Rc = 4 ohm/padContact resistanceUNKNOWNInspect metric contract
80 ohm/sqSheet resistanceUNKNOWNInspect metric contract
4.0e-6 ohm cm2Specific rho_cUNKNOWNInspect metric contract
SIMULATION / SA-PROC-METRO-TLM-CONTACT-001
TLM contact resistance extraction
TLM Contact R
Fit resistance versus contact spacing to separate sheet resistance, contact resistance, and geometry assumptions.
EXPLORE
Start with the observable.
Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.
- Plot total resistance against spacing and identify the intercept.
- Separate the line slope from the contact-resistance intercept.
- Use the result to plan what measured I-V and layout metadata a paper figure would need.
RUN CARD
Conditions before conclusions.
The public page replays saved extraction data. It does not collect I-V uploads, qualify contacts, or tune implant/anneal/metallization recipes.
Primary knobs
- Pad width: 100 um
- Contact gaps: 5 um to 80 um
- Observable: total resistance
- Fit model: intercept plus slope times gap
Saved outputs
- gap and resistance table
- linear fit slope and intercept
- contact resistance per pad
- sheet-resistance and rho_c teaching estimates
EXPORT
Download the public artifacts.
These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.
Dataset JSON
/data/process-tlm-contact-resistance-web-v1.json
Open file ->Model script
/data/process_metrology_models.py
Open file ->Metrology model card
/data/process-metrology-model-card.md
Open file ->METHODS
How the number was made.
Methods are written for citation discipline: the extraction rule matters as much as the plotted value.
Fit total resistance as intercept plus slope times contact spacing.
Keep this method attached when reusing the figure or metric.
Interpret half the intercept as one contact resistance in the teaching model.
Keep this method attached when reusing the figure or metric.
Estimate sheet resistance from slope times pad width.
Keep this method attached when reusing the figure or metric.
Keep contact geometry and transfer-length assumptions visible with the extracted number.
Keep this method attached when reusing the figure or metric.
LIMITS
What this page does not claim.
The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.
No current crowding model, contact-end correction, metal spreading resistance, thermal effect, Kelvin structure, uncertainty budget, or process calibration is included.
Carry this boundary into any derivative note, paper draft, or slide.
No qualified metrology, contact-module recipe, facility setting, wafer acceptance, or production contact-resistance claim is implied.
Carry this boundary into any derivative note, paper draft, or slide.
Real contact-resistance evidence requires layout details, raw I-V data, fit residuals, calibration status, and rights-clean process context.
Carry this boundary into any derivative note, paper draft, or slide.
This replay must not be used to qualify silicide, implant, anneal, or metallization recipes.
Carry this boundary into any derivative note, paper draft, or slide.
EVIDENCE
Trace the claim back to artifacts.
The evidence route remains the catalog-level browser; this page is the simulation-level reading card.
The dataset preserves the spacing table, fit result, and derived contact metrics.
SA-PROC-METRO-TLM-CONTACT-001
The model script recomputes the line fit from the saved samples.
SA-PROC-METRO-TLM-CONTACT-001
The public TLM source anchors the extraction vocabulary without qualifying a process.
SA-PROC-METRO-TLM-CONTACT-001
Source spine
These links anchor the public teaching model. They do not convert the replay into a qualified process recipe or signoff result.
Public execution boundary
No server-side live ngspice execution, uploads, accounts, payments, comments, newsletter signup, or job/event submissions are active on this page.