Clean claims must name what changed.
Organics, particles, metals, and native oxide are different evidence lanes. A useful public clean claim keeps the target and remaining uncertainty visible.
88.0% / 80.0% / 80.0% / open simulation ->LESSON PACKET / SA-PROC-006
Wet clean and surface preparation.
The surface remembers.
Wet clean, native oxide control, and adhesion preparation sit between nearly every process module. The MVP teaches the evidence lanes without publishing chemical settings, facility flows, or equipment instructions.
SURFACE EVIDENCE CHAIN
Teach the surface state before teaching the next tool.
For a comprehensive semiconductor site, cleaning belongs beside deposition, lithography, oxidation, contact, and packaging. The public version is evidence planning, not a process traveler.
Oxide removal creates a queue-time question.
A lower oxide proxy can raise hydrophobicity and reoxidation sensitivity. The downstream process decides which state matters.
0.22 nm / 84 deg / open simulation ->HMDS is a readiness claim, not a magic label.
Dehydration, surface energy, adhesion score, and delay or overprime risk should travel together before lithography evidence is reused.
0.91 score / open simulation ->Downstream intent chooses the evidence.
Oxidation, deposition, lithography, and contact-sensitive steps ask for different surface-state proof. The public page maps the questions without publishing a wafer flow.
16 evidence needs / open simulation ->SIMULATION BUNDLE
Start from the surface claim if you are reading a paper.
Each object carries Explore, Run Card, Export, Methods, Limits, and Evidence. The lesson gives the process context; the simulation card carries the reusable artifact.
Wet clean contamination removal
Compare conceptual organic, particle, metal, and native-oxide proxies across a public-safe wet-clean evidence sequence.
Open Wet Clean ->Dilute HF native-oxide window
Replay a normalized native-oxide removal window with hydrophobicity, reoxidation sensitivity, and queue-time caution shown together.
Open Native Oxide ->HMDS adhesion-prime readiness
Compare dehydration, hydrophobicity, adhesion score, and overprime or delay risk for public-safe lithography surface-prep review.
Open HMDS Prime ->Clean sequence decision queue
Map downstream process intent to surface target, evidence needs, and risk flags without publishing a wet-bench or lithography flow.
Open Clean Queue ->SOURCE SPINE
Public sources anchor vocabulary, not process authority.
These links support clean, native oxide, HMDS, and metrology language. They do not authorize copying facility procedures or publishing operating conditions.
Stanford Nanofabrication Facility Pre-Diffusion Clean
https://snfguide.stanford.edu/taxonomy/term/712/all/feed?order=field_equipment_name&sort=desc
Open source ->Stanford Nanofabrication Facility Standard Clean 1
https://snfguide.stanford.edu/guide/chemicals/acids/standard-clean-1
Open source ->Stanford Nanofabrication Facility HMDS
https://snfguide.stanford.edu/guide/chemicals/primers/hmds
Open source ->NIST wet chemical cleaning publication
https://www.nist.gov/publications/wet-chemical-cleaning-plasma-oxide-grown-heated-001-inp-surfaces
Open source ->NIST CHIPS Metrology Program
https://www.nist.gov/chips/research-development-programs/metrology-program
Open source ->DATA TO COLLECT NEXT
Surface-prep claims become useful when the missing measurement is named.
The next upgrade is rights-clean measurement summaries with uncertainty and non-claims, not secret recipes or facility control settings.
Rights-clean particle, metal, organic-residue, and oxide-state summaries with sample count and uncertainty
Store the evidence with method, source rights, uncertainty, surface state, downstream intent, and what the result does not prove.
Contact-angle or surface-energy measurements before and after queue delay, with material stack and storage state
Store the evidence with method, source rights, uncertainty, surface state, downstream intent, and what the result does not prove.
Lithography adhesion or defect summaries that separate dehydration, HMDS prime, resist type, and exposure/develop evidence
Store the evidence with method, source rights, uncertainty, surface state, downstream intent, and what the result does not prove.
Native-oxide or contact-resistance summaries for contact-sensitive flows, with no recipe settings exposed
Store the evidence with method, source rights, uncertainty, surface state, downstream intent, and what the result does not prove.
Watermark, drying, and recontamination notes that are safe to publish and not facility procedures
Store the evidence with method, source rights, uncertainty, surface state, downstream intent, and what the result does not prove.
Source-backed glossary cards for RCA, SC1, SC2, DHF, piranha, megasonic, Marangoni dry, HMDS, and queue time
Store the evidence with method, source rights, uncertainty, surface state, downstream intent, and what the result does not prove.
Public boundary
No live tool operation, recipe upload, account workflow, payment, comment, newsletter signup, job/event submission, endpoint control, release dashboard, facility credential collection, or wafer-routing workflow is active in this MVP.