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SASemiAgoraSemiconductor knowledge & engineeringOpen lesson

SIMULATION / SA-PROC-THERM-DAMAGE-RECOVERY-001

Implant damage recovery and TED
Damage / TED

Replay post-implant defect recovery, activated fraction, and transient-enhanced-diffusion tail growth on one normalized anneal axis.

sectionExploresectionRun CardsectionExportsectionMethodssectionLimitssectionEvidence

EXPLORE

Start with the observable.

Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.

guided exploration
  • Move along normalized anneal time and watch defects fall.
  • Read activated fraction and TED tail proxy together.
  • Use the replay as a review checklist for implant/anneal claims in papers.
Open visual lab ->Open lesson ->

RUN CARD

Conditions before conclusions.

The public page replays saved teaching data. It does not run a process simulator or accept implant/anneal settings.

precomputed replay

Primary knobs

  • Normalized anneal time: 0, 1, 2, 5, 10, 20, 40
  • Outputs: defect remaining, activated fraction, TED tail proxy
  • Review focus: damage recovery versus diffusion tail growth
  • Boundary: no calibrated defect chemistry or dopant-specific model
outputs

Saved outputs

  • defect remaining curve
  • activated-fraction curve
  • TED tail proxy
  • review notes for public evidence

EXPORT

Download the public artifacts.

These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.

download

Dataset JSON

/data/process-implant-damage-recovery-web-v1.json

Open file ->
download

Model script

/data/process_thermal_processing_models.py

Open file ->
download

Thermal model card

/data/process-thermal-processing-model-card.md

Open file ->

METHODS

How the number was made.

Methods are written for citation discipline: the extraction rule matters as much as the plotted value.

method

Use normalized anneal time to generate monotonic defect-recovery and activation curves.

Keep this method attached when reusing the figure or metric.

method

Track TED tail as a separate proxy so damage cleanup is not mistaken for profile preservation.

Keep this method attached when reusing the figure or metric.

method

Report the sample count and monotonic checks in the evidence payload.

Keep this method attached when reusing the figure or metric.

method

Keep this as a paper-review simulator, not a diffusion-calibration model.

Keep this method attached when reusing the figure or metric.

LIMITS

What this page does not claim.

The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.

non-claim

No ion species, dose, energy, channeling, amorphization, point-defect clustering, surface recombination, or material-specific calibration is modeled.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

No SUPREM, TCAD, SIMS fitting, spreading resistance, leakage, or Hall measurement is included.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

The normalized time axis is a teaching axis and must not be copied into equipment settings.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

Real implant/anneal evidence needs implant conditions, anneal history, defect metrology, electrical activation, and rights-clean profile data.

Carry this boundary into any derivative note, paper draft, or slide.

EVIDENCE

Trace the claim back to artifacts.

The evidence route remains the catalog-level browser; this page is the simulation-level reading card.

evidence note

The dataset preserves seven normalized anneal samples.

SA-PROC-THERM-DAMAGE-RECOVERY-001

evidence note

Verification checks defects decrease while activation and TED tail increase.

SA-PROC-THERM-DAMAGE-RECOVERY-001

evidence note

MIT OCW source anchors keep TED vocabulary attached to the non-claim boundary.

SA-PROC-THERM-DAMAGE-RECOVERY-001

Source spine

These links anchor the public teaching model. They do not convert the replay into a qualified process recipe or signoff result.

MIT OCW 6.152J ion implantation lecturePublic lecture-note page anchoring diffusion, ion implantation, projected range, and implantation damage vocabulary.MIT OCW 6.774 transient enhanced diffusionPublic lecture page for TED simulation examples and post-implant diffusion context.Optimal control of rapid thermal annealingOpen PDF discussing RTA, ultrashallow junctions, TED, sheet-resistance tradeoffs, and temperature trajectory control.

Public execution boundary

No server-side live ngspice execution, uploads, accounts, payments, comments, newsletter signup, or job/event submissions are active on this page.