SA-DEV-001-FINFET-FINCOUNT-PPA-001FinFET fin count versus PPA
Replay fin count, gate length, and Vt flavor to compare drive current, capacitance, leakage, delay index, and PPA score.
- Add fins only after reading drive, capacitance, and leakage together.
- Separate Vt flavor from geometry so speed and standby current do not blur.
- Use PPA score as a bridge to ring oscillator and standard-cell consequences.
Open run card ->SA-DEV-001-GAA-NANOSHEET-001GAA nanosheet width, stack count, and electrostatics
Replay sheet count, nanosheet width, and variability class to compare control, drive, capacitance, Vt sigma, and PPA score.
- Treat sheet width and stack count as coupled geometry choices.
- Read electrostatic control, drive, capacitance, and Vt sigma together.
- Use variability class to avoid drawing roadmap conclusions from one ideal geometry.
Open run card ->SA-DEV-STRESS-001Source/drain stressor strain, mobility, and deformation-risk replay
Replay architecture, channel stressor, stress proxy, and temperature to compare mobility gain, drive-current gain, Vt shift, leakage, and mechanical deformation risk.
- Treat stress engineering as a process-to-device handoff, not only a mobility trick.
- Compare mobility gain with Vt shift, leakage, and mechanical risk before claiming a PPA win.
- Use FinFET, nanosheet, and CFET-watch categories to keep advanced CMOS architecture honest.
Open run card ->