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SIMULATION / SA-DEV-001-GAA-NANOSHEET-001

GAA nanosheet width, stack count, and electrostatics
GAA Nanosheet

Replay sheet count, nanosheet width, and variability class to compare control, drive, capacitance, Vt sigma, and PPA score.

sectionExploresectionRun CardsectionExportsectionMethodssectionLimitssectionEvidence

EXPLORE

Start with the observable.

Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.

guided exploration
  • Treat sheet width and stack count as coupled geometry choices.
  • Read electrostatic control, drive, capacitance, and Vt sigma together.
  • Use variability class to avoid drawing roadmap conclusions from one ideal geometry.

RUN CARD

Conditions before conclusions.

This page replays saved GAA data and does not run TCAD, compact models, PDK decks, or process integration flows.

precomputed GAA geometry sweep

Primary knobs

  • Sheet count
  • Nanosheet width
  • Variability class
outputs

Saved outputs

  • Electrostatic control
  • Drive proxy
  • Capacitance
  • Vt sigma
  • PPA score

EXPORT

Download the public artifacts.

These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.

download

Dataset JSON

/data/gaa-nanosheet-electrostatics-web-v1.json

Open file ->
download

Dataset CSV

/data/gaa-nanosheet-electrostatics-v64.csv

Open file ->
download

v64 deep simulation summary CSV

/data/v64-deep-simulations-summary.csv

Open file ->
download

v64 deep model script

/data/v64_deep_semiconductor_sims.mjs

Open file ->
download

v64 deep model card

/data/v64-deep-simulations-model-card.md

Open file ->

METHODS

How the number was made.

Methods are written for citation discipline: the extraction rule matters as much as the plotted value.

method

Electrostatic control is reduced by width and variability, then improved by added sheets.

Keep this method attached when reusing the figure or metric.

method

Drive scales with sheet count, width, and control index.

Keep this method attached when reusing the figure or metric.

method

PPA score penalizes capacitance and Vt variability.

Keep this method attached when reusing the figure or metric.

LIMITS

What this page does not claim.

The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.

non-claim

No real nanosheet cross-section, inner spacer, source/drain stressor, contact resistance, self-heating, or CFET/forksheet process is included.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

No roadmap production claim is made.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

Real advanced-device work needs calibrated TCAD, process integration assumptions, variability data, and circuit benchmark evidence.

Carry this boundary into any derivative note, paper draft, or slide.

EVIDENCE

Trace the claim back to artifacts.

The evidence route remains the catalog-level browser; this page is the simulation-level reading card.

evidence note

v64 deep results store every sheet, width, variability, control, drive, capacitance, and score row.

SA-DEV-001-GAA-NANOSHEET-001

evidence note

CSV export preserves the GAA comparison.

SA-DEV-001-GAA-NANOSHEET-001

evidence note

The domain roadmap keeps this as a device-to-circuit bridge, not a node forecast.

SA-DEV-001-GAA-NANOSHEET-001

Public execution boundary

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