm/sq / 88% / 0.72
Open simulation ->Replay temperature and time to compare activation fraction, diffusion length, and a junction tradeoff score without exposing anneal recipes.
-1.1309 / 850 C / 1 s / 25 cases
Open simulation ->Filter anneal method, temperature, time, and implant dose to inspect activation, diffusion, sheet resistance, Vt shift, and FO4-delay teaching proxies.
135 cases / 21.52 ps / heatmap slices
Open simulation ->A browser CSV lab connecting surface/contact preparation, silicide anneal, contact area, activation proxy, Rc/Rsd proxy, ring oscillator delay proxy, and SRAM bitline delay proxy.
144 / 3 / 4 / 0
Open simulation ->MODEL BOUNDARY
The public replay is for teaching, figures, and early paper planning. It is not a furnace recipe, RTA program, laser process, contact qualification, wafer release rule, or signoff result.
Open RTA, thermal budget, implant recovery, and silicide window data with their assumptions visible.
Use the public source notes and limitations when making slides, drafts, or teaching figures.
No process upload, tool account, facility credential, live execution, endpoint control, release dashboard, or qualified process-window claim is present.