Wet clean contamination removal
Compare conceptual organic, particle, metal, and native-oxide proxies across a public-safe wet-clean evidence sequence.
88.0% / 80.0% / 80.0%
Open simulation ->PROCESS REPLAY LAB / SA-PROC-006
Wet clean and surface prep.
Compare the surface-state cards.
This lab collects four precomputed wet-clean and adhesion-prep simulations for paper-first review: contamination class, native oxide, HMDS readiness, and sequence evidence queue.
RUN ONE QUESTION
Pick the surface claim first.
Every card keeps a condition, output, method, source, and limitation attached. The point is evidence discipline, not facility operation.
Dilute HF native-oxide window
Replay a normalized native-oxide removal window with hydrophobicity, reoxidation sensitivity, and queue-time caution shown together.
0.22 nm / 84 deg / 0.78
Open simulation ->HMDS adhesion-prime readiness
Compare dehydration, hydrophobicity, adhesion score, and overprime or delay risk for public-safe lithography surface-prep review.
0.91 / 76 deg / 0.18
Open simulation ->Clean sequence decision queue
Map downstream process intent to surface target, evidence needs, and risk flags without publishing a wet-bench or lithography flow.
16 / 4 / 0.802
Open simulation ->MODEL BOUNDARY
Surface intuition is useful only when the boundary is loud.
The public replay is for teaching, figures, and early paper planning. It is not a wet-bench recipe, HF procedure, lithography track flow, contact qualification, wafer release rule, or signoff result.
Browse saved datasets
Open contamination, native oxide, HMDS, and clean-sequence data with their assumptions visible.
Download model cards
Use the public source notes and limitations when making slides, drafts, or teaching figures.
No recipe workflow
No process upload, tool account, facility credential, live execution, endpoint control, release dashboard, or qualified process-window claim is present.