135 casesRowsUNKNOWNInspect metric contract
21.52 psMinimum delay proxyUNKNOWNInspect metric contract
heatmap slicesInteraction modeUNKNOWNInspect metric contract
SIMULATION / SA-PROC-INT-ANNEAL-DEVICE-CIRCUIT-001
Anneal activation to device and FO4 delay interactive lab
Anneal Chain
Filter anneal method, temperature, time, and implant dose to inspect activation, diffusion, sheet resistance, Vt shift, and FO4-delay teaching proxies.
EXPLORE
Start with the observable.
Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.
- Separate activation benefit from diffusion cost before claiming a better thermal process.
- Connect sheet resistance and Vt-shift proxies to a circuit-level FO4 delay proxy.
- Use the page as an integration-view example: a thermal module changes device and circuit evidence.
BROWSER INTERACTIVE LAB
Filter the saved CSV. Inspect matching replay rows.
No server solver is running here. The browser filters a precomputed table and redraws the plot locally.
Loading replay rowsReading the saved CSV in this browser.
activation fraction proxydiffusion length nm proxyfo4 delay ps proxy
Each metric is normalized independently for shape inspection. Vertical positions do not compare magnitude across metrics.
n/aactivation fraction proxy
n/adiffusion length nm proxy
n/afo4 delay ps proxy
Change one or more controls to find a saved row. No unrelated CSV value is substituted.
| anneal method | peak temp c | time s | implant dose norm | activation fraction proxy | diffusion length nm proxy | vt shift mv proxy | fo4 delay ps proxy |
|---|---|---|---|---|---|---|---|
| Loading saved replay rows... | |||||||
RUN CARD
Conditions before conclusions.
The browser filters the saved CSV and redraws local plots. It does not run a furnace/RTA workflow, process recipe, TCAD deck, SPICE server job, or product Vmin claim.
Primary knobs
- Anneal method
- peak temperature
- time
- implant dose normalization
Saved outputs
- activation fraction
- diffusion length
- residual damage
- sheet resistance
- Vt shift
- FO4 delay proxy
EXPORT
Download the public artifacts.
These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.
Interactive CSV
/data/interactive-anneal-device-circuit-chain-v1.csv
Open file ->Interactive seed catalog
/data/interactive-lab-seed-catalog-v1.json
Open file ->Process view matrix
/data/process-module-view-matrix-v1.json
Open file ->METHODS
How the number was made.
Methods are written for citation discipline: the extraction rule matters as much as the plotted value.
Activation, diffusion, and residual-damage proxies are generated from declared method, time, temperature, and dose dimensions.
Keep this method attached when reusing the figure or metric.
Sheet resistance and Vt-shift proxies are calculated from the activation/diffusion tradeoff for teaching only.
Keep this method attached when reusing the figure or metric.
FO4 delay proxy links process-side terms to a circuit observable without claiming a calibrated device or timing model.
Keep this method attached when reusing the figure or metric.
LIMITS
What this page does not claim.
The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.
Browser-side filtering and nearest-row replay only; no live server solver is active.
Carry this boundary into any derivative note, paper draft, or slide.
Teaching proxy data only; not a process recipe, calibrated device model, or product qualification result.
Carry this boundary into any derivative note, paper draft, or slide.
No equipment-control workflow, PDK ingestion, private process data, upload, account, payment, comment, newsletter, or job/event workflow is enabled.
Carry this boundary into any derivative note, paper draft, or slide.
EVIDENCE
Trace the claim back to artifacts.
The evidence route remains the catalog-level browser; this page is the simulation-level reading card.
The CSV preserves every anneal method, temperature, time, dose, and proxy value used by the browser lab.
SA-PROC-INT-ANNEAL-DEVICE-CIRCUIT-001
The row-level evidence supports classroom what-if comparisons, not process qualification.
SA-PROC-INT-ANNEAL-DEVICE-CIRCUIT-001
The source spine anchors DTCO/STCO and metrology language without copying paper bodies.
SA-PROC-INT-ANNEAL-DEVICE-CIRCUIT-001
Source spine
These links anchor the public teaching model. They do not convert the replay into a qualified process recipe or signoff result.
NIST CHIPS Metrology ProgramMeasurement and fit-for-purpose metrology framing for evidence boundaries.NIST metrology and process control uncertaintyPublic page anchoring uncertainty vocabulary for process-control decisions.TSMC DTCO introductionDesign/process co-optimization vocabulary for integration view.imec STCO overviewSystem-to-technology requirement framing for integration view.Process-induced variability DTCO compact modelProcess-variation-to-circuit-metric chain direction; no article body is copied.
Public execution boundary
No server-side live ngspice execution, uploads, accounts, payments, comments, newsletter signup, or job/event submissions are active on this page.