47232deterministic rowsUNKNOWNInspect metric contract
7process familiesUNKNOWNInspect metric contract
0physical recipe valuesUNKNOWNInspect metric contract
SIMULATION / SA-INT-PATTERNING-MODULE-045
Patterning and module flow evidence atlas
Trace seven upstream and module families without collapsing their evidence boundaries.
Move across mask and reticle, substrate and wafering, scanner and track, ion implant, thermal processing, clean and surface preparation, and CMP using one bounded review surface. Each family preserves its own controls, normalized proxies, exact ledgers, source spine, role gates, and replacement-evidence questions.
EXPLORE
Start with the observable.
Use this page when the simulation is the primary artifact. The linked lesson explains the concept; the linked lab keeps the visual replay surface available.
- Select one of seven process families before loading row data; the first view exposes only bounded metadata, row counts, source posture, rights boundary, and export contracts.
- Hold the family-specific categorical controls fixed, then compare eight ordered evidence states without treating the state index as time, dose, temperature, thickness, process order, or recipe progression.
- Switch among each packet's actual operator, engineering, integration, metrology, and quality views to expose which observations, models, interfaces, genealogy, denominators, and uncertainty records remain accountable.
- Compare six selected normalized teaching proxies and three exact integer ledgers inside each family while keeping imaging, beam, thermal, surface, removal, mask, crystal, and wafering mechanisms separate.
- Use the source spines and replacement slots to plan owned materials, measurements, equipment traces, geometry, uncertainty, validation, genealogy, and human review before any operational decision.
BROWSER PATTERNING + MODULE EVIDENCE ATLAS
Choose the process family before loading the evidence rows.
Compact metadata is present at first paint. The browser fetches one validated gzip CSV transport only after this explicit selection, verifies the restored canonical bytes, and discards them when the family changes.
selected packet
Scanner and coater/developer-track evidence
Which scanner, resist-coat, focus-dose, bake-develop, overlay, and downstream pattern-transfer evidence still blocks a defensible lithography handoff?
- Rows
- 6,912
- Physical states
- 3,456
- Sources
- 17 open / 3 gated
- Browser transfer
- One gzip CSV on request
0.48 MB gzip / 12.7 MB verified raw / row JSON remains private
No row data has been loaded.
Review the selected packet boundary, then load exactly one validated family gzip CSV. The browser verifies the restored canonical bytes; changing families discards the loaded rows, and raw CSV plus row-bearing JSON remain outside the website.
RUN CARD
Conditions before conclusions.
The browser filters one validated canonical CSV selected by the user after decompressing and verifying it. It does not solve a physical model, transfer source numbers, import measurements, infer causality, recommend settings, operate equipment, qualify a process, accept material, or make a release decision.
Primary knobs
- process family: mask and reticle, substrate and wafering, scanner and track, ion implant, thermal, clean and surface, or CMP
- family-specific categorical mechanism and evidence axes
- eight ordered non-time teaching states
- packet-specific operator, engineering, integration, metrology, quality, or yield gate
- teaching assumption or accountable replacement slot
Saved outputs
- six family-specific normalized readiness, control, or burden proxies
- family-specific regime, measurement-traceability, role, and handoff gates
- three exact integer teaching ledgers per family
- compact manifest, metric contract, model card, source spine, and explicitly loaded deterministic gzip CSV transport
EXPORT
Download the public artifacts.
These exports are the supported public files for review. PDK files and restricted third-party material are not redistributed.
Lithography / track gzip CSV
/data/litho-scanner-track-state-v1.csv.gzip
Open file ->Lithography / track compact manifest
/data/litho-scanner-track-state-public-manifest-v1.json
Open file ->Ion implant gzip CSV
/data/ion-implant-beamline-state-v1.csv.gzip
Open file ->Ion implant compact manifest
/data/ion-implant-beamline-state-public-manifest-v1.json
Open file ->Thermal / RTP / laser gzip CSV
/data/thermal-rtp-laser-state-v1.csv.gzip
Open file ->Thermal / RTP / laser compact manifest
/data/thermal-rtp-laser-state-public-manifest-v1.json
Open file ->Clean / surface gzip CSV
/data/clean-surface-state-v1.csv.gzip
Open file ->Clean / surface compact manifest
/data/clean-surface-state-public-manifest-v1.json
Open file ->CMP gzip CSV
/data/cmp-state-v1.csv.gzip
Open file ->CMP compact manifest
/data/cmp-state-public-manifest-v1.json
Open file ->Mask / reticle gzip CSV
/data/mask-reticle-state-v1.csv.gzip
Open file ->Mask / reticle compact manifest
/data/mask-reticle-state-public-manifest-v1.json
Open file ->Substrate / wafering gzip CSV
/data/substrate-wafering-state-v1.csv.gzip
Open file ->Substrate / wafering compact manifest
/data/substrate-wafering-state-public-manifest-v1.json
Open file ->METHODS
How the number was made.
Methods are written for citation discipline: the extraction rule matters as much as the plotted value.
Six independently completed packets enumerate 6,912 rows over 3,456 physical configurations, while substrate and wafering enumerates 5,760 rows over 2,880 physical configurations, for 47,232 deterministic rows and 23,616 evidence pairs.
Keep this method attached when reusing the figure or metric.
Each family keeps its own mechanism-context controls, normalized equations, eight-state regime map, role gates, replacement-evidence bridge, and three exact integer teaching ledgers.
Keep this method attached when reusing the figure or metric.
Independent no-import verifiers passed 16/16 for every family, source-scope locks passed 37/37 for every family, and deterministic replay parity was exact for all twenty-eight regenerated artifacts.
Keep this method attached when reusing the figure or metric.
One hundred forty link-only official or primary-source metadata anchors and one hundred twelve bounded claim nodes define terminology, rights, evidence ownership, and replacement questions without supplying generated numbers.
Keep this method attached when reusing the figure or metric.
The transport contract publishes seven deterministic gzip CSV transports plus twenty-eight compact-manifest, metric-contract, model-card, and source-spine artifacts while retaining raw canonical CSV and seven row-bearing JSON artifacts with canonical evidence only.
Keep this method attached when reusing the figure or metric.
LIMITS
What this page does not claim.
The MVP is useful because the limits are visible. These statements prevent a teaching simulation from being cited as silicon evidence.
All states, regimes, proxies, gates, and priority cues are original categorical or dimensionless teaching constructs, not physical lithography, implantation, thermal, cleaning, CMP, mask, substrate, equipment, metrology, reliability, or yield predictions.
Carry this boundary into any derivative note, paper draft, or slide.
The twenty-one exact integer ledgers establish deterministic bookkeeping consistency only. They do not establish causality, calibration, transferability, material compatibility, uncertainty, qualification, safety, or production fitness.
Carry this boundary into any derivative note, paper draft, or slide.
No source body, source number, equation, coefficient, material property, process condition, recipe, equipment setting, measurement row, model parameter, result, specification, or named-tool output enters the generated data.
Carry this boundary into any derivative note, paper draft, or slide.
The browser loads one selected-family deterministic gzip CSV only after explicit user action and verifies the restored canonical bytes. It cannot recommend settings, operate equipment, accept material, dispose a wafer, sign off integration, claim yield, or publish automatically.
Carry this boundary into any derivative note, paper draft, or slide.
EVIDENCE
Trace the claim back to artifacts.
The evidence route remains the catalog-level browser; this page is the simulation-level reading card.
Input audit passed 117/117 across seven packet-complete families, 47,232 rows, 23,616 physical configurations, 140 sources, 112 claim nodes, and thirty-five approved public assets.
SA-INT-PATTERNING-MODULE-045
All seven independent packet verifiers passed 16/16 and all seven source-scope locks passed 37/37; the preintegration verifier passed thirteen hashes and seven semantic gates.
SA-INT-PATTERNING-MODULE-045
Source reachability closed at 114 reachable and 26 access-gated records, with zero recorded hard or network failures in the packet audits.
SA-INT-PATTERNING-MODULE-045
The browser excludes 426,120,844 bytes of row-bearing JSON and 93,477,814 raw CSV bytes, then fetches one selected-family gzip transport only after explicit action; no all-family CSV preload is permitted.
SA-INT-PATTERNING-MODULE-045
Every family public manifest is compact and row-free, every gzip transport restores to the exact canonical byte count and SHA-256, every other copied public artifact matches its canonical SHA-256, and all raw CSV and private row JSON names remain absent from public data.
SA-INT-PATTERNING-MODULE-045
Source spine
These links anchor the public teaching model. They do not convert the replay into a qualified process recipe or signoff result.
Lithography / track / Lenses and mirrors - Lithography principlesDUV lens, EUV mirror, numerical-aperture, focus, and imaging vocabulary categories. Rights: link-only; publisher notices and terms apply.Lithography / track / Measuring accuracy - Lithography principlesFocus, overlay, optical metrology, e-beam inspection, and feedback-loop vocabulary categories. Rights: link-only; publisher notices and terms apply.Ion implant / VIISta Trident high-current ion implantation systemHigh-current implant-family, beamline, wafer charging, and contamination-control vocabulary categories. Rights: link-only; publisher notices and terms apply.Ion implant / VIISta 900XP medium-current ion implantation systemMedium-current implant-family, angle-control, dose-control, and beam-purity vocabulary categories. Rights: link-only; publisher notices and terms apply.Thermal / RTP / laser / TELINDY Series batch thermal processing systemsBatch-furnace, heater-control, ramp, thermal-uniformity, oxidation, anneal, and process-control vocabulary categories. Rights: link-only; publisher notices and terms apply.Thermal / RTP / laser / KOKUSAI ELECTRIC thermal processing and treatment equipmentBatch and single-wafer thermal-treatment, anneal, temperature-control, ambient, productivity, and film-property vocabulary categories. Rights: link-only; publisher notices and terms apply.Clean / surface / CELLESTA single-wafer cleaning systemSingle-wafer cleaning, wet processing, surface conditioning, rinse, drying, and contamination-control vocabulary categories. Rights: link-only; publisher notices and terms apply.Clean / surface / CELLESTA SCD single-wafer cleaning system announcementSingle-wafer cleaning, physical removal, drying, pattern protection, and surface-state vocabulary categories. Rights: link-only; publisher notices and terms apply.CMP / Model F-REX chemical mechanical polishing systemCMP equipment, carrier and platen architecture, polishing, cleaning, endpoint-monitor, in-line metrology, and equipment-ownership vocabulary categories. Rights: link-only; publisher notices and terms apply.CMP / Applied Reflexion LK Prime CMP product pageSequential polishing stations, independently usable polish and clean stations, carrier-head and platen architecture, process-control, cleaning, and endpoint vocabulary categories. Rights: link-only; publisher notices and terms apply.Mask / reticle / SEMI P39: Specification for OASIS Open Artwork System Interchange StandardOASIS design-data interchange and revision-control vocabulary categories. Rights: link-only; publisher notices, access controls, and terms apply.Mask / reticle / SEMI P44: Specification for OASIS Specific to Mask ToolsMask-tool-specific OASIS interface and data-handling vocabulary categories. Rights: link-only; publisher notices, access controls, and terms apply.Substrate / wafering / SEMI M1: Specification for Polished Single Crystal Silicon WafersPolished silicon substrate, starting-wafer, slicing, polishing, and dimensional-quality vocabulary categories. Rights: link-only; publisher notices, access controls, and terms apply.Substrate / wafering / SEMI M55: Specification for Polished Monocrystalline Silicon Carbide WafersSilicon-carbide substrate, polytype, polished-wafer, bulk-property, and test-method vocabulary categories. Rights: link-only; publisher notices, access controls, and terms apply.
Public execution boundary
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