88.0%Organic residue reductionUNKNOWNInspect metric contract
80.0%Particle index reductionUNKNOWNInspect metric contract
80.0%Metal index reductionUNKNOWNInspect metric contract
SIMULATION / SA-PROC-CLEAN-WET-REMOVAL-001
Wet clean contamination removal
Wet Clean
Compare conceptual organic, particle, metal, and native-oxide proxies across a public-safe wet-clean evidence sequence.
EXPLORE
Start with the observable.
Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.
- Separate organic residue, particles, metal contamination, and native oxide before evaluating a clean claim.
- Use the sequence to ask which metrology would prove each removal mechanism.
- Keep native oxide visible so clean does not silently mean oxide-free.
RUN CARD
Conditions before conclusions.
The public page replays saved wet-clean teaching data. It does not submit recipes, operate wet benches, or expose process settings.
Primary knobs
- Conceptual stages: incoming, solvent proxy, SC1-like particle clean, SC2-like metal clean, rinse/dry control
- Outputs: organic residue, particle index, metal contamination index, native-oxide proxy
- Evidence focus: which contamination class changed and which one still needs measurement
- Boundary: no chemistry concentration, bath time, or facility traveler
Saved outputs
- contamination proxy table
- monotonic removal checks
- native-oxide caution
- public source spine
EXPORT
Download the public artifacts.
These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.
Dataset JSON
/data/process-wet-clean-contamination-removal-web-v1.json
Open file ->Model script
/data/process_wet_clean_models.py
Open file ->Wet clean model card
/data/process-wet-clean-model-card.md
Open file ->METHODS
How the number was made.
Methods are written for citation discipline: the extraction rule matters as much as the plotted value.
Represent each contamination class as a normalized proxy so the clean claim can be inspected one mechanism at a time.
Keep this method attached when reusing the figure or metric.
Check organic, particle, and metal proxies for monotonic decrease across the teaching sequence.
Keep this method attached when reusing the figure or metric.
Track native oxide separately so it is not confused with particle or metal removal.
Keep this method attached when reusing the figure or metric.
Attach source vocabulary without turning the page into a facility procedure.
Keep this method attached when reusing the figure or metric.
LIMITS
What this page does not claim.
The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.
No recipe, chemical concentration, bath time, wet-bench procedure, facility qualification, or safety instruction is included.
Carry this boundary into any derivative note, paper draft, or slide.
No particle counter, TXRF, ICP-MS, ellipsometry, contact-angle, or qualified metrology result is modeled.
Carry this boundary into any derivative note, paper draft, or slide.
The sequence is a teaching abstraction and must not be copied into a real wafer flow.
Carry this boundary into any derivative note, paper draft, or slide.
Real use requires facility-approved procedures, material compatibility, safety review, and rights-clean measurement evidence.
Carry this boundary into any derivative note, paper draft, or slide.
EVIDENCE
Trace the claim back to artifacts.
The evidence route remains the catalog-level browser; this page is the simulation-level reading card.
The dataset preserves five conceptual surface states and normalized contamination proxies.
SA-PROC-CLEAN-WET-REMOVAL-001
Verification checks monotonic organic, particle, and metal removal.
SA-PROC-CLEAN-WET-REMOVAL-001
The model card keeps recipe, facility, metrology, and qualification boundaries explicit.
SA-PROC-CLEAN-WET-REMOVAL-001
Source spine
These links anchor the public teaching model. They do not convert the replay into a qualified process recipe or signoff result.
Stanford SNF Pre-Diffusion CleanPublic SNF guide page describing SC1, SC2, and optional HF dip roles for organics, particles, metals, and native oxide context.Stanford SNF Standard Clean 1Public SNF chemical page anchoring SC1 as a particle and surface-preparation clean before growth furnaces.NIST wet chemical cleaning publicationPublic NIST publication page anchoring wet cleaning as surface preparation before epitaxy, metal/dielectric deposition, and diffusion.
Public execution boundary
No server-side live ngspice execution, uploads, accounts, payments, comments, newsletter signup, or job/event submissions are active on this page.