16Evidence needsUNKNOWNInspect metric contract
4Intent casesUNKNOWNInspect metric contract
0.802Average fit scoreUNKNOWNInspect metric contract
SIMULATION / SA-PROC-CLEAN-SEQUENCE-QUEUE-001
Clean sequence decision queue
Clean Queue
Map downstream process intent to surface target, evidence needs, and risk flags without publishing a wet-bench or lithography flow.
EXPLORE
Start with the observable.
Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.
- Choose the downstream intent before choosing what evidence is missing.
- Compare oxidation, deposition, lithography, and contact-sensitive surface targets.
- Use the risk flags to keep sequence planning separate from process release.
RUN CARD
Conditions before conclusions.
The public page replays a saved clean-sequence evidence map. It does not route wafers, accept uploads, generate travelers, or prescribe process steps.
Primary knobs
- Downstream intent: oxidation/diffusion, deposition, lithography/HMDS, contact or surface-sensitive process
- Outputs: surface target, evidence needs, risk flags, sequence-fit proxy
- Review focus: what must be measured next
- Boundary: no flow routing, traveler, recipe, or facility queue instruction
Saved outputs
- intent-to-evidence table
- risk flag list
- planning score proxy
- blocked workflow note
EXPORT
Download the public artifacts.
These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.
Dataset JSON
/data/process-clean-sequence-queue-web-v1.json
Open file ->Model script
/data/process_wet_clean_models.py
Open file ->Wet clean model card
/data/process-wet-clean-model-card.md
Open file ->METHODS
How the number was made.
Methods are written for citation discipline: the extraction rule matters as much as the plotted value.
Map downstream process intent to surface target, evidence needs, and risk flags.
Keep this method attached when reusing the figure or metric.
Count evidence needs so a paper or lesson can show what is missing.
Keep this method attached when reusing the figure or metric.
Use sequence-fit score only as a planning proxy.
Keep this method attached when reusing the figure or metric.
Keep all routing, approval, and facility instructions outside the public MVP.
Keep this method attached when reusing the figure or metric.
LIMITS
What this page does not claim.
The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.
No wet-bench flow, lithography track recipe, facility traveler, process routing, equipment instruction, or release dashboard is included.
Carry this boundary into any derivative note, paper draft, or slide.
No wafer-state metrology, queue-time validation, contamination-control result, or qualified process-window evidence is modeled.
Carry this boundary into any derivative note, paper draft, or slide.
The score is a teaching proxy and cannot approve a surface-preparation sequence.
Carry this boundary into any derivative note, paper draft, or slide.
Real sequence decisions require facility-approved procedures, safety review, metrology, material compatibility, and qualified owner signoff.
Carry this boundary into any derivative note, paper draft, or slide.
EVIDENCE
Trace the claim back to artifacts.
The evidence route remains the catalog-level browser; this page is the simulation-level reading card.
The dataset preserves four downstream-intent cases.
SA-PROC-CLEAN-SEQUENCE-QUEUE-001
Verification checks each case carries evidence needs and risk flags.
SA-PROC-CLEAN-SEQUENCE-QUEUE-001
The run card blocks recipe, facility, and release workflows.
SA-PROC-CLEAN-SEQUENCE-QUEUE-001
Source spine
These links anchor the public teaching model. They do not convert the replay into a qualified process recipe or signoff result.
Stanford SNF Pre-Diffusion CleanPublic SNF guide page describing SC1, SC2, and optional HF dip roles for organics, particles, metals, and native oxide context.Stanford SNF HMDSPublic SNF guide page describing HMDS as a photoresist adhesion promoter.NIST wet chemical cleaning publicationPublic NIST publication page anchoring wet cleaning as surface preparation before epitaxy, metal/dielectric deposition, and diffusion.NIST CHIPS Metrology ProgramPublic NIST page framing fit-for-purpose measurement as a core semiconductor capability as device structures become smaller and more layered.
Public execution boundary
No server-side live ngspice execution, uploads, accounts, payments, comments, newsletter signup, or job/event submissions are active on this page.