Skip to content
SASemiAgoraSemiconductor knowledge & engineeringOpen lesson

SIMULATION / SA-SEED-PROC-SURFACE-O2-O3-001

O2 plasma and O3 ozone surface activation for ALD nucleation
O2/O3 ALD

Replay treatment type, normalized dose, substrate class, activation proxy, and ALD nucleation-delay cycles for surface-prep intuition.

sectionExploresectionRun CardsectionExportsectionMethodssectionLimitssectionEvidence

EXPLORE

Start with the observable.

Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.

guided exploration
  • Compare O2 plasma and O3 ozone as surface-state treatments before picking a deposition story.
  • Read activation proxy and nucleation delay together so more exposure is not automatically better.
  • Use substrate class as a reminder that compatibility belongs in the method card.

RUN CARD

Conditions before conclusions.

This page replays saved O2/O3 surface-treatment data and does not run a plasma tool, UV-ozone cleaner, ALD reactor, or recipe workflow.

precomputed educational sweep

Primary knobs

  • Treatment
  • Normalized dose
  • Substrate class
outputs

Saved outputs

  • Surface activation proxy
  • ALD nucleation-delay cycles
  • Best-case row

EXPORT

Download the public artifacts.

These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.

download

Dataset JSON

/data/o2-o3-surface-treatment-ald-nucleation-web-v1.json

Open file ->
download

Seed sweep summary CSV

/data/github-open-source-seed-sweep-summary.csv

Open file ->
download

Seed model script

/data/github_open_source_seed_sims.py

Open file ->
download

Seed model card

/data/github-open-source-seed-sims-model-card.md

Open file ->

METHODS

How the number was made.

Methods are written for citation discipline: the extraction rule matters as much as the plotted value.

method

Activation proxy increases with normalized treatment dose and substrate compatibility.

Keep this method attached when reusing the figure or metric.

method

A damage penalty keeps exposure from becoming a one-way improvement knob.

Keep this method attached when reusing the figure or metric.

method

ALD nucleation delay is derived from the remaining unactivated surface fraction.

Keep this method attached when reusing the figure or metric.

LIMITS

What this page does not claim.

The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.

non-claim

No plasma power, pressure, gas flow, UV lamp dose, ozone concentration, chemistry recipe, or equipment setting.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

No facility workflow, material compatibility approval, or production ALD recipe is provided.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

Measured contact angle, XPS, ellipsometry, QCM, or nucleation data are required before calibrated claims.

Carry this boundary into any derivative note, paper draft, or slide.

EVIDENCE

Trace the claim back to artifacts.

The evidence route remains the catalog-level browser; this page is the simulation-level reading card.

evidence note

Seed sweep JSON records treatment, dose, substrate, activation, and nucleation-delay rows.

SA-SEED-PROC-SURFACE-O2-O3-001

evidence note

CSV export preserves the O2/O3 comparison table.

SA-SEED-PROC-SURFACE-O2-O3-001

evidence note

Existing surface-treatment pages provide source anchors for O2 plasma and UV/O3 vocabulary.

SA-SEED-PROC-SURFACE-O2-O3-001

Public execution boundary

No server-side live ngspice execution, uploads, accounts, payments, comments, newsletter signup, or job/event submissions are active on this page.