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SIMULATION / SA-PROC-SURF-O2-PLASMA-001

O2 plasma surface activation
O2 Plasma

Replay contact-angle reduction, residue removal proxy, ion-exposure warning, and air recovery after oxygen plasma activation.

sectionExploresectionRun CardsectionExportsectionMethodssectionLimitssectionEvidence

EXPLORE

Start with the observable.

Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.

guided exploration
  • Compare gentle, nominal, and extended normalized O2 plasma dose cases.
  • Read contact-angle reduction together with the ion-exposure risk index.
  • Use the air-recovery curve to avoid treating activation as permanent.
Open visual lab ->Open lesson ->

RUN CARD

Conditions before conclusions.

The public page replays saved teaching data. It does not operate a plasma tool or expose process settings.

precomputed replay

Primary knobs

  • Treatment time: 0-120 s teaching samples
  • Normalized RF dose: gentle, nominal, extended
  • Outputs: contact angle, residue proxy, hydroxylation proxy, ion-exposure risk
  • Recovery: contact-angle rebound after air exposure
outputs

Saved outputs

  • contact-angle curve
  • organic residue proxy
  • hydroxylation proxy
  • air-recovery curve

EXPORT

Download the public artifacts.

These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.

download

Dataset JSON

/data/process-o2-plasma-surface-activation-web-v1.json

Open file ->
download

Model script

/data/process_surface_treatment_models.py

Open file ->
download

Surface-treatment model card

/data/process-surface-treatment-model-card.md

Open file ->

METHODS

How the number was made.

Methods are written for citation discipline: the extraction rule matters as much as the plotted value.

method

Use first-order teaching curves to connect normalized exposure with contact-angle reduction.

Keep this method attached when reusing the figure or metric.

method

Track residue removal and hydroxylation as separate proxies.

Keep this method attached when reusing the figure or metric.

method

Add air-recovery so surface activation is not mistaken for a permanent state.

Keep this method attached when reusing the figure or metric.

LIMITS

What this page does not claim.

The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.

non-claim

No plasma density, sheath physics, ion energy, chamber pressure, gas flow, substrate temperature, endpoint, facility recipe, or qualified metrology is modeled.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

Normalized RF dose is a teaching axis and must not be copied into equipment settings.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

Contact-angle values are synthetic teaching replays, not measured wafer data.

Carry this boundary into any derivative note, paper draft, or slide.

non-claim

Real use requires material compatibility, charging and damage review, metrology, safety approval, and tool-specific training.

Carry this boundary into any derivative note, paper draft, or slide.

EVIDENCE

Trace the claim back to artifacts.

The evidence route remains the catalog-level browser; this page is the simulation-level reading card.

evidence note

The dataset preserves three normalized O2 plasma cases and air-recovery samples.

SA-PROC-SURF-O2-PLASMA-001

evidence note

Verification checks monotonic contact-angle reduction, residue removal, and risk-index increase.

SA-PROC-SURF-O2-PLASMA-001

evidence note

The model card states public boundaries and source links.

SA-PROC-SURF-O2-PLASMA-001

Source spine

These links anchor the public teaching model. They do not convert the replay into a qualified process recipe or signoff result.

Harrick Plasma surface chemistrySurface modification, O2 plasma hydroxylation, wettability, and recovery vocabulary.UNC CHANL oxygen plasma systemPublic cleanroom oxygen plasma uses for cleaning, activation, wettability, and adhesion.UIUC MRL UV/Ozone CleanerPublic comparison between UV/O3 and O2 plasma surface preparation needs.

Public execution boundary

No server-side live ngspice execution, uploads, accounts, payments, comments, newsletter signup, or job/event submissions are active on this page.